Growing sp2 materials on transition metals: calculated atomic adsorption energies of hydrogen, boron, carbon, nitrogen, and oxygen atoms, C2 and BN dimers, C6 and (BN)3 hexamers, graphene and h-BN with and without atomic vacancies.

Abstract

The growth of graphene and hexagonal boron nitride on hot transition metal surfaces involves the adsorption of precursor molecules, and their dissociation and assembly into two-dimensional honeycomb lattices. In a recent account it was found that h-BN may be distilled on a rhodium metal surface, which yields higher quality h-BN [Cun et al., ACS Nano, 2020, 15, 1351]. In this context, we calculated in a systematic approach the adsorption energies and sites of hydrogen, boron, carbon, nitrogen, and oxygen atoms and from the site dependence the activation energy for diffusion. Existing computed values of the solvation energy into the bulk were compared to the present ones with our calculation scheme and found to be in good agreement. For the distinction of different systems we introduce the concepts of epiphilicity and epiphobicity. The adsorption energies and stabilities of the C2 and BN dimers, the C6 and (BN)3 ring-hexamers and the graphene and h-BN monolayers allow the prediction of the performance of different substrates in chemical vapor deposition (CVD) processes for the growth of graphene and h-BN. Finally, vacancy creation energies were calculated as a criterion for the stability of graphene and h-BN on metallic substrates.