CdS films were grown by MOCVD using dialkyldithiocarbamate precursors. A novel precursor Cd(S 2CNMe nBu) 2, more volatile than the simpler diethyldithiocarbamate was employed in most growth experiments, much earlier work being re-investigated in this study. CdS films were characterised by optical spectrophotometry, thickness determinations, X-ray diffraction, scanning electron microscopy, and electrical measurements. Both precursors gave similar results in film growth on glass substrates over 2 h at 450 and 500°C. Films deposited on glass at 500°C have mean thicknesses in the range 150–700 nm, columnar microstructures, and consist of hexagonal CdS with very pronounced, uniaxial (0001)-orientation. Electrical properties are consistent with trap-dominated behaviour, as evidenced by small photo-induced conductivity enhancements and hysteretic current-voltage characteristics. Typical resistivities at 40°C are ∼ 4 × 10 4 Ω · cm in the dark and ∼ 6 × 10 3 Ω · cm under illumination. Epitaxial CdS film growth on InP substrates was examined, using Cd(S 2CNMe nBu) 2 as the precursor. A film grown on InP (111)P at 500°C was characterised using a three-axis X-ray diffractometer. These measurements indicated triaxial orientation described by the relationships CdS (0001)‖InP (111) and CdS [101̄0]‖InP [112̄].
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