Over the past five years an electrolyte-additive system has been demonstrated and applied to void-free extreme bottom-up filling of high aspect ratio etched silicon structures that are key to advanced grating-based X-ray interferometry. Effective use of the full area of the gratings with conventional X-ray sources requires they have a finite radius of curvature to align the high aspect ratio Au-filled trenches with divergent X-rays. With that in mind, this presentation details bottom-up Au filling in gratings attached to curved holders as in the accompanying figure. Contactless mapping of the Au-filled gratings, also shown in the figure, captures residual (i.e., intrinsic) curvature that is retained after their release from the curved holders. X-ray diffraction quantifies the elastic strains in the Si underlying the Au-filled trenches of the grating. Complementary measurements on the surfaces of unpatterned Si wafers mounted on curved holders are used to understand the curvatures actually imposed in the mounted gratings. Both intrinsically curved gratings and gratings that have been re-bent toward their radius while mounted provide high visibility across the entire field of view of an X-ray interferometer for bio-medical imaging applications. They also have internal strains substantially below those in planar gratings bent to the same radius. Figure 1
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