III-V Nanowires Research Articles

Selective-Area Growth of InGaAs Nanowires on SOI and the Vertical Transistor Application

The gate-all-around (GAA) structure avoids the problems inherent in miniaturizing field-effect transistors (FETs), such as off-state leakage current and short-channel effects. Among GAA structures, vertical GAA (VGAA) structures are expected as promising building blocks for future three-dimensional integrated circuit applications. The vertical III-V nanowires (NWs) on Si are expected as the fast channel materials for the VGAA structures on Si platforms. Thus, the combination of the VGAA structure with III-V NWs on Si significantly enhances on-state current while maintaining good gate controllability under low supply voltage. In addition, III-V NWs/Si tunnel junctions, which are formed by the direct integration of vertical III-V NWs on Si, can be utilized as VGAA tunnel FETs (TFETs) for low-power switch. Here we report on direct integration of vertical InGaAs NWs on silicon-on-insulator (SOI) substrates by selective-area growth and demonstrations of InGaAs NW-channel VGAA transistors (FETs and TFETs) on SOI.

Nucleation-Limited Kinetics of GaAs Nanostructures Grown by Selective Area Epitaxy: Implications for Shape Engineering in Optoelectronics Devices.

The growth kinetics of vertical III-V nanowires (NWs) were clarified long ago. The increasing aspect ratio of NWs results in an increase in the surface area, which, in turn, enhances the material collection. The group III adatom diffusion from the NW sidewalls to the top sustains a superlinear growth regime. In this work, we report on the growth of different GaAs nanostructures by selective area MOVPE on GaAs (111)B substrates. We show that the opening dimensions and geometry qualitatively alter the morphology and height evolution of the structures. We compare the time evolution of vertical GaAs NWs stemming from circular holes and horizontal GaAs nanomembranes (NMs) growing from one-dimensional (1D) rectangular slits on the same substrate. While NW heights grow exponentially with time, NMs surprisingly exhibit sublinear kinetics. The absence of visible atomic steps on the top facets of both NWs and NMs suggests layer-by-layer growth in the mononuclear mode. We interpret these observations within a self-consistent growth model, which links the diffusion flux of Ga adatoms to the position- and shape-dependent nucleation rate on top of NWs and NMs. Specifically, the island nucleation rate is lower on top of the NMs than that on the NWs, resulting in the total diffusion flux being directed from the top facet to the sidewalls. This gives a sublinear height evolution for the NMs. These results open innovative perspectives for shape engineering of III-V nanostructures and new avenues for the design of optoelectronics and photonic devices.

Machine Learning Inspired Nanowire Classification Method based on Nanowire Array Scanning Electron Microscope Images.

This article introduces an innovative classification methodology to identify nanowires within scanning electron microscope images. Our approach employs advanced image manipulation techniques in conjunction with machine learning-based recognition algorithms. The effectiveness of our proposed method is demonstrated through its application to the categorization of scanning electron microscopy images depicting nanowires arrays. The method's capability to isolate and distinguish individual nanowires within an array is the primary factor in the observed accuracy. The foundational data set for model training comprises scanning electron microscopy images featuring 240 III-V nanowire arrays grown with metal organic chemical vapor deposition on silicon substrates. Each of these arrays consists of 66 nanowires. The results underscore the model's proficiency in discerning distinct wire configurations and detecting parasitic crystals. Our approach yields an average F1 score of 0.91, indicating high precision and recall. Such a high level of performance and accuracy of ML methods demonstrate the viability of our technique not only for academic but also for practical commercial implementation and usage.

Self-Consistent Model for the Compositional Profiles in Vapor-Liquid-Solid III-V Nanowire Heterostructures Based on Group V Interchange.

Due to the very efficient relaxation of elastic stress on strain-free sidewalls, III-V nanowires offer almost unlimited possibilities for bandgap engineering in nanowire heterostructures by using material combinations that are attainable in epilayers. However, axial nanowire heterostructures grown using the vapor-liquid-solid method often suffer from the reservoir effect in a catalyst droplet. Control over the interfacial abruptness in nanowire heterostructures based on the group V interchange is more difficult than for group-III-based materials, because the low concentrations of highly volatile group V atoms cannot be measured after or during growth. Here, we develop a self-consistent model for calculations of the coordinate-dependent compositional profiles in the solid and liquid phases during the vapor-liquid-solid growth of the axial nanowire heterostructure Ax0B1-x0C/Ax1B1-x1C with any stationary compositions x0 and x1. The only assumption of the model is that the growth rates of both binaries AC and BC are proportional to the concentrations of group V atoms A and B in a catalyst droplet, requiring high enough supersaturations in liquid phase. The model contains a minimum number of parameters and fits quite well the data on the interfacial abruptness across double heterostructures in GaP/GaAsxP1-x/GaP nanowires. It can be used for any axial III-V nanowire heterostructures obtained through the vapor-liquid-solid method. It forms a basis for further developments in modeling the complex growth process and suppression of the interfacial broadening caused by the reservoir effect.

