Lithography Method Research Articles

Tatian polynomial-based annular pupil wavefront optimization method for high-NA extreme ultraviolet lithography

Tatian polynomial-based annular pupil wavefront optimization method for high-NA extreme ultraviolet lithography

Planar waveguide to vertical mode couplers covering the visible to IR spectral range

Planar 45o turning mirrors with metal coating embedded in SU8 polymer waveguides enable waveguide to vertical mode coupling across a broad range of wavelengths from the visible to IR. The fabrication of these 2.5D structures is achieved using relatively simple grayscale lithography in thin film resists, compatible with standard planar lithography methods. Mirror losses of <1 dB are measured from 516 -1630 nm, and direct coupling to single mode fibre is achieved.

Optimizing dose parameters for enhanced maskless lithography in MoS2-based devices

Maskless lithography simplifies the fabrication process and reduces costs compared to electron beam (E-beam) lithography, making it a more efficient choice for patterning nano-devices. Maskless lithography presents a promising avenue for expediting device fabrication by eliminating the need for masks. This technique can streamline the production of basic electronic devices, offering an efficient and low-cost alternative to traditional lithographic methods, like E-beam lithography. This study utilized a 405 nm photodiode to achieve pattern-writing with a minimum linewidth of 1 μm. Exploring optimal parameters includes adjustments in beam intensity, scan speed, and step size. Maskless lithography was applied to 2D transition metal dichalcogenides (TMDCs) material, MoS2, to investigate their electrical transport characteristics. The fabricated device exhibits an ON/OFF ratio of ∼1.7 × 106 and a mobility of ∼0.833 cm2/V·s, indicating a high switching efficiency. The results demonstrate optimized maskless lithography's potential for swift and cost-effective fabrication, offering intermediate-resolution patterning capabilities.

Multimaterial Digital-Light Processing of Metal-Organic Framework (MOF) Composites: A Versatile Tool for the Rapid Microfabrication of MOF-Based Devices.

Patterning Metal-Organic Frameworks (MOFs) is essential for their use in sensing, electronics, photonics, and encryption technologies. However, current lithography methods are limited in their ability to pattern more than two MOFs, hindering the potential for creating advanced multifunctional surfaces. Additionally, balancing design flexibility, simplicity, and cost often results in compromises. This study addresses these challenges by combining Digital-Light Processing (DLP) with a capillary-assisted stop-flow system to enable multimaterial MOF patterning. It demonstrates the desktop fabrication of multiplexed arbitrary micropatterns across cm-scale areas while preserving the MOF's pore accessibility. The ink, consisting of a MOF crystal suspension in a low volatile solvent, a mixture of high molecular weight oligomers, and a photoinitiator, is confined by capillarity in the DLP projection area and quickly exchanged using syringe pumps. The versatility of this method is demonstrated by the direct printing of a ZIF-8-based luminescent oxygen sensor, a 5-component dynamic information concealment method, and a PCN-224-based colorimetric sensor for amines, covering disparate pore and analyte sizes. The multi-MOF capabilities, simplicity, and accessibility of this strategy pave the way for the facile exploration of MOF materials across a wide range of applications, with the potential to significantly accelerate the design-to-application cycle of MOF-based devices.

Defect-Free Nanowelding of Bilayer SnSe Nanoplates.

Nanowelding is a bottom-up technique to create custom-designed nanostructures and devices beyond the precision of lithographic methods. Here, a new technique is reported based on anisotropic lubricity at the van der Waals interface between monolayer and bilayer SnSe nanoplates and a graphene substrate to achieve precise control of the crystal orientation and the interface during the welding process. As-grown SnSe monolayer and bilayer nanoplates are commensurate with graphene's armchair direction but lack commensuration along graphene's zigzag direction, resulting in a reduced friction along that direction and a rail-like, 1D movement that permits joining nanoplates with high precision. This way, molecular beam epitaxially grown SnSe nanoplates of lateral sizes 30-100nm are manipulated by the tip of a scanning tunneling microscope at room temperature. In situ annealing is applied afterward to weld contacting nanoplates without atomic defects at the interface. This technique can be generalized to any van der Waals interfaces with anisotropic lubricity and is highly promising for the construction of complex quantum devices, such as field effect transistors, quantum interference devices, lateral tunneling junctions, and solid-state qubits.

