A remaining batch of 65 samples of the Bi-implanted silicon reference material, issued earlier by our institution, has been investigated extensively with respect to the uniformity of the implanted Bi-layer. For this purpose long-time RBS measurements were performed in the multichannel scaling (MCS) mode. The determined non-uniformity expressed as the relative range of the bismuth fluence between its maximum and minimum values is 7%. The relative amount of the Bi fluence in individual chips as presented in this paper serves as basis to assign individual calibration values to each implanted chip. Furthermore, an estimate of the uniformity within each sample can be based upon the acquired MCS data.