Plasma-assisted Molecular Beam Epitaxy System Research Articles

Improving crystal quality of β-phase MgGaO thin films by using low-temperature homo-buffer layer

Ultra-wide bandgap (UWBG) semiconductors are promising for many applications, such as power electronics and deep-ultraviolet photonics. In this research, UWBG β-phase magnesium gallium oxide (MgGaO) thin films with a bandgap of 5.1 eV were grown using low-temperature homo-buffer layers in a plasma-assisted molecular beam epitaxy system. The role of the growth temperature and thickness of low-temperature buffer layer on the quality of the active layer was studied using x-ray diffraction and transmission electron microscopy and by analyzing the properties of metal–semiconductor–metal photodetector devices based on these films. It is found that lower buffer growth temperature at 300 °C leads to higher crystal quality of active layer. For the same low buffer growth temperature, different crystal quality in the active layer is attained with different buffer layer thickness. A buffer layer thickness at 40 nm has the best active layer quality with the highest photo current under 265 nm illumination and long decay time as a result of reduced recombination of photo-generated carriers through fewer defects in the active layer.

Study on the Structure of GaN films deposited on MoS2/Sapphire via Plasma-Assisted Molecular Beam Epitaxy

The gallium nitride (GaN) films were grown on molybdenum disulfide (MoS2) layers via plasma-assisted molecular beam epitaxy (PA-MBE). The heterostructures of the GaN film were studied using reflection high-energy electron diffraction (RHEED) and HR-XRD. The heterostructures of GaN/MoS2/sapphire were revealed through cross-sectional transmission electron microscopy (TEM). The surface texture of the GaN films was analyzed using FE-SEM. Single-crystal heterostructure GaN films can be obtained on 2D MoS2/c-sapphire. The RHEED demonstrated spot patterns with high intensity showing the single crystal structure constructed in the GaN films. The GaN films on the surface exhibited a hexagonal structure. TEM images taken perpendicular to the surface revealed that, even after 60 minutes of epitaxial growth, the thickness of the GaN films remained consistent at approximately 4 nm. However, the 2D MoS2 layer was not observable in the images due to harm incurred during heteroepitaxial growth. Based on the surface structure, it was found that GaN films were successfully grown on the MoS2 layers using the PA-MBE system.

Tailoring anomalous Hall effect by spin–orbit coupling in epitaxial Au/Fe4N bilayers

Anomalous Hall effect (AHE) is one of the most fascinating topics in condensed matter physics related to spin–orbit coupling (SOC). In this paper, we report on the AHE of high-quality epitaxial Au/Fe4N bilayer films, which were grown by a plasma-assisted molecular beam epitaxy system. A scaling involving multiple competing scattering mechanisms and a shunting model were adopted to analyze the AHE in detail. Compared with Fe4N single layers and Cu/Fe4N bilayers, the AHE of Au/Fe4N bilayers is dramatically modified by strong SOC of the Au layer. Analysis has shown that aside from extra scatterings from Au atoms that diffused from an Au layer to a Fe4N layer, both spin Hall effect of Au and magnetic proximity effect near the Au/Fe4N interface contribute to the modification of the AHE. Variation of coercivity with the change of current, which could be attributed to spin–orbit torque, implies that the measured AHE is a combination of the AHE of Fe4N and strong SOC of Au.

Enhancement of optical property and crystal structure for GaN films on 2D MoS2 buffer layer by nitridation treatment

The growth of GaN films on layered 2D-MoS2/c-sapphire substrate by plasma-assisted molecular beam epitaxy system was investigated. Pre-nitridation process and deposition time as growth parameters were employed to exploit the heteroepitaxial growth of GaN films at the temperature of 700 °C. The characterizations of surface condition, surface morphology, chemical composition, optical properties, crystal orientation and quality of GaN epitaxial layers were conducted by reflection high energy electron diffraction (RHEED), scanning electron microscope (SEM), atomic force microscope (AFM), X-ray photoelectron Spectroscopy (XPS), Raman spectroscopy, photoluminescence spectroscopy (PL) and high-resolution X-ray diffraction (HR-XRD), respectively. The pre-nitridation process and growth duration can enhance the optical properties and crystal quality of GaN films on 2D-MoS2/c-plane sapphire. The pre-treatment of MoS2 layer by nitrogen plasma before the growth, providing a wetting layer of nitrogen for GaN growth, can eliminate the oxygen contamination and reduce the defects in the films. Band-to-band emission of Wurtzite GaN with the bandgap of 3.5 eV can be improved by pre-nitridation process, and yellow band emission can be suppressed due to the elimination of defect states in the films. Meanwhile, the crystal orientation and quality can be improved by the pre-nitridation process and longer duration of growth time. This study demonstrates a van der Waals epitaxial GaN films on 2D-MoS2 layer with higher crystal quality by pre-nitridation process, and it provides a potential solution for the future applications of GaN-based devices.

