Metamorphic Buffer Research Articles

InP-based strain engineered InAs(Sb)/InAsPSb multiple quantum wells with tunable emission and high internal quantum efficiency enabled by Sb incorporation

A type I InAs(Sb)/InAsPSb strain engineered multiple quantum wells light emitting diodes system has been demonstrated. Tensile InAsPSb quantum barriers with a high degree of band offset (∆EC = 116–123 meV, ∆EV = 193–250 meV) were used to compensate for the high compressive strain of the InAs(Sb) quantum wells. The structure was grown on the n+-InAsxP1−x metamorphic buffer with a high degree of relaxation (98%), low surface roughness (0.69 nm), and low dislocation density. Through careful strain engineering design, the compressive strain of InAs(Sb) reaches 0.57%–1.52% without strain relaxation. The incorporation of Sb into the multiple quantum wells not only reduces the bandgap but also improves the interface quality by acting as an effective surfactant. Structural analysis reveals superior quality in InAsSb/InAsPSb multiple quantum wells compared to InAs/InAsPSb multiple quantum wells, demonstrating significantly reduced interface roughness and suppression of the Stranski–Krastanov growth mode. Room temperature electroluminescence measurements show a tunable emission wavelength ranging from 2.7 to 3.3 μm, accompanied by a narrow full width at half maximum value of 45 meV. Photoluminescence analysis indicates that the internal quantum efficiency of InAsSb/InAsPSb multiple quantum wells is 5.5%, which is 7 times higher than that of InAs/InAsPSb.

Abrupt ternary III–V metamorphic buffers

Emerging quantum materials as well as novel traditional electronic and photonic materials may enable a new generation of information science devices if they can be synthesized on suitable substrates. Additionally, material and device designs may benefit from tunable properties through engineered epitaxial strain for the manipulation of the electronic character. In this work, three series of III–V ternary alloys, GaInSb, AlInSb, and InAsSb, are grown via molecular beam epitaxy on GaAs (001) substrates to explore the flexibility of abrupt metamorphic epitaxial layers with tunable lattice parameters between 6.135 and 6.479 Å. Their deposition on both homomorphic GaAs and pseudomorphic AlAs buffers is also explored. The structures of these alloys are characterized via reflection high-energy electron diffraction, high-resolution x-ray diffraction, atomic force microscopy, and transmission electron microscopy to assess their suitability as stable buffer layers with wide variability of accessible lattice parameters.

Design engineering of non-linear graded InAlAs metamorphic buffer layers for efficient reduction of misfit dislocation density

Metamorphic InxAl1-xAs (xmax > 0.75) buffer layer (MBL) grown on GaAs with an optimized non-linear graded composition profile along the growth direction is proposed for enhanced reduction of misfit dislocation (MD) density in highly mismatched III-V/GaAs metamorphic heterostructures. The equilibrium distributions of MD density throughout such InxAl1-xAs/GaAs MBLs are calculated. The influence of the initial composition (xmin) of MBL and the elastically strained thin GaAs layer embedded into the InxAl1-xAs MBL on the MD density distribution was studied. An optimum value of the inverse step (Δ), representing the difference between the top In content of the InxAl1-xAs MBL and that of a In0.75Al0.25As virtual substrate (VS) grown atop is determined. It was theoretically shown that Δ above 0.04 results in relaxation of the elastic stresses in VS via formation of the MDs, while the lower Δ values allow growing the VS completely free of MDs. Finally, the metamorphic In0.75Al0.25As/graded-InAlAs/GaAs heterostructures differing from each other by only the composition profile of the graded-InAlAs MBL were grown by MBE on GaAs(001) and studied by atomic force microscopy. The structure with proposed optimized non-linear graded (x = 0.05–0.77) MBL demonstrated the ∼ 1.5 times less MD density as compared to that with the convex-graded (x = 0.05–0.81) MBL, which was estimated to be at the level of ∼ 2·107 cm−2.

Influence of an Overshoot Layer on the Morphological, Structural, Strain, and Transport Properties of InAs Quantum Wells.