Optical Analysis of Perovskite III-V Nanowires Interpenetrated Tandem Solar Cells.

Multi-junction photovoltaics approaches are being explored to mitigate thermalization losses that occur in the absorption of high-energy photons. However, the design of tandem cells faces challenges such as light reflection and parasitic absorption. Nanostructures have emerged as promising solutions due to their anti-reflection properties, which enhances light absorption. III-V nanowires (NWs) solar cells can achieve strong power conversion efficiencies, offering the advantage of potentially integrating tunnel diodes within the same fabrication process. Metal halide perovskites (MHPs) have gained attention for their optoelectronic attributes and cost-effectiveness. Notably, both material classes allow for tunable bandgaps. This study explores the integration of MHPs with III-V NWs solar cells in both two-terminal and three-terminal configurations. Our primary focus lies in the optical analysis of a tandem design using III-V semiconductor nanowire arrays in combination with perovskites, highlighting their potential for tandem applications. The space offered by the compact footprint of NW arrays is used in an interpenetrated tandem structure. We systematically optimize the bottom cell, addressing reflectivity and parasitic absorption, and extend to a full tandem structure, considering experimentally feasible thicknesses. Simulation of a three-terminal structure highlights a potential increase in efficiency, decoupling the operating points of the subcells. The two-terminal analysis underscores the benefits of nanowires in reducing reflection and achieving a higher matched current between the top and the bottom cells. This research provides significant insights into NW tandem solar cell optics, enhancing our understanding of their potential to improve photovoltaic performance.

Machine Learning Inspired Nanowire Classification Method based on Nanowire Array Scanning Electron Microscope Images

Background This article introduces an innovative classification methodology to identify nanowires within scanning electron microscope images. Methods Our approach employs advanced image manipulation techniques in conjunction with machine learning-based recognition algorithms. The effectiveness of our proposed method is demonstrated through its application to the categorization of scanning electron microscopy images depicting nanowires arrays. Results The method’s capability to isolate and distinguish individual nanowires within an array is the primary factor in the observed accuracy. The foundational data set for model training comprises scanning electron microscopy images featuring 240 III-V nanowire arrays grown with metal organic chemical vapor deposition on silicon substrates. Each of these arrays consists of 66 nanowires. The results underscore the model’s proficiency in discerning distinct wire configurations and detecting parasitic crystals. Our approach yields an average F1 score of 0.91, indicating high precision and recall. Conclusions Such a high level of performance and accuracy of ML methods demonstrate the viability of our technique not only for academic but also for practical commercial implementation and usage.

Strong Dimensional and Structural Dependencies of Hot Carrier Effects in InGaAs Nanowires: Implications for Photovoltaic Solar Cells.

III-V nanowire structures are among the promising material systems with applications in hot carrier solar cells. These nanostructures can meet the requirements for such photovoltaic devices, i.e., the suppression of thermalization loss, an efficient hot carrier transport, and enhanced photoabsorption thanks to their unique one-dimensional (1D) geometry and density-of-states. Here, we investigate the effects of spatial confinement of photogenerated hot carriers in InGaAs-InAlAs core-shell nanowires, which presents an ideal class of hot carrier solar cell materials due to its suitable electronic properties. Using steady-state photoluminescence spectroscopy, our study reveals that by increasing the degree of spatial confinement and Auger recombination, the effects of hot carriers increase, which is in good agreement with theoretical modeling. However, for thin nanowires, the temperature of hot carriers decreases as the effects of crystal disorder increase. This observation is confirmed by probing the extent of the disorder-induced Urbach tail and linked to the presence of a higher density of stacking defects in the limit of thin nanowires. These findings expand our knowledge of hot carrier thermalization in nanowires, which can be applied for designing efficient 1D hot carrier absorbers for advanced-concept photovoltaic solar cells.

Vertically Processed GaInP/InP Tandem-Junction Nanowire Solar Cells.