Oxygen desorption enabled visible light sensing in embossed TiO2 nanogratings fabricated via thermal nanoimprinting

In this work, the fabrication of the nanoimprinted titanium dioxide (TiO2) gratings via thermal nanoimprinting lithography method (T-NIL) and its visible light response are studied. A polydimethylsiloxane (PDMS) primary mould, which in turn made via pattern transfer of micro/nano tracks present in the optical discs is used in T-NIL process. A transparent TiO2 film on a FTO substrate was subjected to pattern transfer from the PDMS mould. The imprinted TiO2 was post annealed to obtain anatase phase. The optical properties and photo response behaviour of plain and nanoimprinted TiO2 films were measured and compared. Raman spectroscopy measurements indicated the surface enhanced Raman scattering in imprinted samples. The imprinted TiO2 showed reduced reflectance compared to plain TiO2 films due to the increased light path length because of multiple reflections leading to in coupling of light. Photo response was observed under visible light illumination conditions, wherein imprinted TiO2 films showed appreciable photocurrent, which is otherwise very minimal in plain TiO2. The visible light photosensing in imprinted TiO2 occur due to the oxygen adsorption-desorption during the post deposition annealing and under illumination respectively. This work makes use of low-cost PDMS primary mould and T-NIL at favourable temperature and pressure conditions with a promising outlook for fabricating imprinted TiO2 with photo sensing ability and adaptability for large area upscaling.

Micropatterning of LaCoO3 thin films through a novel photosensitive sol-gel lithography technique and their magnetic properties

This paper presents a study on the microstructure and magnetic properties of LaCoO3 (LCO) thin films, and also the micropatterning of LCO thin films using a novel photo-sensitive sol-gel lithography method. It is found that higher heat-treatment temperature can promote the healing of cracks and filling of pores, resulting in refining the grains, and improving the density of LCO film. The film treated at 850 °C has a larger nucleation energy, which makes the distribution of nucleation sites more uniform, promoting the healing of cracks and filling of pores, refining the grains, and improving the density of LCO film. LCO precursor sol, metal chelates with UV photosensitivity were synthesized by adding BzAcH photosensitizer. LCO micro-arrays with diameters of 50 μm, as well as other fine patterns with a minimum line width of about 2 μm were successfully prepared by a UV mask lithography technique. In contrast, our novel lithography method eliminates the need for photoresist, as the fine pattern is formed during the preparation of the LCO gel film, which is the advantages of our lithography method over traditional techniques.

Free-space direct nanoscale 3D printing of metals and alloys enabled by two-photon decomposition and ultrafast optical trapping.

Nanoscale three-dimensional (3D) printing of metals and alloys has faced challenges in speed, miniaturization and deficiency in material properties. Traditional nanomanufacturing relies on lithographic methods with material constraints, limited resolution and slow layer-by-layer processing. This work introduces polymer-free techniques using two-photon decomposition and optical force trapping for free-space direct 3D printing of metals, metal oxides and multimetallic alloys with resolutions beyond optical limits. This method involves the two-photon decomposition of metal atoms from precursors, rapid assembly into nanoclusters via optical forces and ultrafast laser sintering, yielding dense, smooth nanostructures. Enhanced near-field optical forces from laser-induced localized surface plasmon resonance facilitate nanocluster aggregation. Our approach eliminates the need for organic materials, layer-by-layer printing and complex post-processing. Printed Mo nanowires show an excellent mechanical performance, closely resembling the behaviour of single crystals, while Mo-Co-W alloy nanowires outperform Mo nanowires. This innovation promises the customizable 3D nanoprinting of high-quality metals and metal oxides, impacting nanoelectronics, nanorobotics and advanced chip manufacturing.