InAs quantum wells (QWs) are promising material systems due to their small effective mass, narrow bandgap, strong spin-orbit coupling, large g-factor, and transparent interface to superconductors. Therefore, they are promising candidates for the implementation of topological superconducting states. Despite this potential, the growth of InAs QWs with high crystal quality and well-controlled morphology remains challenging. Adding an overshoot layer at the end of the metamorphic buffer layer, i.e., a layer with a slightly larger lattice constant than the active region of the device, helps to overcome the residual strain and provides optimally relaxed lattice parameters for the QW. In this work, we systematically investigated the influence of overshoot layer thickness on the morphological, structural, strain, and transport properties of undoped InAs QWs on GaAs(100) substrates. Transmission electron microscopy reveals that the metamorphic buffer layer, which includes the overshoot layer, provides a misfit dislocation-free InAs QW active region. Moreover, the residual strain in the active region is compressive in the sample with a 200 nm-thick overshoot layer but tensile in samples with an overshoot layer thicker than 200 nm, and it saturates to a constant value for overshoot layer thicknesses above 350 nm. We found that electron mobility does not depend on the crystallographic directions. A maximum electron mobility of 6.07 × 105 cm2/Vs at 2.6 K with a carrier concentration of 2.31 × 1011 cm-2 in the sample with a 400 nm-thick overshoot layer has been obtained.

High electron mobility in metamorphic epitaxial InAs0.7Sb0.3 compound and its p-i-n photodetector

Our study explores growth techniques and the electrical/optical behavior of InAs0.7Sb0.3 compounds on GaAs substrates, utilizing various metamorphic buffer layers. The InAlSb graded-buffer layer emerged as the most promising, displaying a remarkable electron mobility of 26,370 cm/V∙s, a record high. It signifies excellent lateral crystal quality for room-temperature carrier transport. Meanwhile, the presence of micro-twins, evident in cross-sectional TEM images, degrades vertical crystal quality. We further assess crystal quality through low-temperature Hall mobility and photoresponses, featuring reduced bowing parameters. These findings offer valuable insights for optimizing metamorphic growth platforms for ternary InAsSb compounds.

Growth of telecom C-band In(Ga)As quantum dots for silicon quantum photonics

Photonic integrated circuits (PICs) based on the silicon-on-insulator platform currently allow high-density integration of optical and electro-optical components on the same chip. This high complexity is also transferred to quantum PICs, where non-linear processes are used for the generation of quantum light on the silicon chip. However, these intrinsically probabilistic light emission processes pose challenges to the ultimately achievable scalability. Here, an interesting solution would be employing on-demand sources of quantum light based on III–V platforms, which are nonetheless very complex to grow directly on silicon. In this paper, we show the integration of InAs quantum dots (QDs) on silicon via the growth on a wafer-bonded GaAs/Si template. To ensure emission in the telecom C-band (∼1550 nm), a metamorphic buffer layer approach is utilized. We show that the deposited single QDs show similar performance to their counterparts directly grown on the well-established GaAs platform. Our results demonstrate that on-demand telecom emitters can be directly and effectively integrated on silicon, without compromises on the performances of either the platforms.

Development of “GaSb-on-silicon” metamorphic substrates for optoelectronic device growth

The epitaxial development and characterization of metamorphic “GaSb-on-silicon” buffers as substrates for antimonide devices is presented. The approach involves the growth of a spontaneously and fully relaxed GaSb metamorphic buffer in a primary epitaxial reactor, and use of the resulting “GaSb-on-silicon” wafer to grow subsequent layers in a secondary epitaxial reactor. The buffer growth involves four steps—silicon substrate preparation for oxide removal, nucleation of AlSb on silicon, growth of the GaSb buffer, and finally capping of the buffer to prevent oxidation. This approach on miscut silicon substrates leads to a buffer with negligible antiphase domain density. The growth of this buffer is based on inducing interfacial misfit dislocations between an AlSb nucleation layer and the underlying silicon substrate, which results in a fully relaxed GaSb buffer. A 1 μm thick GaSb layer buffer grown on silicon has ∼9.2 × 107dislocations/cm2. The complete lack of strain in the epitaxial structure allows subsequent growths to be accurately lattice matched, thus making the approach ideal for use as a substrate. We characterize the GaSb-on-silicon wafer using high-resolution x-ray diffraction and transmission electron microscopy. The concept’s feasibility is demonstrated by growing interband cascade light emitting devices on the GaSb-on-silicon wafer. The performance of the resulting LEDs on silicon approaches that of counterparts grown lattice matched on GaSb.