We present vertically processed photovoltaic devices based on GaInP/InP tandem-junction III-V nanowires (NWs), contacting approximately 3 million NWs in parallel for each device. The GaInP and InP subcells as well as the connecting Esaki tunnel diode are all realized within the same NW. By processing GaInP/InP tandem-junction NW solar cells with varying compositions of the top junction GaInP material, we investigate the impact of the GaInP composition on the device performance. External quantum efficiency (EQE) measurements on devices with varying GaInP composition provide insights into the performance of the respective subcells, revealing that the GaInP subcell is current-limiting for all devices. I-V measurements under AM1.5G illumination confirm voltage addition of the subcells, resulting in an open-circuit voltage of up to 1.91 V. However, the short-circuit current density is low, ranging between 0.24 and 3.44 mA/cm2, which leads to a resulting solar conversion efficiency of up to 3.60%. Our work shows a path forward toward high-efficiency NW photovoltaics and identifies critical issues that need improvement.

Effective surface passivation of GaAs nanowire photodetectors by a thin ZnO capping.

The III-V nanowire (NW) structure is a good candidate for developing photodetectors. However, high-density surface states caused by the large surface-to-volume ratio severely limit their performance, which is difficult to solve in conventional ways. Here, a robust surface passivation method, using a thin layer of ZnO capping, is developed for promoting NW photodetector performance. 11 cycles of ZnO, grown on pure zinc blende high-quality GaAs NWs by atomic layer deposition, significantly alleviates the undesirable effect of the surface states, without noticeable degradation in NW morphology. An average 20-fold increase in micro-photoluminescence intensity is observed for passivated NWs, which leads to the development of detectors with high responsivity, specific detectivity, and optical gain of 9.46 × 105 A W-1, 3.93 × 1014 Jones, and 2.2 × 108 %, respectively, under low-intensity 532 nm illumination. Passivated NW detectors outperform their counterparts treated by conventional methods, so far as we know, which shows the potential and effectiveness of thin ZnO surface passivation on NW devices.

Highly Responsive Switchable Broadband DUV-NIR Photodetector and Tunable Emitter Enabled by Uniform and Vertically Grown III-V Nanowire on Silicon Substrate for Integrated Photonics.

Low-dimensional semiconductor nanostructures, particularly in the form of nanowire configurations with large surface-to-volume-ratio, offer intriguing optoelectronic properties for the advancement of integrated photonic technologies. Here, a bias-controlled, superior dual-functional broadband light detecting/emitting diode enabled by constructing the aluminum-gallium-nitride-based nanowire on the silicon-platform is reported. Strikingly, the diode exhibits a stable and high responsivity (R) of over 200mAW-1 covering an extremely wide operation band under reverse bias conditions, ranging from deep ultraviolet (DUV: 254nm) to near-infrared (NIR: 1000nm) spectrum region. While at zero bias, it still possesses superior DUV light selectivity with a high off-rejection ratio of 106. When it comes to the operation of the light-emitting mode under forward bias, it can achieve large spectral changes from UV to red simply by coating colloid quantum dots on the nanowires. Based on the multifunctional features of the diodes, this study further employs them in various optoelectronic systems, demonstrating outstanding applications in multicolor imaging, filterless color discrimination, and DUV/NIR visualization. Such highly responsive broadband photodetector with a tunable emitter enabled by III-V nanowire on silicon provides a new avenue toward the realization of integrated photonics and holds great promise for future applications in communication, sensing, imaging, and visualization.

Curved InGaAs nanowire array lasers grown directly on silicon-on-insulator.

Catalyst-free, selective nano-epitaxy of III-V nanowires provides an excellent materials platform for designing and fabricating ultra-compact, bottom-up photonic crystal lasers. In this work, we propose a new type of photonic crystal laser with a curved cavity formed by InGaAs nanowires grown directly on silicon-on-insulator. This paper investigates the effect of the radius of the curved cavity on the emission wavelength, quality factor as well as laser beam emission angle. We find that the introduction of curvature does not degrade the quality factor of the cavity, thereby offering another degree of freedom when designing low-footprint multiwavelength photonic crystal nanowire lasers. The experimentally demonstrated device shows a lasing threshold of 157 µJ/cm2 at room temperature at telecom O-band wavelengths.

