High-efficiency, low-cost, high-power laser diodes (LDs) are in the spotlight due to the growing market demand. This study proposes a new edge-emitting LD structure that utilizes the facile oxidization properties of the high aluminum (Al) component AlGaAs material and simplifies LD fabrication to only one-step lithography. The key innovation is incorporating a ∼200 nm thick high-Al AlGaAs layer in the vertical epitaxial structure. This layer serves two purposes: 1) The low refractive index improves vertical mode confinement, enabling a thinner overall epitaxial structure. 2) Oxidation of this layer forms a dielectric isolator and a current aperture. Experimental LDs exhibited a peak efficiency of 77.8 %, peak power of 33.6 W, vertical divergence angle of 19.4°, and horizontal divergence angle of 8.8°. Compared to conventional edge-emitting LD, this LD demonstrates a 39 % lower thermal resistance, better optoelectronic performance, a simpler process, and a lower production cost.
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