Far UV light at 222 nm (UV222) is gaining much attention for efficient water purification in UV222 irradiation and UV222-based advanced oxidation processes (AOPs). The direct photolysis of pollutants is regraded to be their major removal mechanism by a sole UV222 treatment. However, this paper reports the important roles of reactive oxidative species (ROS) generated from dioxygen and water under only UV222 radiation. Multiple ROSs are identified, including hydroxyl radical (HO·), singlet oxygen (1O2), superoxide radical anion (·O2-), and ozone (O3). HO· is the major ROS for the degradation of 18 organic micropollutants under UV222 radiation, with an observed quantum yield of 0.447 and the concentration of 10-13 M at pH 7. Dioxygen is the initial source of ROS, while water mainly serves as a medium to react with the photolytic intermediate of O3 (i.e., O(1D)) to form HO·. Water matrix components of HCO3- and natural organic matter can inhibit the HO· concentration, whereas NO3- significantly enhances it. In drinking water, UV222 alone removes 18 micropollutants more efficiently than the typical UV254/H2O2 AOP (150 μM), with reduced energy consumption. This study discloses a novel mechanism of ROS generation in UV222 irradiation and underscores UV222 as an emerging chemical-free AOP for water purification.
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