Low Pressure RF Plasma Research Articles

Trapping and actively transporting single particles of arbitrary properties in low-pressure rf plasmas with and without a magnetic field

We report the experimental realization of optical trapping and controlled manipulations of single particles of arbitrary properties, e.g., nano- to micrometer in size, transparent spheres to strongly light absorbing nonspherical particles, in low-pressure rf plasmas. First, we show optical trapping and transport of single particles in an unmagnetized rf plasma. Then, we show similar observations in a weakly magnetized rf plasma. This is the first demonstration of actively transporting (pushing and pulling) light-absorbing, nonspherical single particles in plasmas. The result suggests that optically trapped, actively controlled, single plasma dust particles (not limited to those externally sampled spheres) could be an in situ micro-probe for dusty plasma and magnetized dusty plasma diagnostics.

Scale-invariant resonance characteristics in magnetized capacitive radio frequency plasmas

Resonance mechanisms have been found to be essential for the generation of high-density rf plasmas at low pressures, in which electrons can be continuously accelerated through multiple interactions with the oscillating rf sheaths. In this work, we report the scale-invariant resonance mechanisms, such as bounce resonance heating and plasma series resonance, in low-pressure capacitive rf plasmas in the presence of an external magnetic field. The generation conditions for the resonance mechanisms are determined via fully kinetic simulations. It is found that the resonance dynamical properties of single-frequency plasmas (e.g., a double-peak electron density vs magnetic field curve) can be exactly replicated at different scales when three combined control parameters, i.e., the reduced gap distance pd (pressure × distance), reduced driving frequency f/p (frequency divided by pressure), and reduced magnetic field B/p (magnetic field divided by pressure), are kept constant. The similarity relations for the electron density and electron power absorption in magnetized rf plasmas are numerically confirmed. Furthermore, the similarity and scale-invariant resonance characteristics are elucidated through the scaling of the Boltzmann equation with collisional terms for weakly ionized rf plasmas with a magnetic field, which is proven to be theoretically exact.

Direct Liquid Reactor-Injector of Nanoparticles: A Safer-by-Design Aerosol Injection for Nanocomposite Thin-Film Deposition Adapted to Various Plasma-Assisted Processes

The requirements of nanocomposite thin films, having non-aggregated nanoparticles homogeneously dispersed in the matrix, have been realized using a new method of Direct Liquid Reactor-Injector (DLRI) of nanoparticles. In this approach, unlike conventional aerosol-assisted plasma deposition, the nanoparticles are synthesized before their injection as an aerosol into plasma. In our experiments, we have used two different plasma reactors, namely an asymmetric low-pressure RF plasma reactor and a parallel plate dielectric barrier discharge at atmospheric pressure. Our results have shown that DLRI can be easily coupled with various plasma processes as this approach allows the deposition of high-quality multifunctional nanocomposite thin films, with embedded nanoparticles of less than 10 nm in diameter. Hence, DLRI coupled with plasma processes meets the specifications for the deposition of multifunctional coatings.

Thirty percent conversion efficiency from radiofrequency power to thrust energy in a magnetic nozzle plasma thruster

Innovations for terrestrial transportation technologies, e.g., cars, aircraft, and so on, have driven historical industries so far, and a similar breakthrough is now occurring in space owing to the successful development of electric propulsion devices such as gridded ion and Hall effect thrusters, where solar power is converted into the momentum of the propellant via acceleration of the ionized gases, resulting in a high specific impulse. A magnetic nozzle (MN) radiofrequency (rf) plasma thruster consisting of a low-pressure rf plasma source and a MN is an attractive candidate for a high-power electric propulsion device for spacecraft, as it will provide a long lifetime operation at a high-power level due to the absence of an electrode exposed to the plasma and a high thrust density. The high-density plasma produced in the source is transported along the magnetic field lines toward the open-source exit and the plasma is then spontaneously accelerated in the MN. By ejecting the plasma flow from the system, the reaction forces are exerted to the thruster structure including the source and the MN, and the spacecraft is resultantly propelled. The thruster will open the next door for space technologies, while the performance of the MN rf plasma thruster has been lower than those of the mature electric propulsion devices due to the energy loss to the physical walls. Here the thruster efficiency of about 30%, being the highest to date in this type of thruster, is successfully obtained in the MN rf plasma thruster by locating a cusp magnetic field inside the source, which acts as a virtual magnetic wall isolating the plasma from the source wall. The increase in the thrust by the cusp can be explained by considering the reductions of the loss area and the plasma volume in a thrust analysis combining a global source model and a one-dimensional MN model.