Quantum Cascade Lasers Grown by Metalorganic Chemical Vapor Deposition on Foreign Substrates with Large Surface Roughness

The surface morphology of a buffer template is an important factor in the heteroepitaxial integration of optoelectronic devices with a significant lattice mismatch. In this work, InP-based long-wave infrared (~8 µm) emitting quantum cascade lasers with active region designs lattice-matched to InP were grown on GaAs and Si substrates employing InAlGaAs step-graded metamorphic buffer layers, as a means to assess the impact of surface roughness on device performance. A room-temperature pulsed-operation lasing with a relatively good device performance was obtained on a Si template, even with a large RMS roughness of 17.1 nm over 100 µm2. Such results demonstrate that intersubband-operating devices are highly tolerant to large RMS surface roughness, even in the presence of a high residual dislocation density.

Toward Ga‐Free Wavelength Extended 2.6 µm InAsP Photodetectors with High Performance

AbstractShort‐wavelength infrared (SWIR) photodetectors are of great interest owing to their unique advantages of SWIR imaging such as better penetration ability and improved sensitivity that allow high‐resolution imaging. Commercially, extended InxGa1‐xAs heterojunction detectors with cut‐off wavelengths beyond λc = 1.7 µm are incorporated into SWIR imagers. However, their large dark current and limited cut‐off wavelength tunability prevent their widespread use in SWIR imaging. Herein, a novel InAs0.85P0.15 homojunction detector with λc = 2.6 µm is achieved through lattice and bandgap engineering with well‐designed InAsyP1‐y metamorphic buffers. Compared to conventional In0.83Ga0.17As/InP detectors with a lattice mismatch of f = 2.0%, the InAs0.85P0.15 detector with f = 2.7% exhibits full strain relaxation and lower surface roughness (2.4 nm due to its superior crystallinity). Photocarrier generation in the InAsP detector is more efficiently supported by a smaller entropy for electron–hole pair formation. The lower trap density and longer carrier lifetime of the InAsP detector decrease the dark current, leading to high uniform detectivities of ≈1.0 × 109 cm Hz1/2 W−1 over a wider voltage range at 300 K. Such an InAsP metamorphic detector with excellent photodetection capabilities is expected to find applications in the implementation of large‐format focal plane arrays for extended SWIR imaging.

Effect of Trap Behavior on the Reliability Instability of Metamorphic Buffer in InAlAs/InGaAs MHEMT on GaAs.

Our investigation focused on assessing the influence of the metamorphic buffer in metamorphic high-electron-mobility transistors (MHEMT) that were grown on GaAs substrates. While an MHEMT exhibited elevated off-state current levels, its direct current (DC) and radio frequency (RF) traits were found to be comparable to those of InP-based lattice-matched high-electron-mobility transistors (LM-HEMTs). However, the Pulsed I-V measurement results confirmed the presence of the fast transient charging effect, leading to a more substantial degradation in drain current observed in MHEMT. In addition, through the low-frequency noise characteristics, it was confirmed that the dominant trapping location was located in the bulk site. The slope of the 1/f noise measurement indicated that the primary trapping site was in proximity to the bulk traps. The carrier-number-fluctuation (CNF) model was employed to extract the bulk trap density (Nt). For the LM-HEMTs, the value was at 3.27 × 1016 eV-1·cm-3, while for the MHEMT, it was 3.56 × 1017 eV-1·cm-3.

