A different approach in microcolumn design is presented, aiming at a large number of pixels at minimal probe size for the deflected beam. An optimization routine resulted in a seven times magnifying column featuring a more than 7×7mm2 scan field at 40mm working distance. Simulations for 1keV electrons from a field emission source predict an increase in beam size from 85nm on axis up to only about 200nm for a beam deflected 3mm off axis. Within a 1mm scan field this microcolumn could address over 100Mpixels of less than 100nm in size. Tests of this design using the 130nm electron probe of a scanning electron microscope as the electron source resulted in a beam size of ∼930nm on axis up to ∼1000nm for a beam deflected 3mm off axis.