Restricted accessMoreSectionsView PDF ToolsAdd to favoritesDownload CitationsTrack Citations ShareShare onFacebookTwitterLinked InRedditEmail Cite this article Kowalski Grzegorz, Lefeld-Sosnowska Maria, Gronkowski Jerzy and Borowski Janusz 1999X-ray topography studies of microdefects in siliconPhil. Trans. R. Soc. A.3572707–2719http://doi.org/10.1098/rsta.1999.0460SectionRestricted accessX-ray topography studies of microdefects in silicon Grzegorz Kowalski Grzegorz Kowalski Institute of Experimental Physics, University of Warsaw, Hoza 69, 00-681 Warsaw, Poland Google Scholar Find this author on PubMed Search for more papers by this author , Maria Lefeld-Sosnowska Maria Lefeld-Sosnowska Institute of Experimental Physics, University of Warsaw, Hoza 69, 00-681 Warsaw, Poland Google Scholar Find this author on PubMed Search for more papers by this author , Jerzy Gronkowski Jerzy Gronkowski Institute of Experimental Physics, University of Warsaw, Hoza 69, 00-681 Warsaw, Poland Google Scholar Find this author on PubMed Search for more papers by this author and Janusz Borowski Janusz Borowski Institute of Experimental Physics, University of Warsaw, Hoza 69, 00-681 Warsaw, Poland Google Scholar Find this author on PubMed Search for more papers by this author Grzegorz Kowalski Grzegorz Kowalski Institute of Experimental Physics, University of Warsaw, Hoza 69, 00-681 Warsaw, Poland Google Scholar Find this author on PubMed Search for more papers by this author , Maria Lefeld-Sosnowska Maria Lefeld-Sosnowska Institute of Experimental Physics, University of Warsaw, Hoza 69, 00-681 Warsaw, Poland Google Scholar Find this author on PubMed Search for more papers by this author , Jerzy Gronkowski Jerzy Gronkowski Institute of Experimental Physics, University of Warsaw, Hoza 69, 00-681 Warsaw, Poland Google Scholar Find this author on PubMed Search for more papers by this author and Janusz Borowski Janusz Borowski Institute of Experimental Physics, University of Warsaw, Hoza 69, 00-681 Warsaw, Poland Google Scholar Find this author on PubMed Search for more papers by this author Published:01 October 1999https://doi.org/10.1098/rsta.1999.0460AbstractX–ray topography has been successfully applied to study microdefects with the sizes in the range from well below standard topographic resolution to tenths of micrometers, thus effectively widening applicability of the Lang section topography. The lower value is set by the application of high order asymmetric reflection. Disappearance of the Kato fringes on the section topography is a clear indication of the existence of defects, which are otherwise not detectable as the standard contrast features. The presence of the defects with such sizes was also confirmed by transmission electron microscopy. Microdefects in the higher end of the size spectrum are well covered by Lang traverse and section topography where detailed contrast study is possible for individual defects. Lang traverse and section topography was applied to study specific case of oxygen related defects in silicon crystals. Previous ArticleNext Article VIEW FULL TEXT DOWNLOAD PDF FiguresRelatedReferencesDetailsCited by Lefeld-Sosnowska M and Malinowska A (2013) X-ray Diffraction Topography - Investigation of Single Crystals Grown by the Czochralski Method, Acta Physica Polonica A, 10.12693/APhysPolA.124.360, 124:2, (360-371), Online publication date: 1-Aug-2013. Borowski J (2002) Klein-Gordon Formulation of X-ray Diffraction in the Laue Cas, Acta Physica Polonica A, 10.12693/APhysPolA.101.767, 101:5, (767-780), Online publication date: 1-May-2002. This Issue01 October 1999Volume 357Issue 1761Theme Issue ‘X–ray topography and crystal characterization’ compiled by D. K. Bowen and B. K. Tanner Article InformationDOI:https://doi.org/10.1098/rsta.1999.0460Published by:Royal SocietyPrint ISSN:1364-503XOnline ISSN:1471-2962History: Published online01/10/1999Published in print01/10/1999 License: Citations and impact KeywordsdefectsX–ray topographydiffraction latticesilicon