Magnetic Compound Fluid Research Articles

Exploration study of nickel slag/modified slag in the ultra-precision polishing of magnetic compound fluid

Nickel slag is the solid waste obtained from the nickel smelting process. Based on the magnetic elements in nickel slag, it is a potential ingredient that could be used in magnetic compound fluid (MCF) polishing. This work discusses polishing in MCF using nickel slag and modified slag. Investigations are conducted into how MCF is affected by the amount of modified slag and nickel slag present during polishing. The connections between shear force, position, material removal rate, morphological characteristics, and polishing quality are covered. Nickel slag is mixed with CaO, the alkalinity is adjusted, and the mixture is heated to 1500 °C to fully melt and oxidize it. The resulting product is modified slag. The morphological changes in MCF slurry before and after polishing were examined using an industrial camera, and the effect of different MCF slurry components on polishing performance was analyzed throughout the polishing process. In addition, the positioning of modified slag within the magnetic cluster formed during the polishing process was determined through a scanning electron microscope and by energy dispersive x-ray spectroscopy mapping of MCF slurry. The aforementioned research establishes the polishing mechanism for nickel slag and modified slag. The experimental results indicate that the polishing effect of the experimental group with added modified slag is better than that of added nickel slag. Under the same conditions, the surface roughness was reduced by 60% when modified slag was used instead of nickel slag. It was found that the optimal process is where the modified slag content is 10%, where the material removal rate is 1.207 × 108µm3/min and the surface roughness decrease rate is 95.482%. The polishing shear force is around 2.7N, which is twice as much as that of nickel slag.

Synthesis and characterization of Fe3O4@SiO2 core-shell nanoparticles for mirror and efficient magnetic compound fluid polishing of TC4 titanium alloy

To fully investigate the polishing performance of the Fe3O4@SiO2 core–shell abrasive for TC4 titanium alloy plate and solve the problem of uneven distribution of abrasive particles in magnetic compound fluid polishing (MCFP) and obtain ultra-smooth titanium alloy surface. In this paper, the functional Fe3O4@SiO2 core–shell abrasives were prepared and characterized by XRD, FTIR, VSM and TEM to demonstrate the successful encapsulation of SiO2 in Fe3O4 first. Second, a new polishing device was built to perform polishing experiments. Four different fractions of Magnetic compound fluid (MCF) were configured and utilized in polishing experiments for MCFP of TC4 titanium alloy to verify the polishing properties. Finally, the contact model between abrasive particles and workpiece is established and the material removal mechanism is discussed. The results show that SiO2 was successfully coated on Fe3O4. The polishing results show that the MCF containing the core–shell structure had the best polishing effect. The surface roughness Ra decreased from 0.201 μm to 0.025 μm after 20 min of polishing. The surface roughness of TC4 titanium alloy with an initial roughness Sa of 0.248 μm is reduced to 0.023 μm after polishing by Fe3O4@SiO2 core–shell abrasive. It is shown that the application of core–shell abrasive to process titanium alloys can obtain smooth and defect-free surfaces with good polishing performance. The surface quality of titanium alloy can be improved effectively by using core–shell abrasive, and a new idea for polishing titanium alloy is proposed. This study plays an important role in solving the problem of uneven particle distribution in MCFP. These results pave the way for further research into the application of core–shell abrasives in precision machining and expand the application scope of particles with core–shell structure.

Optimization of technological parameters when polishing sic materials by magnetic compound fluid with the straight electromagnetic yoke

