Electrostatically actuated microelectromechanical system (MEMS) oscillators are limited to few megahertz–gigahertz range on account of transduction inefficiency at higher frequencies. Piezoelectric transduction affords lower motional impedances at high frequencies, however mass-loading on account of metal electrodes imposes practical limits on the mechanical quality factor of piezoelectric resonators in the gigahertz frequency regime. In this paper, we present a silicon optoacoustic oscillator operating at 2.05 GHz with signal power 18 dBm and phase noise −80 dBc/Hz at 10-kHz offset from carrier. We employ displacement amplification and partial air gap capacitive transduction to enhance the transduction efficiency. An unconventional photolithography step is performed on a released MEMS structure, which greatly simplifies the fabrication process and allows electrical contact with the electrodes. Built-in nonlinear optomechanical modulation provides noiseless up-conversion of the oscillation signal all the way up to 16.4 GHz with −45-dBm signal power. We develop a phase noise model for the oscillator and identify the photodetector shot noise to be the dominant noise source. Using a high gain and low noise avalanche photodetector enables reduction of the far-from-carrier phase noise floor by 15dB. The phase noise model provides insights into understanding the influence of laser detuning on the oscillator noise performance, which has not been studied to date. [2013-0291]
Read full abstract