Femtosecond laser processing of amorphous silicon films

Femtosecond laser micromachining is a pivotal approach within the dynamic field of laser surface structuring, offering unparalleled precision for materials processing. By exploiting the unique nonlinear light-matter interactions, this technique allows the creation of functional micro- and nanostructures with exceptional accuracy and reproducibility. Of particular interest is its ability to process diverse materials, including glasses, polymers, metals, and semiconductors, with minimal thermal impact and collateral damage. Moreover, femtosecond laser micromachining eliminates the need for traditional lithographic methods, enabling intricate structure fabrication under ambient conditions, thereby revolutionizing microfabrication techniques. This study demonstrates the micromachining using femtosecond lasers at 800 nm wavelength and explores the critical role of process parameters, such as laser pulse energy and the number of pulses in determining the damage threshold fluence, especially considering incubation effects in multi-pulse scenarios. Furthermore, it explores the potential of femtosecond laser micromachining for controlled crystallization in hydrogenated amorphous silicon (a-Si:H), unleashing enhanced electrical and optical properties. With its versatility, precision, and potential for diverse applications, femtosecond laser micromachining holds promise for driving advancements in electronic and photonic devices, particularly in high-efficiency photovoltaics, integrated photonics, and novel optoelectronic technologies.

Electron-Beam-Induced Modification of N-Heterocyclic Carbenes: Carbon Nanomembrane Formation.

Electron irradiation of self-assembled monolayers (SAMs) is a versatile tool for lithographic methods and the formation of new 2D materials such as carbon nanomembranes (CNMs). While the interaction between the electron beam and standard thiolate SAMs has been well studied, the effect of electron irradiation for chemically and thermally ultrastable N-heterocyclic carbenes (NHCs) remains unknown. Here we analyze electron irradiation of NHC SAMs featuring different numbers of benzene moieties and different sizes of the nitrogen side groups to modify their structure. Our results provide design rules to optimize NHC SAMs for effective electron-beam modification that includes the formation of sulfur-free CNMs, which are more suitable for ultrafiltration applications. Considering that NHC monolayers exhibit up to 100 times higher stability of their bonding with the metal substrate toward electron-irradiation compared to standard SAMs, they offer a new alternative for chemical lithography where structural modification of SAMs should be limited to the functional group.

(Invited) Plasmonic Nanofabrication of Chiral Nanodisk Ensembles

Chiral plasmonic nanostructures attract attention because those could be applied to enantioselective chemical sensors, optical isolators, light sources for circularly polarized light (CPL), metasurfaces, and metamaterials. In many cases, chiral plasmonic nanostructures are fabricated by a top-down method such as electron beam lithography (EBL). Since EBL is time-consuming and expensive, we have developed photoelectrochemical methods in which a site-selective reaction is driven by optical near field generated around anisotropic metal nanoparticles under right- or left-CPL. As anisotropic metal precursors for preparation of chiral nanoparticles, we have used gold or silver nanocuboids, nanorods, nanocubes, and triangular or hexagonal nanoplates so far.1-5 In the present work we demonstrate that laterally isotopic, circular nanodisks can also be used as precursors for the preparation of chiral nanostructures.We prepared ensembles of circular gold nanodisks on a glass plate by a nanosphere lithography method. A glass plate was coated with a gold thin film, and an array of polystyrene spheres (500 nm diameter) was prepared on the gold film. The polystyrene spheres were etched by oxygen plasma, and the exposed gold film was etched by argon ion milling. As a result, an ensemble of gold nanodisks (~200 nm diameter) was obtained. Each nanodisk was capped with a polystyrene cone, and the cap was removed by sonication in toluene if necessary. We used both capped and uncapped nanodisk ensembles. The ensemble was irradiated with visible right- or left-CPL in the presence of silver ions and sodium citrate. The obtained Au-Ag nanostructures exhibited circular dichroism (CPL), indicating that the nanostructures have chirality. Initial deposition at arbitrary site may break the geometric symmetry, resulting in the growth into chiral structures. Saito, K.; Tatsuma, T. Nano Lett. 2018, 18, 3209–3212.Morisawa, K.; Ishida, T.; Tatsuma, T. ACS Nano 2020, 14, 3603–3609.Shimomura, K.; Nakane, Y.; Ishida, T.; Tatsuma, T. Appl. Phys. Lett. 2023, 122, 151109.Homma, T.; Sawada, N.; Ishida, T.; Tatsuma, T. ChemNanoMat 2023, 9, e202300096.Ishida, T.; Isawa, A.; Kuroki, S.; Kameoka, Y.; Tatsuma, T. Appl. Phys. Lett. 2023, 123, 061111.