Crystallized silicon carbide (SiC) wafers are widely used in the field of integrated circuits as well as essential in the epitaxial growth of graphene and are one of the promising materials for applications in electronics at future high capacity. The surface quality of the required ultra-fine crystalline silicon wafer is the most essential factor in achieving graphene's desired electronic properties. Aiming to produce superfine surface quality SiC wafers, in this study, a new algorithm is developed to solve optimization problems with many nonlinear factors in ultra-precision machining by magnetic liquid mixture. The presented algorithm is a collective global search inspired by artificial intelligence based on the coordination of nonlinear systems occurring in machining processes. A new algorithm based on the optimization collaborative of multiple nonlinear systems (OCMNO) with the same flexibility and high convergence was established in optimizing surface quality when polishing the SiC wafers. To show the effectiveness of the proposed OCMNO algorithm, the benchmark functions were analyzed together with the established SiC wafers polishing optimization process. To give the best-machined surface quality, polishing experiments were set to find the optimal technological parameters based on a new algorithm and straight electromagnetic yoke polishing method. From the analysis and experimental results when polishing SiC wafers in an electromagnetic yoke field when using a magnetic compound fluid (MCF) with technological parameters according to the OCMNO algorithm for ultra-smooth surface quality with Ra=2.306 nm. The study aims to provide an excellent reference value in optimizing surface polishing SiC wafers, semiconductor materials, and optical devices

Elucidation of Response and Electrochemical Mechanisms of Bio-Inspired Rubber Sensors with Supercapacitor Paradigm

The electrochemical paradigm of a supercapacitor (SC) is effective for investigating cutting-edge deformable and haptic materials made of magnetic compound fluid (MCF) rubber in order to advance the production of bio-inspired sensors as artificial haptic sensors mimicking human tissues. In the present study, we measure the cyclic voltammetry (CV) profiles and electric properties with electrochemical impedance spectroscopy (EIS) to morphologically evaluate the intrinsic structure of MCF rubber containing fillers and agents. In addition, the electrochemical mechanisms of molecule and particle behavior are theorized using the SC physical framework. The solid-doped fillers in the MCF rubber characterized the behavior of the electrical double-layer capacitor (EDLC). Meanwhile, the liquid agents showed the characteristics of a pseudocapacitor (PC) due to the redox response among the molecules and particles. The potential responses to extraneous stimuli relevant to the EIS properties, categorized as slow adaption (SA), fast adaption (FA), and other type (OT), were also analyzed in terms of the sensory response of the bio-inspired sensor. The categories were based on how the response was induced from the EIS properties. By controlling the EIS properties with different types of doping agents, sensors with various sensory responses become feasible.

Investigation on Polishing the Concave Surface of Zirconia Ceramics with Magnetic Compound Fluid Enhanced by Hydration Reaction

Zirconia ceramics are prominent engineering materials and are widely used in computers, consumer electronics, and the fifth-generation communication industry. However, zirconia ceramics are a typical hard-to-cut material, and the product structures are more complex as the demanding on the industry increases. In this case, the polishing efficiency should be improved for meeting these requirements. To overcome the problem of polishing concave surfaces of zirconia ceramics, a small polishing tool with a magnetic compound fluid (MCF) was invented. The effect of the polishing parameters on the surface roughness and material removal rate was analyzed by an L9(33) orthogonal experiment. The weight ratio of the parameters was also studied based on the experimental results. With the combination of chemical and mechanical functions, the polishing characteristics were further examined. Based on the soaking experiments, the material removal mechanism is discussed. The results are as follows: (1) the optimal polishing parameters were the revolution speed of the MCF carrier nc of 400 rpm, the working gap h of 0.1 mm, the CIP size D of 5 μm for better surface roughness, the revolution speed of the MCF carrier nc of 400 rpm, the working gap h of 0.1 mm, and the CIP size D of 7 μm for a higher material removal rate. The impact degrees on surface roughness and material removal rate were a revolution speed of the MCF carrier of 54% > working gap of 31%> CIP size of 15% and working gap of 40% > revolution speed of the MCF carrier of 32% > and CIP size of 18%, respectively. (2) Surface roughness was rapidly reduced in the first 20 min and tended to be stable in the last 10 min of polishing. A circular polished area was observed on the flat workpiece for studying the typical material removal curve, and the deepest point was found at the fringe of the material removal curve. The concave workpiece was polished successfully, and the best surface roughness Ra reached 1 nm and 1.2 nm. (3) A pH = 10 with a sodium hydroxide (NaOH) solution has a greater performance in hardness reduction. The chemical and mechanical functions were combined to remove material to enhance the polishing efficiency. All in all, the proposed polishing method with a combination of a small MCF polishing tool and hydration reaction was effective for polishing zirconia ceramics.

