(Semi)conductive oxides are a peculiar class of materials that combine optical transparency and (tunable) electrical conductivity, and are typically composed of combinations of In, Zn, Sn or Ga. These materials play a profound role in solar cells, but are also more and mo(o)re considered in memory, logic, photonics and sensing. When they are highly (degenerately) doped, these materials can act as transparent conductive window layers (e.g. in solar cells), and are often referred to as Transparent Conductive Oxides (TCOs). Conversely, for lowly-doped (non-degenerate) semiconductive oxides, the Fermi level is susceptible to external influences. The electrical conductivity can then be modulated, for example by gating in a transistor or gas exposure in a sensor. Often amorphous alloys such as InGaZnO are used, and the more common term is hence amorphous oxide semiconductors (AOS).Especially since the early 2000s, many ALD processes for doped and compound (semi)conductive metal oxides have been developed. The interest in ALD for preparing these oxides can most likely be attributed to the distinct merits of ALD, such as low-temperature processing, excellent uniformity and conformality, and accurate control over the doping level and composition. Moreover, as device dimensions shrink the need for high-quality ultrathin materials becomes ever more important. These merits of ALD stem directly from the self-limiting nature of the surface chemistry that drives the ALD growth. On the other hand, the strong role that surface chemistry has in the growth mechanism brings in many intricacies, and detailed understanding of these aspects has been vital for the development of high-quality doped and compound oxides by ALD. Examples of growth effects that can occur during ALD of compound oxides include growth delays, clustering of dopants and interruption of grain growth by doping. Such effects often need to be accounted for or mitigated, while on the other hand there are also clear cases where such growth effects can be leveraged to achieve enhanced or new functionality.Recently, we have reviewed these aspects, focusing on how such underlying ALD mechanisms relate to the resulting performance of the (semi)conductive oxide.[1] In this contribution, we apply these learnings to the application side, specifically looking at silicon and perovskite (tandem) solar cells and back end of line-compatible transistors for nanoelectronics. While these application areas are seemingly distinct, many learnings and parallels can be drawn from an ALD point of view. Topics that will be covered include (1) isotropic doping vs. nanolaminates, (2) advanced ALD (super)cycles, (3) soft deposition, (4) crystallinity control, (5) ultrathin films and more. We will highlight these aspects through case studies, drawing from our own recent work as well as examples from the field.[1] B. Macco, W.M.M. Kessels, Atomic layer deposition of conductive and semiconductive oxides, Appl. Phys. Rev. 9 (2022) 041313. Figure 1
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