Pulsed Vacuum Discharge Research Articles

Semiconductor lasers pumped by pulsed electric discharge in vacuum

Lasing has been observed in several semiconductors pumped by electrons from a pulsed 5-to 20-kV vacuum arc. This method of pumping eliminates the hot-cathode multielement electron gun and magnetic focusing means usually required for electron-beam generation. At temperatures of 77 K and room temperature, CdS has shown well-defined lasing with narrow directional output and sharp spectral lines. CdSe and GaAs have shown similar evidence of lasing at 77 K. The new technique opens up some possibilities for simple compact laser devices.

1561. Anode electron currents in the firing stage of a pulsed discharge in high vacuum: A B Boym et al, Radiotekh Elektron, 15 (11), 1970, 2415–2417 ( in Russian)

1561. Anode electron currents in the firing stage of a pulsed discharge in high vacuum: A B Boym et al, Radiotekh Elektron, 15 (11), 1970, 2415–2417 ( in Russian)

Electrode erosion in a pulsed plasma accelerator

Electromagnetic acceleration to 106–107 cm/sec occurs in the discharge column in a pulsed plasma accelerator, which in this way differs from ordinary pulsed vacuum discharges (spark working of metals, pulsed light sources, etc.). This affects the electrode erosion. A study has been made of the anode damage in pulsed plasma accelerators with rail geometry.

A low-voltage pulsed discharge in vacuum, for obtaining spectra

To overcome the well-known difficulties which arise out of the choice of vacuum sources of line spectra, the use of a low-voltage, pulsed discharge with “separate” supply is suggested. Lines of highly ionized atoms, e.g. OV, have been observed using this method.