Influence of water in magnetic compound fluid on polishing performance

Influence of water in magnetic compound fluid on polishing performance

Development of OCMNO algorithm applied to optimize surface quality when ultra-precise machining of SKD 61 coated Ni-P materials

In this paper, a new algorithm developing to solve optimization problems with many nonlinear factors in ultra-precision machining by magnetic liquid mixture. The presented algorithm is a collective global search inspired by artificial intelligence based on the coordination of nonlinear systems occurring in machining processes. Combining multiple nonlinear systems is established to coordinate various nonlinear objects based on simple physical techniques during machining. The ultimate aim is to create a robust optimization algorithm based on the optimization collaborative of multiple nonlinear systems (OCMNO) with the same flexibility and high convergence established in optimizing surface quality and material removal rate (MRR) when polishing the SKD61-coated Ni-P material. The benchmark functions analyzing and the established optimization polishing process SKD61-coated Ni-P material to show the effectiveness of the proposed OCMNO algorithm. Polishing experiments demonstrate the optimal technological parameters based on a new algorithm and rotary magnetic polishing method to give the best-machined surface quality. From the analysis and experiment results when polishing magnetic SKD 61 coated Ni-P materials in a rotating magnetic field when using a Magnetic Compound Fluid (MCF). The technological parameters according to the OCMNO algorithm for ultra-smooth surface quality with Ra = 1.137 nm without leaving any scratches on the after-polishing surface. The study aims to provide an excellent reference value in optimizing the surface polishing of difficult-to-machine materials, such as SKD 61 coated Ni-P material, materials in the mould industry, and magnetized materials.

Magnetic compound fluid polishing of concave optical glass with small curvature

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A Novel Polishing Method for Extending the Service Life of Magnetic Compound Fluid

Magnetic field-assisted magnetic compound fluid (MCF) ultra-precision machining technology is regarded as an effective method to obtain a smooth surface. However, due to the evaporation and splashing of water in the polishing fluid during processing, the service life of the MCF slurry is reduced. This paper presents a material removal model for MCF polishing, and a novel experimental apparatus is proposed to extend the service life by supplying MCF components into the MCF slurry. Firstly, in order to obtain the ideal polishing tool, the appearance morphologies and the formation process of the MCF slurry were observed by an industrial camera. On this basis, the optimum parameters were determined by multi-factor and multi-level orthogonal experiments. Finally, the investigation of the MCF service life was carried out under the optimal processing parameters. The main findings are summarized as follows. (1) Excellent MCF polishing tools are obtained when the eccentric distance r is 4 mm and the MCF slurry supply V is 1 mL. (2) When the eccentric distance increases from 2 mm to 4 mm, the forming time of the MCF tool decreases sharply, but when the eccentricity exceeds 4 mm, the decreasing trend becomes slow. The molding time grows steadily as the supply is increased. (3) When the machining gap Δ, the MCF carrier speed nc, the eccentricity r, and the revolution speed of magnetic nm are 1 mm, 500 rpm, 4 mm, and 600 rpm, respectively, the ideal machining effect can be obtained. (4) It could be proven that the polishing device is feasible to extend the service time of the MCF slurry by adding MCF components.