Inhomogeneity-mediated systematic reduction of the Schottky barrier in a Au/GaN nanorod film interface

Self-aligned GaN nanorods of various densities are grown on an r-plane Al2O3 substrate with Stranski–Krastanov or layer-plus-island growth conditions by using a plasma-assisted molecular beam epitaxy system. These conditions result in the formation of a GaN nanorod matrix on an epitaxial GaN thin film. The orientation of the nanorods was found to be at an inclination of ∼60° from the substrate. As expected, the GaN thin film grows along the [11–20] direction, but interestingly the nanorods have a preferential growth direction along the [0002] axis. The overall structure mimics the Gaussian distribution of Schottky barriers at the metal–semiconductor interface. The GaN nanorod/thin-film matrix systematically causes the well-known Au/GaN Schottky metal–semiconductor interface to display an Ohmic type of behavior. A systematic reduction of the Schottky barrier is observed with an increase in the GaN nanorod density (from 5 to 65 nanorods micron−2). The overall configuration provides a tunable Gaussian distribution of Schottky barriers with nanorod density, which could be extremely useful for replacing conventional multi-level electrode stacking techniques.

Spin-orbit torque-induced magnetization switching in epitaxial Au/Fe4N bilayer films

Au/Fe4N bilayer films have been grown by the plasma-assisted molecular beam epitaxy system. After an extraordinarily small charge current is applied to the samples, magnetization of the Fe4N layer was reversed by spin-orbit torque. Analyses indicate that the magnetization reversal is realized via domain wall motion and it was confirmed by magnetic force microscopy measurements. By comparing the transport properties of the Au/Fe4N bilayer film with those of control samples before and after using a pulse current to stimulate the films, contributions of the thermal effect and spin transfer torque induced by current that flows in the Fe4N layer to the magnetization switching were analyzed and determined to be negligible. Kerr signals were observed simultaneously with applying a charge current to the samples at zero magnetic field, which could be explained by the spin Hall effect of the Au layer.

In-Plane Anisotropic Photoconduction in Nonpolar Epitaxial a-Plane GaN.

Nonpolar a-plane GaN epitaxial films were grown on an r-plane sapphire using the plasma-assisted molecular beam epitaxy system, with various nitrogen plasma power conditions. The crystallinity of the films was characterized by high-resolution X-ray diffraction and reciprocal space mapping. Using the X-ray "rocking curve-phi scan", [0002], [1-100], and [1-102] azimuth angles were identified, and interdigitated electrodes along these directions were fabricated to evaluate the direction-dependent UV photoresponses. UV responsivity ( R) and internal gain ( G) were found to be dependent on the azimuth angle and in the order of [0002] > [1-102] > [1-100], which has been attributed to the enhanced crystallinity and lowest defect density along [0002] azimuth. The temporal response was very stable irrespective of growth conditions and azimuth angles. Importantly, response time, responsivity, and internal gain were 210 ms, 1.88 A W-1, and 648.9%, respectively, even at a bias as low as 1 V. The results were validated using the Silvaco Atlas device simulator, and experimental observations were consistent with simulated results. Overall, the photoresponse is dependent on azimuth angles and requires further optimization, especially for materials with in-plane crystal anisotropy.

Influence of metallic surface states on electron affinity of epitaxial AlN films

The present article investigates surface metallic states induced alteration in the electron affinity of epitaxial AlN films. AlN films grown by plasma-assisted molecular beam epitaxy system with (30% and 16%) and without metallic aluminium on the surface were probed via photoemission spectroscopic measurements. An in-depth analysis exploring the influence of metallic aluminium and native oxide on the electronic structure of the films is performed. It was observed that the metallic states pinned the Fermi Level (FL) near valence band edge and lead to the reduction of electron affinity (EA). These metallic states initiated charge transfer and induced changes in surface and interface dipoles strength. Therefore, the EA of the films varied between 0.6–1.0eV due to the variation in contribution of metallic states and native oxide. However, the surface barrier height (SBH) increased (4.2–3.5eV) adversely due to the availability of donor-like surface states in metallic aluminium rich films.

Light emission and magnetic properties of aluminum films grown on SrTiO3 by molecular beam epitaxy

Aluminum films were grown on SrTiO3 (100) substrates using a plasma-assisted molecular beam epitaxy system. We found that the intensity of defect emission coming through the Al films was enhanced to two fold. Although the surface plasmon energy is far from the defect emission, off-resonance enhancement is still possible from Al/SrTiO3. Moreover, the samples with Al films exhibits ferromagnetism, with wasp-waist hysteresis loops and exchange bias effects. The ferromagnetism may be attributed to the charge transfer between Al and the SrTiO3 matrix. This work is valuable in developing SrTiO3 which is a promising material used in optical and magnetic related application.