On the scaling laws for low-temperature plasmas at macro and micro scales

The theoretical background and historical development of the similarity theory during the past decades are reviewed. We demonstrate similar discharges in local and nonlocal kinetic regimes, taking the low-pressure capacitive radio frequency (rf) discharges and microdischarges as examples. By using fully kinetic particle-in-cell simulations, we verify the similarity law (SL) and show a violation of frequency scaling (f-scaling) in the low-pressure capacitive rf plasmas. The similarity relations for electron density and electron power absorption are confirmed in similar rf discharges. With only the driving frequency varied, the f-scaling for electron density is also validated, showing almost the same trend as the similarity scaling, across most of the frequency regime. However, violations of the f-scaling are observed at lower frequencies, which are found to be relevant to the electron heating mode transition from stochastic to Ohmic heating. The scaling characteristics have also been comprehensively studied for microdischarges with dimensions from hundreds to several microns, with transition from secondary electron dominated regime to field emission regime. Finally, practical applications of the similarity and scaling laws are summarized.

2D particle-in-cell simulations of geometrically asymmetric low-pressure capacitive RF plasmas driven by tailored voltage waveforms

The effects of the simultaneous presence of two different types of plasma asymmetry, viz, geometric and electrical, on low-pressure capacitively coupled argon discharges are studied by 2D3V graphics-processing-unit-based particle-in-cell/Monte Carlo simulations. The geometric asymmetry originates from the different powered vs grounded electrode surface areas, while the electrical asymmetry is established by applying peaks/valleys and sawtooth-up/-down driving voltage waveforms. While in geometrically symmetric discharges, the {peaks ↔ valleys} and the {sawtooth-down ↔ sawtooth-up} switching of the waveforms is equivalent to exchanging the powered and grounded electrodes, this transformation is violated when the geometric symmetry is broken. Under such conditions, the plasma characteristics and the DC self-bias generation behave differently, compared to the geometrically symmetric case. This leads to different sheath dynamics and, therefore, strongly influences the electron power absorption dynamics. For identical peak-to-peak voltages, the plasma density obtained for such tailored voltage waveforms is found to be higher compared to the classical single-frequency waveform case. Reduced plasma densities are found in the valleys- and sawtooth-down waveform cases, compared to the peaks- and sawtooth-up waveforms. By including realistic energy and material-dependent secondary electron emission (SEE) coefficients in the simulations, the electron-induced SEE is found to be reduced in the valleys- and sawtooth-down waveform cases, which explains the behaviour of the plasma density. Using such tailored waveforms in geometrically asymmetric discharges is also found to lead to the formation of different charged particle energy distributions at the boundary surfaces, compared to those in geometrically symmetric plasma sources.

Application of Low-Pressure Rf Plasma to Increase the Adhesion of Synthetic Materials to Polymer Binder and Metal Coatings

Application of Low-Pressure Rf Plasma to Increase the Adhesion of Synthetic Materials to Polymer Binder and Metal Coatings

Study of RF plasma flow at low pressure: electron temperature influence

A mathematical model of low-pressure RF plasma flow taking into consideration electron temperature influence is presented. Results of calculations of carrier gas velocity, pressure and temperature as well as electron density and electron temperature in plasma flow are showed. Influence of electric field on electron temperature and plasma flow is analyzed.

Low-Temperature Plasma Modification of Styrene-Butadiene Block Copolymer Surfaces for Improved Adhesion-A Kinetic Approach.

