Poisson Effect‐Assisted Replication Lithography for Rapid Fabrication of Three‐Dimensional Microstructures

Abstract

Demands for micro‐ and nano‐fabrication techniques have been increasing over recent decades due to their foundational importance in fields such as electronics, sensors, displays, biotechnologies, and energy technologies. Still, the rapid and efficient fabrication of complex 3D microstructures has long been a challenge due to the inherent limitations of conventional imprint lithography and the slow fabrication speed of maskless lithography systems using femtosecond lasers. This study introduces a novel lithographic replication method for the rapid replication of intricate 3D microstructures with closed‐loops by leveraging the Poisson effect‐driven lateral deformation of soft molds. Specifically, the suggested technique employs an elastomeric soft mold, engraved with negative cavity parts of the target structure separated by intentional gaps. Lateral deformation of the material allows the separated cavities to assemble for replication of target microstructure and defectless release from the soft mold. In addition to the experimental demonstrations of the proposed method using well‐known materials like polydimethysliloxane (PDMS) for the soft mold and UV‐curable polyurethane acrylate (PUA) for replication, essential considerations such as material selection and master mold design are discussed. The presented method not only broadens the capabilities of imprint lithographic techniques but also holds promise for the large scale, continuous fabrication of complex 3D microstructures.