Magnetic field sensing elements based on Ni80Fe20 2D magnetoplasmonic crystals

Here we demonstrate the fabrication of magnetic field sensing elements based on 2D magnetoplasmonic crystals prepared using e-beam lithography and magnetron sputtering methods. The magnetoplasmonic crystals consist of square lattice diffraction gratings with varying filling factors layered with Ag, Ni80Fe20, and Si3N4 layers. Based on the magnetic, optical, and magneto-optical studies, the magnetoplasmonic crystal that allows for both high transverse Kerr effect and isotropic in-plane magnetic properties along the diffraction grating vectors was determined. The sensitivity and measuring range of this sample provide a perspective for measuring several components of an external magnetic field.

Low-dispersive silicon nitride waveguide resonators by nanoimprint lithography

In this study, we demonstrate the fabrication of waveguide resonators using nanoimprint technology. Without relying on traditionally costly lithography methods, such as electron-beam lithography or stepper lithography, silicon nitride (Si3N4) resonators with high-quality factors up to the order of 105 can be realized at C-band by nanoimprint lithography. In addition, by properly designing the waveguide geometry, a low-dispersive waveguide can be achieved with waveguide dispersion at around −35 ps/nm/km in the normal dispersion regime, and the waveguide dispersion can be further tuned to be 29 ps/nm/km in the anomalous dispersion regime with the polymer cladding. The tunability of nanoimprinted devices is demonstrated by the aid of microheaters, realizing on-chip optical functionalities. This work offers the potential to fabricate low-dispersive waveguide resonators for integrated modulators and filters in a significantly cost-effective and process-friendly scheme.

Template-Oriented-Assembly microsphere lithography for multi-type SiC microlens arrays

Silicon carbide (SiC) microlens arrays (MLAs) with a defined layout are used as an optical homogenizer in extremely high-temperature environments due to their excellent physicochemical properties. In this paper, a novel template-oriented-assembly microsphere lithography (TMSL) method is proposed to fabricate SiC MLA. Firstly, the metal micropyramid array (MPA) template was designed and fabricated by ultraprecision cutting and then converted to a polydimethylsiloxane (PDMS) surface. After that, the microspheres were assembled into a monolayer on the inverted MPA of PDMS. Subsequently, the microsphere array monolayer (MSM) was used as the stamper in the hot embossing process to create the photoresist MLA mask. Finally, the patterns on the photoresist mask were transferred to the SiC substrate by inductively coupled plasma (ICP) etching. The layout of lens units was determined by the MPA template and the positioning accuracy of MLA unit is mainly influenced by the form error in MPA mold manufacturing process. The transfer mechanism from the metal MPA template to SiC MLA was studied, and the transfer characteristics of theoretical analyses and experimental results were compared, confirming the feasibility and advantages of the TMSL method.

Study on Electrical and Mechanical Properties of Double-End Supported Elastic Substrate Prepared by Wet Etching Process.

