Ti–Si–N coatings were successfully deposited by pulsed-direct current plasma-enhanced chemical vapor deposition technique on the surface of high-speed steel substrate, which were bolted to deep blind-hole or U-shaped slice to simulate the complex-shaped surface of various tools and dies, were investigated in this work. The micrographs show that the surface morphologies of the coatings become smoother with an increase of the depth of the bottom of holes or narrow ditches. And the silicon content also increases in Ti–Si–N coatings, which are made of crystallite-phase TiN and amorphous Si3N4 in all cases. The thickness and hardness of the coatings decrease with the increase of the measured depths, which may result from the changes of the composition in the coatings, while the load-bearing capacity of the coatings in the indentation test increase for the coatings prepared on the bottom of holes.