We have achieved in situ epitaxial growth of Bi2R1Fe3, 8Al1.2O12 (R=Y, Dy, Tb) films and Bi2Y1Fe5-2xCoxGexO12 (x=0, 0.5, 0.8) films on NGG and GGG substrates by rf diode sputtering at low temperature of 380°C. The epitaxy was as excellent as in LPE, when lattice mismatch was less than 0.5%. The Bi, Al : RIG films with good epitaxy were characterized by well defined and smooth magnetic domains and quite low coercive force of several Oe. The Co-substituted films had large magnetic anisotropy normal to the film plane as well as strong coercivity (∼0.1-1.2 kOe), which is ascribed to CO2+ ion located on octahedral sites. The magnetic anisotropy of these films was explained in terms of stress induced to the film.
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