Abstract Optical isolators, the photonic analogs of electronic diodes, are essential for ensuring the unidirectional flow of light in optical systems, thereby mitigating the destabilizing effects of back reflections. Thin-film lithium niobate (TFLN), hailed as "the silicon of photonics," has emerged as a pivotal material in the realm of chip-scale nonlinear optics, propelling the demand for compact optical isolators. We report a breakthrough in the development of a fully passive, integrated optical isolator on the TFLN platform, leveraging the Kerr effect to achieve an impressive 10.3 dB of isolation with a minimal insertion loss of 1.87 dB. Further theoretical simulations have demonstrated that our design, when applied to a microring resonator with a Q factor of 5×106, can achieve 20 dB of isolation with an input power of merely 8 mW. This advancement underscores the immense potential of lithium niobate-based Kerr-effect isolators in propelling the integration and application of high-performance on-chip lasers, heralding a new era in integrated photonics.
Read full abstract