Preparing elastic substrates as a carrier for dual-end supported nickel chromium thin film strain sensors is crucial. Wet etching is a vital microfabrication process widely used in producing microelectronic components for various applications. This article combines lithography and wet etching methods to microprocess the external dimensions and rectangular grooves of 304 stainless steel substrates. The single-factor variable method was used to explore the influence mechanism of FeCl3, HCl, HNO3, and temperature on the etching rate, etching factor, and etching surface roughness. The optimal etching parameter combination was summarized: an FeCl3 concentration of 350 g/L, HCl concentration of 150 mL/L, HNO3 concentration of 100 mL/L, and temperature of 40 °C. In addition, by comparing the surface morphology, microstructure, and chemical and mechanical properties of a 304 stainless steel substrate before and after etching treatment, it can be seen that the height difference of the substrate surface before and after etching is between 160 μm and -70 μm, which is basically consistent with the initial design of 0.2 mm. The results of an XPS analysis and Raman spectroscopy analysis both indicate that the surface C content increases after etching, and the corrosion resistance of the surface after etching decreases. The nano-hardness after etching increased by 26.4% compared to before, and the ζ value decreased by 7%. The combined XPS and Raman results indicate that the changes in surface mechanical properties of 304 stainless steel substrates after etching are mainly caused by the formation of micro-nanostructures, grain boundary density, and dislocations after wet etching. Compared with the initial rectangular substrate, the strain of the I-shaped substrate after wet etching increased by 3.5-4 times. The results of this study provide the preliminary process parameters for the wet etching of a 304 stainless steel substrate of a strain measuring force sensor and have certain guiding significance for the realization of simple steps and low cost of 304 stainless steel substrate micro-nano-processing.

Laser nanofabrication inside silicon with spatial beam modulation and anisotropic seeding

Nanofabrication in silicon, arguably the most important material for modern technology, has been limited exclusively to its surface. Existing lithography methods cannot penetrate the wafer surface without altering it, whereas emerging laser-based subsurface or in-chip fabrication remains at greater than 1 μm resolution. In addition, available methods do not allow positioning or modulation with sub-micron precision deep inside the wafer. The fundamental difficulty of breaking these dimensional barriers is two-fold, i.e., complex nonlinear effects inside the wafer and the inherent diffraction limit for laser light. Here, we overcome these challenges by exploiting spatially-modulated laser beams and anisotropic feedback from preformed subsurface structures, to establish controlled nanofabrication capability inside silicon. We demonstrate buried nanostructures of feature sizes down to 100 ± 20 nm, with subwavelength and multi-dimensional control; thereby improving the state-of-the-art by an order-of-magnitude. In order to showcase the emerging capabilities, we fabricate nanophotonics elements deep inside Si, exemplified by nanogratings with record diffraction efficiency and spectral control. The reported advance is an important step towards 3D nanophotonics systems, micro/nanofluidics, and 3D electronic-photonic integrated systems.

Edge smoothness enhancement of digital lithography based on the DMDs collaborative modulation

The rough saw-tooth edge caused by the inherent microstructures of digital micromirror device (DMD) will reduce the quality of the lithography pattern. Comprehensively considering the manufacturing efficiency, precision and cost, we propose a DMDs collaborative modulation lithography method to improve the smoothness of the lithography pattern edge. Through combining two misaligned DMDs to collaboratively modulate exposure dose, the better edge smoothness can be achieved. Collaborative exposure with 1/2 DMD pixel misalignment and 1/4 DMD pixel misalignment are both implemented to form the step-shape lithography patterns. The experimental results show that the saw-tooth edge can approximate to a straight line when increasing the number of times of the collaborative exposure. Further error analysis indicates it is effective to improve the edge smoothness while ensuring the lithography quality by using the collaborative modulation lithography. These results indicate that the DMDs collaborative modulation lithography is a promising technique for fabrication of microstructures, which may be a solution for balancing the fabrication precision, efficiency and cost.

