In the three decades of production, SiGe HBTs have numerous applications including RF and high-speed mixed-signal and analog. While successive generations of BiCMOS technologies in the past have employed process and layout scaling, the advanced high performance platforms (with several 100 GHz fmax) have mostly been restricted to SiGe NPN optimization, and the Si PNP is often only offered as a dependent device with significantly slower speed. There truly exists a gap in literature with the PNP device variants showcasing good fT and fmax above 150 GHz in a BiCMOS platform. It is worth noting that much of the serviceable applications above can be designed with NPN-only topologies. However, having the complementary PNP enables several advantages, including power savings, improved gain, reduced design complexity, and improved reliability.There are several challenges for making high performance PNP devices including reduced minority mobility in the intrinsic base from the conducting holes, elevated base current from minority electron injection into the emitter, and heterojunction barrier effect directly on the carrier pathway in the collector-base junction. The figure below shows the measured fT/fmax characteristics for a SiGe PNP with Ae = 0.12x2.5 um2 built using a 130nm technology framework optimized for a PNP-only process. The present work expands on the measured results (AC + DC) and the challenges faced in optimizing PNP performance for 200 GHz fmax and beyond. Figure 1
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