ADVERTISEMENT RETURN TO ISSUEPREVNoteNEXTLithographic Approach to Pattern Self-Assembled Nanoparticle MultilayersFeng Hua, Tianhong Cui, and Yuri LvovView Author Information Institute for Micromanufacturing, Louisiana Tech University, Ruston, Louisiana 71270 Cite this: Langmuir 2002, 18, 17, 6712–6715Publication Date (Web):July 19, 2002Publication History Received22 April 2002Revised6 June 2002Published online19 July 2002Published inissue 1 August 2002https://doi.org/10.1021/la025856rCopyright © 2002 American Chemical SocietyRIGHTS & PERMISSIONSArticle Views687Altmetric-Citations62LEARN ABOUT THESE METRICSArticle Views are the COUNTER-compliant sum of full text article downloads since November 2008 (both PDF and HTML) across all institutions and individuals. These metrics are regularly updated to reflect usage leading up to the last few days.Citations are the number of other articles citing this article, calculated by Crossref and updated daily. Find more information about Crossref citation counts.The Altmetric Attention Score is a quantitative measure of the attention that a research article has received online. Clicking on the donut icon will load a page at altmetric.com with additional details about the score and the social media presence for the given article. Find more information on the Altmetric Attention Score and how the score is calculated. Share Add toView InAdd Full Text with ReferenceAdd Description ExportRISCitationCitation and abstractCitation and referencesMore Options Share onFacebookTwitterWechatLinked InReddit Read OnlinePDF (372 KB) Get e-AlertsSUBJECTS:Layer by layer deposition,Layers,Nanoparticles,Silicon,Thin films Get e-Alerts