Compliant mechanism, a joint less mechanism is extensively being used for precision application such as biomedical, micro electro mechanical system (MEMS) and nanotechnology application due to absence of friction and hence, wears, lubrication, backlash issues. Compliant mechanisms are mainly used to enhance or lower the displacement of magnification ratios. In this work a compliant pantograph mechanism is designed and analyzed for the linear displacement applications. The displacement synthesis for pantograph compliant mechanism has been presented for scanning area of 150 by 150 mm considering amplification ratio of 6. Finite element analysis of the mechanism was carried out using ANSYS Workbench 14.5 to obtain the linear displacement and von misses stresses for Aluminum alloy 6061 T6 and Polypropylene material. The numerical results obtained for linear displacement were validated with the actual displacement obtained for the working prototype mechanism for both the materials. The numerical results indicated that the induced stresses for both the materials are well within the yield strength of the materials for the input displacement range of 0.02-0.1mm. However, the limiting condition for the input displacement of 0.24 mm and 0.36 mm was observed for Aluminum and polypropylene materials respectively. On the other hand, higher magnification ratio of 6.21 was observed for polypropylene material in comparison to 5.28 for Aluminum 6061 alloy.