Bowtie Nanoantenna LSPR Biosensor for Early Prediction of Preeclampsia.

The concentration of the placental circulating factor in early pregnancy is often extremely low, and the traditional prediction method cannot meet the clinical demand for early detection preeclampsia in high-risk gravida. It is of prime importance to seek an ultra-sensitive early prediction method. In this study, finite-different time-domain (FDTD) and Discrete Dipole Approximation (DDA) simulation, and electron beam lithography (EBL) methods were used to develop a bowtie nanoantenna (BNA) with the best field enhancement and maximum coupling efficiency. Bio-modification of the placental circulating factor (sFlt-1, PLGF) to the noble nanoparticles based on the amino coupling method were explored. A BNA LSPR biosensor which can specifically identify the placental circulating factor in preeclampsia was constructed. The BNA LSPR biosensor can detect serum placental circulating factors without toxic labeling. Serum sFlt-1 extinction signal (Δλmax) in the preeclampsia group was higher than that in the normal pregnancy group (14.37 ± 2.56 nm vs. 4.21 ± 1.36 nm), p = 0.008, while the serum PLGF extinction signal in the preeclampsia group was lower than that in the normal pregnancy group (5.36 ± 3.15 nm vs. 11.47 ± 4.92 nm), p = 0.013. The LSPR biosensor detection results were linearly consistent with the ELISA kit. LSPR biosensor based on BNA can identify the serum placental circulating factor of preeclampsia with high sensitivity, without toxic labeling and with simple operation, and it is expected to be an early detection method for preeclampsia.

Advancing Tissue Culture with Light-Driven 3D-Printed Microfluidic Devices.

Three-dimensional (3D) printing presents a compelling alternative for fabricating microfluidic devices, circumventing certain limitations associated with traditional soft lithography methods. Microfluidics play a crucial role in the biomedical sciences, particularly in the creation of tissue spheroids and pharmaceutical research. Among the various 3D printing techniques, light-driven methods such as stereolithography (SLA), digital light processing (DLP), and photopolymer inkjet printing have gained prominence in microfluidics due to their rapid prototyping capabilities, high-resolution printing, and low processing temperatures. This review offers a comprehensive overview of light-driven 3D printing techniques used in the fabrication of advanced microfluidic devices. It explores biomedical applications for 3D-printed microfluidics and provides insights into their potential impact and functionality within the biomedical field. We further summarize three light-driven 3D printing strategies for producing biomedical microfluidic systems: direct construction of microfluidic devices for cell culture, PDMS-based microfluidic devices for tissue engineering, and a modular SLA-printed microfluidic chip to co-culture and monitor cells.

Poisson Effect‐Assisted Replication Lithography for Rapid Fabrication of Three‐Dimensional Microstructures

Demands for micro‐ and nano‐fabrication techniques have been increasing over recent decades due to their foundational importance in fields such as electronics, sensors, displays, biotechnologies, and energy technologies. Still, the rapid and efficient fabrication of complex 3D microstructures has long been a challenge due to the inherent limitations of conventional imprint lithography and the slow fabrication speed of maskless lithography systems using femtosecond lasers. This study introduces a novel lithographic replication method for the rapid replication of intricate 3D microstructures with closed‐loops by leveraging the Poisson effect‐driven lateral deformation of soft molds. Specifically, the suggested technique employs an elastomeric soft mold, engraved with negative cavity parts of the target structure separated by intentional gaps. Lateral deformation of the material allows the separated cavities to assemble for replication of target microstructure and defectless release from the soft mold. In addition to the experimental demonstrations of the proposed method using well‐known materials like polydimethysliloxane (PDMS) for the soft mold and UV‐curable polyurethane acrylate (PUA) for replication, essential considerations such as material selection and master mold design are discussed. The presented method not only broadens the capabilities of imprint lithographic techniques but also holds promise for the large scale, continuous fabrication of complex 3D microstructures.