Structural properties of graded In x GaAs metamorphic buffer layers for quantum dots emitting in the telecom bands

In recent years, there has been a significant increase in interest in tuning the emission wavelength of InAs quantum dots (QDs) to wavelengths compatible with the already existing silica fiber networks. In this work, we develop and explore compositionally graded In x GaAs metamorphic buffer layers (MBLs), with lattice constant carefully tailored to tune the emission wavelengths of InAs QDs towards the telecom O-band. The designed heterostructure is grown by molecular beam epitaxy (MBE), where a single layer of InAs QDs is grown on top of the MBL and is capped with a layer having a fixed indium (In) content. We investigate the structural properties of the grown MBLs by reciprocal space mapping, as well as transmission electron microscopy, and verify the dependence of the absorption edge of the MBL on the In-content by photothermal deflection spectroscopy measurements. This allows us to identify a growth temperature range for which the MBLs achieve a near-equilibrium strain relaxation for In-content up to ∼30. Furthermore, we explore the emission wavelength tunability of QDs grown on top of a residual strained layer with a low density of dislocations. Specifically, we demonstrate a characteristic red-shift of the QD photoluminescence towards the telecom O-band (1300 nm) at low temperature. This study provides insights into the relaxation profiles and dislocation propagation in compositionally graded MBLs grown via MBE thus paving the way for realizing MBE-grown heterostructures containing InAs QDs for advanced nanophotonic devices emitting in the telecom bands.

8.1 μ m-emitting InP-based quantum cascade laser grown on Si by metalorganic chemical vapor deposition

This study presents the growth and characterization of an 8.1 μm-emitting, InGaAs/AlInAs/InP-based quantum cascade laser (QCL) formed on an InP-on-Si composite template by metalorganic chemical vapor deposition (MOCVD). First, for the composite-template formation, a GaAs buffer layer was grown by solid-source molecular-beam epitaxy on a commercial (001) GaP/Si substrate, thus forming a GaAs/GaP/Si template. Next, an InP metamorphic buffer layer (MBL) structure was grown atop the GaAs/GaP/Si template by MOCVD, followed by the MOCVD growth of the full QCL structure. The top-surface morphology of the GaAs/GaP/Si template before and after the InP MBL growth was assessed via atomic force microscopy, over a 100 μm2 area, and no antiphase domains were found. The average threading dislocation density (TDD) for the GaAs/GaP/Si template was found to be ∼1 × 109 cm−2, with a slightly lower defect density of ∼7.9 × 108 cm−2 after the InP MBL growth. The lasing performance of the QCL structure grown on Si was compared to that of its counterpart grown on InP native substrate and found to be quite similar. That is, the threshold-current density of the QCL on Si, for deep-etched ridge-guide devices with uncoated facets, is somewhat lower than that for its counterpart on native InP substrate, 1.50 vs 1.92 kA/cm2, while the maximum output power per facet is 1.64 vs 1.47 W. These results further demonstrate the resilience of QCLs to relatively high residual TDD values.

Strain-balanced InGaAs/AlInAs/InP quantum cascade laser grown on GaAs by MOVPE

A systematic study was performed to elucidate the properties of strained-layer InGaAs/AlInAs superlattices (SL) on metamorphic buffer layers grown by MOVPE on GaAs substrates. Differences observed in surface morphology indicate relatively tight control over the SL average net-strain is required for the growth of micron-thick SL structures, as needed for quantum cascade laser (QCL) active regions. Using such conditions, 5.7 μm-emitting, strain-balanced InP-based QCLs grown on (001) GaAs were demonstrated with comparable device performance to their counterparts grown on native InP substrate. 3 mm-long and 25 μm-wide uncoated-facets devices, grown on GaAs and having epi-side lateral contacts, provide peak-pulsed output powers of 2.65 W per facet at room temperature. The corresponding threshold-current density and maximum wall-plug efficiency is 1.61 kA/cm2 and 6.0% respectively. HR-XRD measurements of the strain-balanced QCL grown on GaAs show broadened satellite peaks which are well aligned with the peaks from their counterparts grown on InP.

Dislocation and strain mapping in metamorphic parabolic-graded InGaAs buffers on GaAs

We investigate different architectures for parabolic-graded InGaAs metamorphic buffers grown on GaAs using transmission electron microscopy techniques. The different architectures include InGaP and AlInGaAs/InGaP superlattices with different GaAs substrate misorientations and the inclusion of a strain balancing layer. Our results correlate: (i) the density and distribution of dislocations in the metamorphic buffer and (ii) the strain in the next layer preceding the metamorphic buffer, which varies for each type of architecture. Our findings indicate that the dislocation density in the lower region of the metamorphic layer ranges between 108 and 1010 cm−2, with AlInGaAs/InGaP superlattice samples exhibiting higher values compared to samples with InGaP films. We have identified two waves of dislocations, with threading dislocations typically located lower in the metamorphic buffer (~ 200–300 nm) in comparison to misfit dislocations. The measured localised strain values are in good agreement with theoretical predications. Overall, our results provide a systematic insight into the strain relaxation across different architectures, highlighting the various approaches that can be used to tailor strain in the active region of a metamorphic laser.Graphical abstract

