This work reports the synthesis of nanostructured ZnO by electrochemical deposition on glass substrates covered by a thin film of SnO2 doped with F (SnO2:F). Nanostructured ZnO films are deposited by an electrochemical process using a three-electrode potentiostatic system with saturated calomel electrodes as reference electrodes from an aqueous solution containing ZnCl2, KCl, (pH 4.00) and an air flow or/and additional supplement of H2O2 or a ZnO powder suspension. The influence of the deposition conditions on the structural properties of the ZnO films prepared is studied by SEM, AFM and XRD. The SEM micrographs and the AFM images show that the ZnO films consist of nanograins with average size in the range of 52 – 83 nm depending on the deposition conditions. The XRD spectra demonstrate preferential (002) crystallographic orientation of the ZnO grains. The optical band gap values are in the range 3.26 – 3.46 eV. The spectra of total and diffused transmission are also measured. It is shown that the haze ratio depends on the surface roughness of the films.