Abstract
Ti–Si–C–N coatings with different Si contents were synthesized by means ofpulsed direct current plasma-enhanced chemical vapor deposition using aTiCl4,SiCl4,CH4,N2,H2 and Ar gas mixture. A complex phase transition has been identified which is stronglycontrolled by the silicon content in the coatings. Transmission electron microscopy(TEM) and x-ray diffraction (XRD) results indicate that increasing Si contentleads to a phase transition from a solid solution (Ti, Si)(C, N) to a dual-phaseTi (C,N)+TiSi2 structure, andthen to a two-phase Ti (C,N)+SiC structure, and that the changes in grain size and lattice parameter coincidewith the phase transition. The Ti–Si–C–N coatings with high Si contents(≥4.3 at.%) possess a superhigh hardness (43–52 GPa) due to grain refinement/grain boundaryhardening and compressive stress/dispersion hardening of the hard, nanosized crystallineTiSi2 or SiC dispersed in the matrix.
Published Version
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