Interplay Between Strain and Thickness on the Effective Carrier Lifetime of Buffer-Mediated Epitaxial Germanium Probed by the Photoconductance Decay Technique

We report contactless effective minority carrier lifetime of epitaxially grown unstrained and in-plane <110> biaxially tensile-strained (001) germanium (ε-Ge) epilayers measured using microwave-reflectance photoconductance decay measurements. Strained Ge epilayers were grown using InxGa1–xAs linearly graded buffers on (001) GaAs substrates. Using homogeneous excitation of unstrained Ge epilayers, thickness-dependent separation of minority carrier lifetime components under low injection conditions yielded a bulk lifetime of 114 ± 2 ns and low surface recombination velocity of 21.3 ± 0.04 cm/s. More notably, an effective minority carrier lifetime of >100 ns obtained from sub-50 nm 1.6% tensile-strained Ge epilayers showed no degradation relative to the unstrained counterpart. Detailed material characterization using X-ray diffractometry revealed successful strain transfer of 0.61 and 0.89% to the Ge epilayers via InxGa1–xAs metamorphic buffers and confirms pseudomorphic growth. Lattice coherence observed at the ε-Ge epilayer and InxGa1–xAs buffer heterointerfaces via transmission electron microscopy substantiates the prime material quality achieved. The relatively high carrier lifetimes achieved are an indicator of excellent material quality and provide a path forward to realize low-threshold Ge laser sources.

InAs quantum emitters at telecommunication wavelengths grown by droplet epitaxy

InAs quantum dots at telecommunication wavelengths are desired as single-photon sources, but a growth technique that enables wide control over quantum dot size, density, and morphology is needed. Droplet epitaxy is well suited for this purpose, but InAs nanostructures tend to form as rings on (001) InGaAs, InAlAs, and InP surfaces. In this work, we investigate how surface diffusion can be manipulated to grow quantum dots by molecular beam epitaxy without using high-index substrates or metamorphic buffers. First, surface diffusion characteristics of In on In0.52Al0.48As are compared to In and Ga on In0.53Ga0.47As. Then, a two-step arsenic exposure protocol is applied to modify the droplet crystallization step, resulting in a series of different nanostructure morphologies that have narrow-linewidth emission between 1200 and 1520 nm at 4 K. Ultimately, we show that controlling surface diffusion of the group-III species during growth is critical for achieving quantum dots appropriate for single-photon sources at telecommunication wavelengths.

High peak power quantum cascade lasers monolithically integrated onto silicon with high yield and good near-term reliability

High peak power, room-temperature operation in the long wave infrared spectral region is reported for double-channel, ridge waveguide quantum cascade lasers (QCLs) monolithically integrated onto a silicon substrate. The 55-stage laser structure with an AlInAs/InGaAs core and InP cladding was grown by molecular beam epitaxy directly onto an 8-in. diameter germanium-coated silicon substrate template via a III–V alloy metamorphic buffer. Atomic force microscope imaging demonstrated a good quality surface for the full QCL structure grown on silicon, with improved roughness over wider areas compared to the previous work. Fabricated 3 mm × 26 μm lasers operate at room temperature, deliver more than 3 W of peak (6 mW of average) optical power, and show approximately 3% wall plug efficiency and 4.3 kA/cm2 threshold current density with emission wavelength centered at 11.5 μm. The lasers had a high yield with only around 15% max power deviation and no signs of performance degradation were observed over a 10 h burn in period at maximum power. Singled-lobed high quality output beam with M2 = 1.36 was measured for 3 mm × 22 μm devices, demonstrating that it is possible to produce high-brightness quantum cascade lasers on silicon with standard ridge waveguide processing paving the way for low-cost production of integrated mid-infrared platforms.