Optimization of finishing parameters for magnetic compound fluid finishing (MCFF) of copper alloy

As an advanced finishing technology, magnetic compound fluid finishing (MCFF) is considered capable of achieving damage-free finishing of low-hardness materials such as copper alloys with appropriate finishing parameters. However, ignoring the influence of the material removal amount on the dimensional accuracy while optimizing finishing parameters may result in excessive material removal and a reduction in the workpiece’s dimensional accuracy. Thus, a novel finishing parameter optimization method considering dimensional accuracy is proposed in this paper. Firstly, the MCFF experiments are planned and carried out for modeling. Secondly, an MCFF model is established based on the integrated learning theory. The established model, with a prediction layer and a fusion layer, is a multi-layer neural network fusion model which can accurately predict the polished surface quality and material removal amount. Thirdly, the finishing parameters are optimized by the multi-objective particle swarm optimization algorithm, taking the effect of material removal on dimensional accuracy into account. Finally, the model’s prediction accuracy and the superiority of the optimized parameters are verified through experiments. The results demonstrate that the developed model can predict the finishing effect correctly, and a workpiece with high-quality polished surfaces and high dimensional accuracy can be obtained with the optimized finishing parameters.

磁気混合流体を用いた微細V溝に対する精密研磨に及ぼす磁場と電場の影響

磁気混合流体を用いた微細V溝に対する精密研磨に及ぼす磁場と電場の影響

Development of Ultrasonic Vibration-Assisted Magnetic Compound Fluid (MCF) Polishing Technology

This study investigates the development of an ultrasonic vibration-assisted magnetic compound fluid (MCF) polishing technology for final polishing. The fabrication of an experimental apparatus entails an ultrasonic polishing unit, and the experimental investigation of its performance in surface polishing is described. In addition, ultrasonic vibration-assisted MCF polishing under different applied methods of ultrasonic vibration is studied. The experimental results indicate that applying ultrasonic vibration to the workpiece improves the surface roughness and material removal rate when the ultrasonic vibrations are changed. In addition, across the range of polishing conditions employed in this study, the precision surface roughness and high material removal rate can be easily obtained on the acrylic plate by applying an elliptical vibration to the ultrasonic vibration.

Feasibility Study on the Precision Polishing of Zirconia Ceramics with Magnetic Compound Fluid (MCF) Slurry Under the Assistance of Dielectrophoresis Effect

In this work, a new polishing method for zirconia ceramics was firstly proposed, which combined dielec-trophoresis effect with magnetic compound fluid polishing. A key experimental device was designed and constructed, and the influence behavior of dielectrophoresis phenomenon on the polishing efficiency, surface roughness and glossiness of zirconia ceramic workpiece were investigated. Also, the effects of voltage, electrode shape and electric field parameters on the polishing results were deeply discussed. The results showed that when the magnetic field was stronger, the polishing efficiency would become higher, while the surface quality of the workpiece getting worse. And the glossiness was positively correlated with the surface roughness. Moreover, the smaller the electrode shape and the larger the electric field gradient caused the better dielectrophoresis-assisted effect. It was indicated that when the electrode shape was a circle with a diameter of 20 mm and the voltage was 1500 V, the material removal efficiency was improved by 36.4% while ensuring the surface quality of zirconia ceramics.

Investigation on Polishing of Zirconia Ceramics Using Magnetic Compound Fluid: Relationship Between Material Removal and Surface Roughness

Zirconia ceramics have excellent applicability in the aerospace, defense, new energy, automotive, electronics, and biomedical fields. However, few investigations have been conducted on the high-precision polishing of zirconia ceramics. In this work, a polishing method using a magnetic compound fluid slurry is proposed. First, the principle and the constructed experimental setup were presented. Then, the experiments were performed that characterized the surface profile after polishing, the effect of the working gap, and the effect of the concentration of carbonyl iron particles (CIPs) on the material removal and surface quality. The results showed that the material removal ability correlated positively with the surface roughness; the smallest working gap (0.5 mm) induced greater material removal ability and better surface roughness; higher CIP concentration enabled a higher polishing force to obtain higher material removal and better surface quality. The polishing results show that surface roughness Rz of 55 nm was obtained at the surfaces of zirconia ceramics, confirming that the proposed method has the potential for polishing of zirconia ceramics.

