Hexagonal boron nitride (h-BN) is a 2-dimensional (2D) layered insulating material. Thanks to its wide bandgap of ~6 eV and high thermal conductivity, h-BN has been widely utilized as an ideal substrate, gate dielectric material, passivation layer, and atomic tunnelling layer for 2D electronic devices. Recently, it has gained more attention as active material for photonics applications due to its potential for stable quantum emitters in the visible spectral range, as well as deep-ultraviolet emitters and detectors due to its exceptionally high internal quantum efficiency despite its indirect bandgap. However, mechanically exfoliated bulk h-BN and h-BN films grown on catalytic metal substrates by conventional chemical vapor deposition (CVD) systems have been mainly used to study the fundamental properties, lacking in scalability for practical implementation of h-BN.Here, we exploit the scalable approach to grow h-BN on various substrates such as sapphire, Si, and GaN, by using metal-organic chemical vapor deposition (MOCVD). A few-layer h-BN films were successfully grown on those substrates. In particular, we successfully accomplished the conformal growth of few-layer h-BN over an array of Si-based nanotrenches with 45 nm pitch and the aspect ratio of ~ 7:1. Moreover, it was found that at a specific MOCVD growth condition, a very unique h-BN film can be grown on GaN substrates, in which few-layer h-BN film is suspended on GaN nanoneedles. The combination of state-of-the-art microscopic and spectroscopic analyses revealed that the suspended h-BN films exhibit unprecedented deep ultraviolet photoluminescence spectra with local variation in band-edge emission. In addition, the h-BN films show unprecedented atomic stacking configuration, the mechanism of which will be discussed with optical and structural characterizations and theoretical calculations.