Light manipulation and control are essential in various contemporary technologies, and as these technologies evolve, the demand for miniaturized optical components increases. Planar-lens technologies, such as metasurfaces and diffractive optical elements, have gained attention in recent years for their potential to dramatically reduce the thickness of traditional refractive optical systems. However, their fabrication, particularly for visible wavelengths, involves complex and costly processes, such as high-resolution lithography and dry-etching, which has limited their availability. In this study, we present a simplified method for fabricating visible Fresnel zone plate (FZP) planar lenses, a type of diffractive optical element, using an i-line stepper and a special photoresist (color resist) that only necessitates coating, exposure, and development, eliminating the need for etching or other post-processing steps. We fabricated visible FZP lens patterns using conventional photolithography equipment on 8-inch silica glass wafers, and demonstrated focusing of 550 nm light to a diameter of 1.1 μm with a focusing efficiency of 7.2%. Numerical simulations showed excellent agreement with experimental results, confirming the high precision and designability of our method. Our lenses were also able to image objects with features down to 1.1 μm, showcasing their potential for practical applications in imaging. Our method is a cost-effective, simple, and scalable solution for mass production of planar lenses and other optical components operating in the visible region. It enables the development of advanced, miniaturized optical systems to meet modern technology demand, making it a valuable contribution to optical component manufacturing.
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