NH4Cl was an important component for the electrodeposition of porous metal films through hydrogen bubble template approach. The effects of NH4Cl concentrations on pore formation and structure evolution of the electrodeposited porous Ni films were studied. It was found that Ni films electrodeposited from solutions with 0.250.35M NH4Cl were compact. When NH4Cl concentrations were 0.40.75M and 0.853M, porous Ni films with dish-like and honeycomb-like pores were electrodeposited, respectively. To form porous structure, the critical amounts of Ni in mass deposited onto the electrode must be achieved. However, at lower NH4Cl concentration, Ni electrodeposition was interrupted after about 15s due to Ni2+ hydrolysis. The critical amounts of Ni in mass were not reached, and compact Ni films were obtained. When NH4Cl concentrations exceeded 0.4M, Ni2+ hydrolysis was inhibited due to the enhanced buffer ability of solution and Ni(NH3)n2+ (2n6) complexes became the discharged ions. Ni electrodeposition proceeded continuously and reached the critical amounts of Ni in mass, and porous Ni films were formed. At higher NH4Cl concentration, hydrogen was produced mainly by the electrochemical reduction of NH4+. pH near cathode was hardly changed, and Ni2+ ions with low overpotential were reduced. The rough Ni films were formed, which led to smaller break-off diameter of bubbles. Therefore, the pore sizes of Ni films were decreased.