Photoelectron spectroscopy (PES) and photon stimulated desorption (PSD) experiments were carried out to follow the thermal chemistry of methane- (CH 4), neopentane- (C 5H 12), and adamantane- (C 10H 16)-dosed-Si(111)-7 × 7 surfaces. Both methane and adamantane adsorb molecularly on the 7 × 7 reconstructed Si surface at temperatures of 30 and 85 K, respectively. In contrast, at low coverages (<7 × 10 15 molecules/cm 2, 85 K; 0.4 ML), a fraction of the neopentane adlayer adsorbs dissociatively; at higher coverages, neopentane adsorption is predominantly molecular. Conversely, the adamantane and neopentane adlayers desorb at temperatures of ∼200 and 115 K, respectively, for heating rates of ∼1 K/min. No desorption temperature was determined for methane, but the methane adlayer was observed to desorb below 100 K. As determined by both PES and PSD, annealed adamantane- and neopentane-dosed surfaces react to form nearly identical surfaces. Si 2p core-level spectra show chemically shifted components of 0.48±0.05, 1.00±0.05, and 1.50±0.05 eV with respect to the bulk component. This demonstrates formation of Si(CH y) x ( x=1-3; y=0-3) type surface species. The H + PSD spectra of the thermally reacted surfaces were measured and show chemical shifts of ∼0.7 eV with respect to bulk Si and two sharp resonances at 100.7 and 101.3 eV. The edge shift and associated structure highlights the chemical specificity of PSD and demonstrates its utility for following surface chemical reactions.
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