Using the method of extracting a series resistance from a p- n diode current-voltage characteristics developed earlier, parameters of low-temperature non-ohmic conduction in bases of two types of silicon diodes have been studied. In the diode of the first type, with finite value of impurity ionization energy, low-temperature impurity breakdown in the diode base is accompanied by hysteresis of its conduction; in the diode of the second type, the impurity breakdown occurs in soft form. In the pre-breakdown region, the results obtained for the diodes of both types, agree completely with existing picture of non-ohmic hopping conduction in spite of significant space inhomogeneity of the diode structures and non-equilibrium character of the transport in them. In the post-breakdown region, the certain peculiarities are available. For the first time the activationless hopping conduction has been revealed in crystalline silicon.
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