As microprocessors components density and clock frequency increase, so do heat dissipation. The heat results from Joule effect due to leakage currents in the components area or active region. This region is only few microns thick and can quickly reach destructing temperatures if heat is not quickly removed. On this critical issue depends the system reliability. The active region is separated from the ventilated heat sink by a silicon substrate and a metal integrated heat spreader, both hundreds of microns thick. This interface region is the microprocessor's heat transfer plate where heat exchange is achieved by conduction. Because of the localized heat source, the thermal spreading resistance of the interface region can be high. A novel way of spreading heat in that region is the use of microchannel arrays where an appropriate thermal compound or a phase change liquid can be trapped to increase heat transfer by conduction or to create micro-heat-pipes. Traditional cooling methods, with conventional and well optimised heat sinks, can then be used with less burden.In this paper, the Transmission-Line-Matrix (TLM) technique is used to simulate the effect of microchannels on the temperature distribution in the active region. To minimize the interface heat resistance various microchannel and patterns are examined. In this part of the work, the microchannels are filled with the heat spreader material copper or aluminium. The results show an improved thermal transient behaviour and a reduced active region temperature in steady state.
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