Investigation on Feasibility of Polishing Concave Surfaces Using Magnetic Compound Fluid Slurry

Concave surfaces are widely used in the shells of smart devices, such as smartphones, watches, or molds. The quality of the concave surface is important in enhancing the value of these products. In order to improve the surface quality, the polishing process is crucial for removing defects on the concave surface and for smoothing the surface after machining or grinding. Magnetic assisted polishing is a promising method that can be used to meet the high standard of surface quality required. In this work, as a promising smart material in nano-precision polishing, magnetic compound fluid (MCF) slurry was used for the first time to polish a concave surface with a magnet that is magnetized in the radial direction. A simulation of the magnetic field distribution was performed in advance to clarify the polishing characteristics in theory. Subsequently, a polishing experiment was conducted to investigate the feasibility of this polishing method. Finally, the results demonstrated that both a curved surface and a flat surface could be polished successfully. Furthermore, the nano-precision PV value (the distance from the peak to the valley in the surface profile) and the surface roughness Ra were obtained for both areas, and this method was demonstrated to be capable of polishing concave surfaces and worthy of further research.

Electrical Characteristics of Precision Polishing Using Magnetic Compound Fluid While Simultaneously Applying Magnetic and Electrical Fields

Electrical Characteristics of Precision Polishing Using Magnetic Compound Fluid While Simultaneously Applying Magnetic and Electrical Fields

A Study on Piezoelectric elements and Energy Harvesting Technologies Utilizing Magnetic Compound Fluid Rubber and its Application

A Study on Piezoelectric elements and Energy Harvesting Technologies Utilizing Magnetic Compound Fluid Rubber and its Application

History and future of magnetic compound fluid

History and future of magnetic compound fluid

Clarification of Catalytic Effect on Large Stretchable and Compressible Rubber Dye-Sensitized Solar Cells

Rubber involving magnetic compound fluid (MCF) and TiO2 is effective in dye-sensitized solar cells (DSSCs) to create large efficacy. Wearable and portable solar cells made of MCF rubber are the most desirable as soft materials in robots or flexible devices, and they are further desirable because they have self-generated power and power supply with sensing. Therefore, we investigated the effect of TiO2 catalysts on the photovoltaic effect of MCF rubber DSSCs under large tension and compression. The characteristics of the built-in electricity and photoelectricity were clarified experimentally. The experimental results were explained by a chemical–photovoltaic mechanism involving the behavior of dye, electrolytes, water, and rubber molecules, as well as a catalytic effect of the metal component of the MCF on Ni, Fe3O4, and TiO2. Once we are able to produce solar cells that have large tension and compression, the present experimental results and the model of the chemical–photovoltaic mechanism will be of great interest.

Enhancement of Diversity in Production and Application Utilizing Electrolytically Polymerized Rubber Sensors with MCF: 1st Report on Consummate Fabrication Combining Varied Kinds of Constituents with Porous Permeant Stocking-Like Rubber.

To satisfy the requirement of haptic sensibility in rubber such as in the proposed hybrid skin (H-Skin), the authors have demonstrated a new method for solidifying rubber using electrolytic polymerization together with configured magnetic clusters of magnetic compound fluid (MCF) incorporated into the rubber by the application of a magnetic field. However, the rubber and magnetic fluid (MF) involved in the MCF rubber were water-soluble. In addition, the authors have demonstrated the practicability of using electrolytic polymerization with an emulsifier, polyvinyl alcohol (PVA), in which natural rubber (NR) or chloroprene rubber (CR) and silicone rubber (Q) can be mixed as water-soluble and water-insoluble rubbers, respectively. In this study, to enhance production, the feasibility of solidifying rubber by electrolytic polymerization is verified using varied water-insoluble rubber, varied water-insoluble MF, and varied surfactants to aid emulsion polymerization, except in the case of other kinds of rubber and MF which have been demonstrated until recent by the authors. Based on these diverse constituents, the authors propose a consummate fabrication process for multi-layered MCF rubber, which involves porous stocking-like rubber that can be permeated by any liquid. The investigation of this application is presented in the sequential second report.