Pulmonary toxicity and translocation of gallium phosphide nanowires to secondary organs following pulmonary exposure in mice

BackgroundIII-V semiconductor nanowires are envisioned as being integrated in optoelectronic devices in the near future. However, the perspective of mass production of these nanowires raises concern for human safety due to their asbestos- and carbon nanotube-like properties, including their high aspect ratio shape. Indeed, III-V nanowires have similar dimensions as Mitsui-7 multi-walled carbon nanotubes, which induce lung cancer by inhalation in rats. It is therefore urgent to investigate the toxicological effects following lung exposure to III-V nanowires prior to their use in industrial production, which entails risk of human exposure. Here, female C57BL/6J mice were exposed to 2, 6, and 18 µg (0.12, 0.35 and 1.1 mg/kg bw) of gallium phosphide (III-V) nanowires (99 nm diameter, 3.7 μm length) by intratracheal instillation and the toxicity was investigated 1, 3, 28 days and 3 months after exposure. Mitsui-7 multi-walled carbon nanotubes and carbon black Printex 90 nanoparticles were used as benchmark nanomaterials.ResultsGallium phosphide nanowires induced genotoxicity in bronchoalveolar lavage cells and acute inflammation with eosinophilia observable both in bronchoalveolar lavage and lung tissue (1 and 3 days post-exposure). The inflammatory response was comparable to the response following exposure to Mitsui-7 multi-walled carbon nanotubes at similar dose levels. The nanowires underwent partial dissolution in the lung resulting in thinner nanowires, with an estimated in vivo half-life of 3 months. Despite the partial dissolution, nanowires were detected in lung, liver, spleen, kidney, uterus and brain 3 months after exposure.ConclusionPulmonary exposure to gallium phosphide nanowires caused similar toxicological effects as the multi-walled carbon nanotube Mitsui-7.Graphical

Diameter Control of GaSb Nanowires Revealed by In Situ Environmental Transmission Electron Microscopy.

Several nanowire properties are strongly dependent on their diameter, which is notoriously difficult to control for III-Sb nanowires compared with other III-V nanowires. Herein environmental transmission electron microscopy is utilized to study the growth of Au nanoparticle seeded GaSb nanowires in situ. In this study, the real time changes to morphology and nanoparticle composition as a result of precursor V/III ratio are investigated. For a wide range of the growth parameters, it is observed that decreasing the V/III ratio increases the nanoparticle volume through Ga accumulation in the nanoparticle. The increase in nanoparticle volume in turn forces the nanowire diameter to expand. The effect of the V/III ratio on diameter allows the engineering of diameter modulated nanowires, where the modulation persisted after the growth. Lastly, this study demonstrates the observed trends can be reproduced in a conventional ex situ system, highlighting the transferability and importance of the results obtained in situ.

Short-wave infrared cavity resonances in a single GeSn nanowire

Nanowires are promising platforms for realizing ultra-compact light sources for photonic integrated circuits. In contrast to impressive progress on light confinement and stimulated emission in III-V and II-VI semiconductor nanowires, there has been no experimental demonstration showing the potential to achieve strong cavity effects in a bottom-up grown single group-IV nanowire, which is a prerequisite for realizing silicon-compatible infrared nanolasers. Herein, we address this limitation and present an experimental observation of cavity-enhanced strong photoluminescence from a single Ge/GeSn core/shell nanowire. A sufficiently large Sn content ( ~ 10 at%) in the GeSn shell leads to a direct bandgap gain medium, allowing a strong reduction in material loss upon optical pumping. Efficient optical confinement in a single nanowire enables many round trips of emitted photons between two facets of a nanowire, achieving a narrow width of 3.3 nm. Our demonstration opens new possibilities for ultrasmall on-chip light sources towards realizing photonic-integrated circuits in the underexplored range of short-wave infrared (SWIR).

An Overview of Modeling Approaches for Compositional Control in III-V Ternary Nanowires.

Modeling of the growth process is required for the synthesis of III-V ternary nanowires with controllable composition. Consequently, new theoretical approaches for the description of epitaxial growth and the related chemical composition of III-V ternary nanowires based on group III or group V intermix were recently developed. In this review, we present and discuss existing modeling strategies for the stationary compositions of III-V ternary nanowires and try to systematize and link them in a general perspective. In particular, we divide the existing approaches into models that focus on the liquid-solid incorporation mechanisms in vapor-liquid-solid nanowires (equilibrium, nucleation-limited, and kinetic models treating the growth of solid from liquid) and models that provide the vapor-solid distributions (empirical, transport-limited, reaction-limited, and kinetic models treating the growth of solid from vapor). We describe the basic ideas underlying the existing models and analyze the similarities and differences between them, as well as the limitations and key factors influencing the stationary compositions of III-V nanowires versus the growth method. Overall, this review provides a basis for choosing a modeling approach that is most appropriate for a particular material system and epitaxy technique and that underlines the achieved level of the compositional modeling of III-V ternary nanowires and the remaining gaps that require further studies.