This paper proposed a kinetic model that can describe the changes in the adhesion properties of styrene–butadiene (SBS) block copolymer surfaces under the influence of low-temperature plasma treatment. As a measure of these changes, the peel strength of joints formed between the copolymer surface and the polyurethane adhesive was chosen. Five types of low-temperature low-pressure RF plasma, two inert plasmas (Ar and He), and three reactive plasmas (O2, CO2, and CCl4) were tested. It was found that for all these types of plasma, the peel strength with the plasma treatment time first increases rapidly reaching a maximum value, and then there is a visible decrease in peel strength, after which the peel strength increases again. This dependence of the peel strength on the plasma treatment time is very well described by the proposed model, which considers three processes: (1) the generation of radical states followed by the creation of functional groups involved in the adhesive bonding process, (2) the surface cross-linking that decreases the concentration of these functional groups, and (3) the formation of nano-roughness. The model analysis revealed differences between the action of reactive and inert plasmas in the SBS surface cross-linking mechanism and preferential etching process, as well as differences in the generation of radical states between the O2 plasma (electron process) and other plasmas tested (ionic processes).

Synthesis and surface modification of light emitting silicon nanoparticles using non-thermal plasma techniques

We have synthesised silicon nanoparticles (Si-NPs) with photoluminescence ranging from blue to IR spectral region using a low-pressure RF plasma in a flow-through glass tube reactor. The spectral position of photoluminescence band of Si-NPs is controlled by the synthesis parameters such as plasma power, silane and hydrogen concentration and pressure in the working area. Modification of Si-NPs surface both on air after the synthesis and in the vacuum chamber by second plasma in methylsilane atmosphere causes a blue spectral shift of the photoluminescence band.

Simulation of low-pressure rf plasma treatment of ultrahigh molecular weight polyethylene

Methods of molecular dynamic simulation of the bombardment of polymeric materials by low-energy (up to 100 eV) ions generated in radio-frequency low-pressure (13.3-133 Pa) plasma are discussed. A model of RF plasma treatment of ultrahigh molecular weight polyethylene (UHMWPE) has been developed. It has been established that the bombardment of UHMWPE by argon ions initiates the fast rotation of the polymer chains, and the rupture of intramolecular bonds.

(Invited) Nitrogen Functionalization and Doping of Conductive Carbons By Means of Low Temperature Plasmas

Nanomaterials, such as nanocomposites, nanorods, nanotubes and graphenes, are nowadays almost past the title “novel materials”, they have been widely investigated and used as either promising or already proven materials for various applications ranging from electronics and black body coatings to fuel cells and supercapacitors. Such advanced nanomaterials, independently of their chemical composition, are also used for the delivery of therapeutic agents, including biomolecules targeting disease sites, for bioimaging, or in general for biomedical engineering.This contribution presents several examples of plasma synthesized and plasma functionalized carbon based nanomaterials (nanostructures), CBNs, which nowadays play an important role for biomedical engineering, and in particular for the development of novel biosensors. The examples presented in this paper concern materials which are synthesized in low pressure RF plasmas from hydrocarbon precursors, like ethylene, with or without nitrogen presence during their growth. Most of the examples are vertically aligned graphene flakes. The post-treatment of these materials is performed in low pressure radio frequency capacitively coupled plasma and microwave plasma. In this contribution we will focus on surface treatment by nitrogen and ammonia plasma. The goal of such surface treatments with nitrogen containing plasma is doping and functionalization, very often simultaneously obtained. Plasmas were controlled by means of mass spectroscopy.The method of choice for the analysis of the bonding situation of the materials before and after treatment in this presentation is near edge X-ray absorption fine structure spectroscopy (NEXAFS), and X ray photoemission spectroscopy (XPS) performed on HESGM beamline, HBZ Bessy II Germany. Acknowledgments The authors would like to acknowledge the support obtained by French National Research Agency via projects ANR PlasBioSens and PlasmaBond, APR Apropore, French Regionals support by APR Capt’Eau, and PIVOT. This project has received funding from the European Union's Horizon 2020 research and innovation programme under grant agreement No 730872 (CALYPSO plus for the work at the HZB BESSY II synchrotron, Berlin, Germany) and grant agreement No766894 (FET-OPEN project PEGASUS).

Electron kinetics in low-temperature plasmas

This article presents an overview of recent advances in the field of electron kinetics in low-temperature plasmas (LTPs). It also provides author's views on where the field is headed and suggests promising strategies for further development. The authors have selected several problems to illustrate multidisciplinary nature of the subject (space and laboratory plasma, collisionless and collisional plasmas, and low-pressure and high-pressure discharges) and to illustrate how cross-disciplinary research efforts could enable further progress. Nonlocal electron kinetics and nonlocal electrodynamics in low-pressure rf plasmas resemble collisionless effects in space plasma and hot plasma effects in fusion science, terahertz technology, and plasmonics. The formation of electron groups in dc and rf discharges has much in common with three groups of electrons (core, strahl, and halo) in solar wind. Runaway electrons in LTPs are responsible for a wide range of physical phenomena from nano- and picoscale breakdown of dielectrics to lightning initiation. Understanding electron kinetics of LTPs could promote scientific advances in a number of topics in plasma physics and accelerate modern plasma technologies.