β-Ga2O3 solar-blind deep-ultraviolet photodetector based on a four-terminal structure with or without Zener diodes

A four-terminal photodetector was fabricated on the (2¯01)-dominant β-Ga2O3 thin film which was deposited in a plasma-assisted molecular beam epitaxy system. The suitability of this film for solar-blind DUV detection was proved by its transmission spectra. Moreover, the device operating in a specific voltage-current mode can accurately detect the DUV radiation both qualitatively and quantitatively. Accordingly, a dark/photo voltage ratio of 15 was achieved, which is comparable to that of previously-reported β-Ga2O3 interdigital metal-semiconductor-metal photoconductor. More importantly, the aperture ratio of our proposed device exceeds 80%, nearly doubling that of the conventional interdigital metal-semiconductor-metal devices including photoconductor and Schottky-type photodiode, which can intensively benefit the detection efficiency. Furthermore, it was found the dark/photo voltage ratio was nearly trebled with the assistance of two Zener diodes, and further enhancement can be expected by increasing the operating current and/or adopting Zener diodes with smaller Zener voltage. Therefore, this work provides a promising alternative for solar-blind DUV detection.

Plasma-assisted MBE of GaN pn-junction Grown on Si(111) Substrate

We investigated growth of GaN pn-junction layers grown on silicon(111) by plasma-assisted molecular beam epitaxy system and its application for photo-devices. Si and Mg were used as n- and p-dopants, respectively. The reflection high energy electron diffraction images indicated a good surface morphology of GaN pn-junction layer. The thickness of GaN pn-junctions layers was about 0.705 nm. The absence of cubic phase GaN showed that this layer possessed hexagonal structure. According to XRD symmetric rocking curve ω/2θ scans of (0002) plane at room temperature, the full width at half-maximun of GaN pn-junction sample was calculated as 0.34°, indicating a high quality layer of GaN pn-junction. Surprisingly, there was no quenching of the A(LO) peak, with the presence of Si- and Mg-dopants in sample. The pn-junctions sample has a good optical quality which was measured by the photoluminescence system. For photo-devices applications, Ni and Al were used as front and back contacts, respectively. The current-voltage characteristics of the devices showed the typical rectifying behavior of heterojunction. The photo-current measurement was performed using a visible-lamp under forward and reverse biases. From the temperature-dependent measurements, the current at low bias exhibited much stronger temperature dependence and weaker field dependence. The effect of thermal annealing on front contact Ni was also carried out. The front contact Ni was annealed at 400 and 600 °C for 10 min in the nitrogen ambient. The results showed that 600 °C treated sample had a higher gain at 1.00 V/e than 400 °C treated and untreated samples.

GaNAs(001) surface phases under growing condition

GaNAs∕GaAs(001) growth surfaces were investigated by reflectance difference (RD)∕anisotropy spectroscopy. In situ monitoring was carried out in a plasma-assisted molecular-beam epitaxy system during growth. In the growth temperature range of our experiment, the reflection high-energy electron diffraction pattern always showed a (2×4) reconstruction pattern, however, we observed three types of RD spectra. It was suggested that the GaNAs growth surface has three phases because RD spectra properly reflect surface electronic states. It is revealed that the phases are independent from nitrogen concentration, but dependent upon growth temperature and As4∕Ga flux ratio. In this article, we show the results of the RD observation, present a phase diagram, and discuss possible GaNAs growth surfaces.

Surface reconstruction of GaAs( [formula omitted]) nitrided under the controlled As partial pressure

Under the controlled As partial pressure, the nitridation process of GaAs(0 0 1)-(2 × 4) surface was studied using a scanning tunneling microscope (STM) combined with an electron cyclotron resonance plasma-assisted molecular beam epitaxy system. With either prolonging the nitridation time or decreasing the As partial pressure, the previously reported (3 × 3) structure with two dimers per surface cell ((3 × 3)-2D) was found to progressively convert into a new (3 × 3) structure characterized by one dimer per surface cell ((3 × 3)-1D). Reversely the exposure to arsenic transformed the structure from (3 × 3)-1D to (3 × 3)-2D, suggesting that the topmost layer is composed of As 2-dimers. Based on these STM images together with the X-ray photoelectron spectroscopy data, we propose the new As 2-dimer coverage models to explain both (3 × 3)-1D and -2D structures involving the exchange reaction of arsenic with nitrogen in the subsurface region of GaAs.