Abstract
Ti–Si–N coatings were successfully deposited by pulsed-direct current plasma-enhanced chemical vapor deposition technique on the surface of high-speed steel substrate, which were bolted to deep blind-hole or U-shaped slice to simulate the complex-shaped surface of various tools and dies, were investigated in this work. The micrographs show that the surface morphologies of the coatings become smoother with an increase of the depth of the bottom of holes or narrow ditches. And the silicon content also increases in Ti–Si–N coatings, which are made of crystallite-phase TiN and amorphous Si3N4 in all cases. The thickness and hardness of the coatings decrease with the increase of the measured depths, which may result from the changes of the composition in the coatings, while the load-bearing capacity of the coatings in the indentation test increase for the coatings prepared on the bottom of holes.
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callMore From: Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
Disclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