Modeling selective narrowband light absorption in coaxial InAs-GaAs0.1Sb0.9 nanowires with partial shell segment coverage

Vertical III-V nanowire (NW) arrays are promising candidates for infrared (IR) photodetection applications. Generally, NWs with large diameters are required for efficient absorption in the IR range. However, increasing the NW diameter results in a loss of spectral selectivity and an enhancement in the photodetector dark current. Here, we propose a nanophotonic engineering approach to achieving spectrally-selective light absorption while minimizing the volume of the absorbing medium. Based on simulations performed using rigorous coupled-wave analysis (RCWA) techniques, we demonstrate dramatic tunability of the short-wavelength infrared (SWIR) light absorption properties of InAs NWs with base segments embedded in a reflective backside Au layer and with partial GaAs0.1Sb0.9 shell segment coverage. Use of a backside reflector results in the generation of a delocalized evanescent field around the NW core segment that can be selectively captured by the partially encapsulating GaAs0.1Sb0.9 shell layer. By adjusting the core and shell dimensions, unity absorption can be selectively achieved in the 2 to 3 μm wavelength range. Due to the transparency of the GaAs0.1Sb0.9 shell segments, wavelength-selective absorption occurs only along the InAs core segments where they are partially encapsulated. The design presented in this work paves the path toward spectrally-selective and polarization-dependent NW array-based photodetectors, in which carrier collection efficiencies can be enhanced by positioning active junctions at the predefined locations of the partial shell segments.

Effect of in-plane alignment on selective area grown homo-epitaxial nanowires

In-plane selective area growth (SAG) of III–V nanowires (NWs) has emerged as a scalable materials platform for quantum electronics and photonics applications. Most applications impose strict requirements on the material characteristics which makes optimization of the crystal quality vital. Alignment of in-plane SAG NWs with respect to the substrate symmetry is of importance due to the large substrate-NW interface as well as to obtain nanostructures with well-defined facets. Understanding the role of mis-orientation is thus important for designing devices and interpretation of electrical performance of devices. Here we study the effect of mis-orientation on morphology of selectively grown NWs oriented along the [1 1̅ 1̅] direction on GaAs(2 1 1)B. Atomic force microscopy is performed to extract facet roughness as a measure of structural quality. Further, we evaluate the dependence of material incorporation in NWs on the orientation and present the facet evolution in between two high symmetry in-plane orientations. By investigating the length dependence of NW morphology, we find that the morphology of ≈1 μm long nominally aligned NWs remains unaffected by the unintentional misalignment associated with the processing and alignment of the sample under study. Finally, we show that using Sb as a surfactant during growth improves root-mean-square facet roughness for large misalignment but does not lower it for nominally aligned NWs.

Modeling Catalyst-Free Growth of III-V Nanowires: Empirical and Rigorous Approaches

Catalyst-free growth of III-V and III-nitride nanowires (NWs) by the self-induced nucleation mechanism or selective area growth (SAG) on different substrates, including Si, show great promise for monolithic integration of III-V optoelectronics with Si electronic platform. The morphological design of NW ensembles requires advanced growth modeling, which is much less developed for catalyst-free NWs compared to vapor-liquid-solid (VLS) NWs of the same materials. Herein, we present an empirical approach for modeling simultaneous axial and radial growths of untapered catalyst-free III-V NWs and compare it to the rigorous approach based on the stationary diffusion equations for different populations of group III adatoms. We study in detail the step flow occurring simultaneously on the NW sidewalls and top and derive the general laws governing the evolution of NW length and radius versus the growth parameters. The rigorous approach is reduced to the empirical equations in particular cases. A good correlation of the model with the data on the growth kinetics of SAG GaAs NWs and self-induced GaN NWs obtained by different epitaxy techniques is demonstrated. Overall, the developed theory provides a basis for the growth modeling of catalyst-free NWs and can be further extended to more complex NW morphologies.

Limiting factors for the growth rate of epitaxial III-V compound semiconductors

Limiting factors for the growth rate of epitaxial III-V compound semiconductors are investigated. A model based on the two connected diffusion equations for the group III and V adatoms applies for planar layers and different nanostructures including III-V nanowires. An expression for the step growth rate is obtained and a physical parameter is revealed which determines an element which actually limits the growth process. Keywords: III-V compound semiconductors, surface diffusion of adatoms, desorption, step growth rate.

Лимитирующие факторы скорости роста при эпитаксии полупроводниковых соединений III-V

Limiting factors for the growth rate of epitaxial III-V compound semiconductors are investigated. A model based on the two connected diffusion equations for the group III and V adatoms applies for planar layers and different nanostructures including III-V nanowires. An expression for the step growth rate is obtained and a physical parameter is revealed which determines an element which actually limits the growth process.