Heterostructures of wide-bandgap semiconductors, like β-Ga2O3/ GaN, are being used in many high-power, high-frequency electronic and optoelectronic devices. This paper presents the growth of β-Ga2O3 thin film and nanostructures by thermally oxidizing (at 1000 °C) the planar and nano-structured GaN surfaces respectively. The nano-structures of GaN (having 300–500 nm long vertical nano-kinks) are fabricated by metal-assisted chemical etching of GaN surface for 1–2 hours. The thermally grown β-Ga2O3 samples are polycrystalline. The chemical analysis of the samples using X-ray photoelectron spectroscopy (XPS) showed enhancement of Ga-O peak intensity (at 20.21–20.3 eV) at the expense of the Ga-N peak intensity (at 19.2–19.7 eV) in the thermal oxidation process. The O1s XPS spectra of the oxidized samples exhibited prominent signature of O2- ions (530.7–530.9 eV) representing the formation of Ga2O3 with presence of adsorbed hydroxyl group at the surface (532.2 – 532.4 eV). The valance band XPS spectra disclosed the formation of an additional Ga(4 s)–O(2p) hybridization energy state, and the valence band maxima increased from 2.3 eV to 3.25 eV. The Raman spectra of the oxidized samples exhibited multiple Ag and Bg vibrational modes of β-Ga2O3 along with intense E2(high), A1(LO) modes of GaN. The time-resolved photoluminescence spectra of the samples demonstrated fast transition of charge carriers from excited state to ground state with 460–820 pico-seconds average career lifetime.
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