Refurbishment of an Au-coated toroidal mirror by capacitively coupled RF plasma discharge.

Deposition of synchrotron-radiation-induced carbon contamination on beamline optics causes their performance to deteriorate, especially near the carbon K edge. The photon flux losses due to carbon contamination have spurred researchers to search for a suitable decontamination technique to restore the optical surface and retain its performance. Several in situ and ex situ refurbishing strategies for beamline optics are still under development to solve this serious issue. In this work, the carbon contamination is removed from a large (340 mm × 60 mm) Au-coated toroidal mirror surface using a capacitively coupled low-pressure RF plasma. Before and after RF plasma cleaning, the mirror was characterized by Raman spectroscopy, soft X-ray reflectivity (SXR) and atomic force microscopy (AFM) techniques. The Raman spectra of the contaminated mirror clearly show the G (1575-1590 cm-1) and D (1362-1380 cm-1) bands of graphitic carbon. The SXR curve of the contaminated mirror shows a clear dip near the critical momentum transfer of carbon, indicating the presence of carbon contamination on the mirror surface. This dip disappears after removal of the contamination layer by RF plasma exposure. A decrease in the intensities of the CO bands is also observed by optical emission spectrometry during plasma exposure. The AFM and SXR results suggest that the root-mean-square (r.m.s.) roughness of the mirror surface does not increase after plasma exposure.

Mathematical Modelling of RF Plasma Flow at Low Pressures with 3D Electromagnetic Field

In this study, a hybrid mathematical model of a low-pressure RF plasma jet in transition mode between continuum and free molecular flow at a Knudsen number of 8·10−3 ≤ Kn ≤ 7·10−2 for a carrying gas is described. The model takes electrons, ions, metastable atoms, and potential and curl electromagnetic fields into account. The model is based on both a statistical approach for the atoms in the ground state and a continuum model for other components. The results of plasma flow calculations in an undisturbed jet are described. The distributions of the electrodynamic and electrostatic parts of the electric field are given. It has been observed that the plasma jet has a layered structure along the stream: a positive charge region is formed at the beginning of the jet, followed by a negative charge region, and then a positive one again. The reason for the formation of a layered structure is the fast flow expansion when the plasma inflows into the vacuum and the difference in electron and ion pulse.

An optical trapping system for particle probes in plasma diagnostics.

We present one of the first experiments for optically trapping of single microparticles as probes for low temperature plasma diagnostics. Based on the dual laser beam, counter-propagating technique, SiO2 microparticles are optically trapped at very large distances in low-temperature, low-pressure rf plasma. External forces on the particle are measured by means of the displacement of the probe particle in the trap. Measurements can be performed during plasma operation as well as without plasma. The paper focuses on the optical setup and the verification of the system and its principle. Three examples for the particle behavior in the trapping system are presented: First, we measured the neutral gas damping as a verification of the technique. Second, an experiment without a plasma studies the changing particle charge by UV light radiation, and third, by moving the probe particle in the vertical direction into the sheath or into the plasma bulk, respectively, the acting forces on the probe particle are measured.

Characterization of Carbon-Contaminated B4C-Coated Optics after Chemically Selective Cleaning with Low-Pressure RF Plasma

Boron carbide (B4C) is one of the few materials that is expected to be most resilient with respect to the extremely high brilliance of the photon beam generated by free electron lasers (FELs) and is thus of considerable interest for optical applications in this field. However, as in the case of many other optics operated at light source facilities, B4C-coated optics are subject to ubiquitous carbon contaminations. Carbon contaminations represent a serious issue for the operation of FEL beamlines due to severe reduction of photon flux, beam coherence, creation of destructive interference, and scattering losses. A variety of B4C cleaning technologies were developed at different laboratories with varying success. We present a study regarding the low-pressure RF plasma cleaning of carbon contaminated B4C test samples via inductively coupled O2/Ar, H2/Ar, and pure O2 RF plasma produced following previous studies using the same ibss GV10x downstream plasma source. Results regarding the chemistry, morphology as well as other aspects of the B4C optical coating before and after the plasma cleaning are reported. We conclude that among the above plasma processes only plasma based on pure O2 feedstock gas exhibits the required chemical selectivity for maintaining the integrity of the B4C optical coatings.