Fourier-transform infrared photoreflectance spectroscopy of the InSb/InAs/In(Ga,Al)As/GaAs metamorphic heterostructures with a superlattice waveguide

Fourier-transform infrared photoreflectance (PR) spectroscopy was used to study the energy spectrum of InSb/InAs/In(Ga,Al)As/GaAs metamorphic heterostructures with a superlattice waveguide at room temperature (RT). Theoretical calculations in the framework of the eight-band Kane model were performed to obtain a reliable knowledge of the actual energies of the most probable optical transitions. The experimental results were analyzed to determine the influence of the design features and stress balance on the energy spectra of the structures. Photoluminescence studies performed at 11 K and RT, as well as the determination of the internal quantum efficiency of luminescence, enabled us to characterize the emission characteristics of the structures, regardless of their waveguide efficiency. The structure with a 5-nm-thick GaAs insertion within the metamorphic buffer layer exhibited the highest probability of the main optical transition observed in the PR spectra as well as the highest luminescence intensity and quantum efficiency.

Reduction of misfit dislocation density in metamorphic heterostructures by design optimization of the buffer layer with non-linear graded composition profile

Equilibrium distributions of misfit dislocation density along the growth direction of metamorphic buffer layers InxAl1-xAs/GaAs with maximum In content xmax≥0.77 and different non-linear graded composition profiles x propto z1/n are calculated. The effect of the initial In composition (n=2) of InxAl1-xAs buffer layer with convex-graded (xmin) composition profile on misfit dislocation density as well as amount of residual stresses at its top part is considered. Using computational approach, it was shown that a dislocation-free region is formed under thin tensile-strained GaAs layer (1-10 nm) inserted into InAlAs metamorphic buffer layer, which agrees with experimental data obtained early by transmission electron microscopy. Novel non-linear graded composition profile of metamorphic buffer layer has been proposed, which results in twice reduction of misfit dislocation density as compared to the convex-graded one. In addition, equilibrium distributions of misfit dislocation density in the HEMT heterostructures with two-dimensional electron channel InxAl1-xAs, which are based on In0.75Ga0.25As/In0.75Al0.25As metamorphic buffer layer of various designs, are calculated. The values of inverse steps (Delta), representing the difference between the maximum In content of InxAl1-xAs (xmax) and In content of In0.75Al0.25As virtual substrate, at which relaxation of the elastic strains in 2D channel In0.75Ga0.25As/In0.75Al0.25As doesn't occur, are calculated for metamorphic buffer layers InxAl1-xAs with convex-graded and optimized non-linear graded composition profiles. Keywords: metamorphic heterostructures, metamorphic buffer layer, misfit dislocations, elastic stresses, In(Ga,Al)As/GaAs.

Снижение плотности дислокаций в метаморфных гетероструктурах путем оптимизации конструкции буферного слоя с нелинейным профилем изменением состава

Equilibrium distributions of misfit dislocation density along the growth direction of metamorphic buffer layers InxAl1-xAs/GaAs with maximum In content xmax ≥ 0.77 and different non-linear graded composition profiles (x ∝ z1/n) are calculated. The effect of the initial In composition (xmin) of InxAl1-xAs buffer layer with convex-graded (n = 2) composition profile on misfit dislocation density as well as amount of residual stresses at its top part is considered. Using computational approach, it was shown that a dislocation-free region is formed under thin tensile-strained GaAs layer (1–10 nm) inserted into InAlAs metamorphic buffer layer, which agrees with experimental data obtained early by transmission electron microscopy. Novel non-linear graded composition profile of metamorphic buffer layer has been proposed, which results in twice reduction of misfit dislocation density as compared to the convex-graded one. In addition, equilibrium distributions of misfit dislocation density in the HEMT heterostructures with two-dimensional electron channel In0.75Ga0.25As/In0.75Al0.25As, which are based on InxAl1-xAs/GaAs metamorphic buffer layer of various designs, are calculated. The values of inverse steps (∆), representing the difference between the maximum In content of InxAl1-xAs (xmax) and In content of In0.75Al0.25As virtual substrate, at which relaxation of the elastic strains in 2D channel In0.75Ga0.25As/In0.75Al0.25As doesn’t occur, are calculated for metamorphic buffer layers InxAl1-xAs with convex-graded and optimized non-linear graded composition profiles.