Polyimide has been widely used as structural or sacrificial material in MEMS device fabrication. However, all the typical methods for processing polyimide are based on lithographic technique, which are time-consuming, expensive and non-flexible. In this paper, we propose a novel approach for depositing polyimide patterns by the microPen direct-write deposition technique, which is CAD direct-driven, maskless, rapid-prototyping, and diverse materials integration. Material and device for the microPen direct-write deposition of polyimide technique are presented in detail, and the influences of direct-writing parameters, such as extrusive gas–pressure, direct-writing velocity and the tip-to-substrate distance, on the profile of the deposited polyimide pattern are discussed. Using commercial gold paste (Au) as the structural layer material and polyimide as the sacrificial layer, a micro air-bridge array is successfully fabricated by the microPen direct-write deposition technique, which shows its potential applications in the area of MEMS device fabrication.