Study on Physio-chemical Properties of plasma polymerization in C2H2/N2 plasma and Their Impact on COL X

Nitrogen-containing plasma polymerization is of considerable interest for tissue engineering due to their properties on cell adhesion and mesenchymal stem cells (MSCs) response. In this study, low-pressure RF plasma of acetylene and nitrogen was used to deposit nitrogen-containing plasma polymerized coatings on several substrates. Deposition kinetics and surface characteristics of coatings were investigated in terms of RF power and gas flow ratio. OES was used to monitor the plasma process and investigate the relation between the film structure and plasma species. Presence of several bonds and low concentration of amine functional groups were determined using FTIR and Colorimetric methods. Contact angle goniometry results indicated about 30% increase in surface hydrophilicity. Stability of coatings in air and two different liquid environments was examined by repeating surface free energy measurements. Deposited films exhibited acceptable stability during the storage duration. Surface roughness measured by AFM was found to decrease with growing concentration of nitrogen. The deposition rate increased with increasing RF power and decreased with growing concentration of nitrogen. Zeta potential measurements of coatings revealed the negative potential on the surface of the thin films. Temporary suppression of collagen X in the presence of plasma coatings was confirmed by RT-PCR results.

Multifold study of volume plasma chemistry in Ar/CF4 and Ar/CHF3 CCP discharges

Low-pressure RF plasma in fluorohydrocarbon gas mixtures is widely used in modern microelectronics, e.g. in the etching of materials with a low dielectric constant (low-k) materials). The multifold experimental and theoretical study of a radio frequency capacitively coupled plasma at 81 MHz in Ar/CF4/CHF3 has been carried out at 50 mTorr and 150 mTorr gas pressures. A wide set of experimental diagnostics together with hybrid PIC MC model calculations were applied to a detailed study of the plasmas. Measurements of the F atoms, HF molecules and CFx radicals, electron density, electronegativity and positive ion composition were performed. Absolutely calibrated VUV spectrometry was carried out to measure the VUV photon fluence towards the electrode. This combined experimental and model approach allowed us to establish the fundamental mechanisms of the charged and neutral species elementary reactions. Dissociative charge transfer reactions and fluoride transfer reactions influence the main ion (CF, CHF) composition in Ar/CF4/CHF3 plasma a lot. The mechanisms of heavy ion formation in Ar/CHF3 are also discussed. The important role of additional attachment mechanisms (besides dissociative attachment to the feedstock gases, CF4, CHF3) was analyzed. The catalytic chain mechanism, including the HF molecules, which defines the CFx kinetics in Ar/CHF3 plasma, was validated. This multifold approach enabled us to determine the complicated plasma chemical composition of the active species as well as the fluxes of VUV photons at the surface of the processed material, and is a result that is important for understanding low-k damage.

Investigation of intermediates in non-oxidative coupling of methane by non-thermal RF plasma

Non-oxidative coupling of methane by low pressure RF plasma was investigated with real time monitoring tools such as Langmuir probe, and ion mass and energy spectrometer. Process parameters were systematically changed to generate various plasma conditions and thus to identify key factors affecting the methane activation. From real time analysis, it was found that effects of electron energy and ion energy on methane conversion were minimal when the electron energy of plasma is greater than methane activation energy. On the other hand, electron concentration and the residence time in plasma were strongly correlated with the degree of methane conversion. Moreover, it should be noted that the density of methanium (CH5+) which is a byproduct of ion-molecule reaction pathway of methyl radical formation (CH3), was reversely related to the extent of methane conversion due to active reactions among the methanium and C2 product molecules. Furthermore, for tested experimental conditions in this study, the product distribution of the methane plasma reaction was more closely related with the methane conversion level than with other plasma parameters. This real time analysis results can be used to derive meaningful insights to help designing an effective synergistic plasma-catalyst system.