Optical elements, such as dielectric meta-surfaces, photonic crystals, nanophotonic waveguide circuits, and diffractive grating couplers are all based on high refractive index materials. In this respect, a highly versatile material is tantalum pentoxide, which features a refractive index above 2 and low loss over a broad range of wavelengths from ultraviolet to near-infrared. However, the engineering of e.g. optical relief gratings requires tight control of the relief profiles to tailor the diffraction efficiency for the specified diffraction angles and polarizations. The current work presents a fabrication process offering high etch rate and uniformity across a 150 mm wafer, providing a tailored profile by means of gas flow control of etch- and passivation species during the inductively coupled plasma etching of tantalum pentoxide. The fabricated structures show good agreement between simulated and measured diffraction efficiency. Our findings enable highly efficient Ta2O5 platforms featuring over 85% diffraction efficiency for both transverse electric (TE) and transverse magnetic (TM) polarizations at a center wavelength of 808 nm, which is relevant for medium-range light detection and ranging (LiDAR) systems. It is observed that to achieve polarization-independent, high diffraction efficiency solutions it is necessary to tune the sidewall angle of the obtained structures, potentially boosting the efficiency of Ta2O5-based solutions. The findings constitute a scalable and flexible method for processing and designing meta- and diffractive optics for various trending applications requiring high diffraction efficiency such as LiDAR and augmented/virtual reality (AR/VR) modules.
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