Plasma instabilities have been studied in low-pressure inductiveprocessing discharges with SF6 and Ar/SF6 mixtures, i.e. attachinggases. Oscillations are seen in charged particle density, electrontemperature and plasma potential using electrostatic probe and opticalemission measurements. For SF6, instability onset in pressure anddriving power has been explored for gas pressures between 2.5 and 100 mTorrand absorbed powers between 150 and 900 W. For pressures above 20 mTorr,increasing power is required to obtain the instability with increasingpressure, with the frequency of the instability increasing with pressure,mainly lying between 1 and 100 kHz. For Ar/SF6 mixtures, we observe asimilar low power transition, with an upper transition to a stableinductive mode. The instability windows become smaller as the argon partialpressure increases. For Ar/SF6 mixtures, we observe a significant effectof the matching network. We improve a previously developed volume-averaged(global) model to describe the instability. We consider a cylindricaldischarge containing time varying electrons, positive ions, negative ions,and time invariant excited states. The driving power is applied to thedischarge through a conventional L-type capacitive matching network, and weuse realistic models for the inductive and capacitive energy deposition.The particle and energy balance equations are integrated, consideringquasi-neutrality in the plasma volume and charge balance at the walls, toproduce the dynamical behaviour. As pressure or power is varied to cross athreshold, the instability is born at a Hopf bifurcation, with relaxationoscillations between higher and lower density states. The modelqualitatively agrees with experimental observations, and also shows asignificant influence of the matching network.
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