Fused Silica Substrates Research Articles

Photocell-Based Optofluidic Device for Clogging-Free Cell Transit Time Measurements.

Measuring the transit time of a cell forced through a bottleneck is one of the most widely used techniques for the study of cell deformability in flow. It in turn provides an accessible and rapid way of obtaining crucial information regarding cell physiology. Many techniques are currently being investigated to reliably retrieve this time, but their translation to diagnostic-oriented devices is often hampered by their complexity, lack of robustness, and the bulky external equipment required. Herein, we demonstrate the benefits of coupling microfluidics with an optical method, like photocells, to measure the transit time. We exploit the femtosecond laser irradiation followed by chemical etching (FLICE) fabrication technique to build a monolithic 3D device capable of detecting cells flowing through a 3D non-deformable constriction which is fully buried in a fused silica substrate. We validated our chip by measuring the transit times of pristine breast cancer cells (MCF-7) and MCF-7 cells treated with Latrunculin A, a drug typically used to increase their deformability. A difference in transit times can be assessed without the need for complex external instrumentation and/or demanding computational efforts. The high throughput (4000-10,000 cells/min), ease of use, and clogging-free operation of our device bring this approach much closer to real scenarios.

Nano-imprint lithography of broad-band and wide-angle antireflective structures for high-power lasers.

We demonstrate efficient anti reflection coatings based on adiabatic index matching obtained via nano-imprint lithography. They exhibit high total transmission, achromaticity (99.5% < T < 99.8% from 390 to 900 nm and 99% < T < 99.5% from 800 to 1600 nm) and wide angular acceptance (T > 99% up to 50 degrees). Our devices show high laser-induced damage thresholds in the sub-picosecond (>5 J/cm2 at 1030 nm, 500 fs), nanosecond (>150 J/cm2 at 1064 nm, 12 ns and >100 J/cm2 at 532 nm, 12 ns) regimes, and low absorption in the CW regime (<1.3 ppm at 1080 nm), close to those of the fused silica substrate.

Fabrication of fluidic submicron-channels by pulsed laser-induced buckling of SiOx films on fused silica

Recently, considerable attention has been drawn to the field of micro/nanofluidic channels. However, current methods for fabricating micro/nanochannels are complex, costly, and time-intensive. In the present work, we successfully fabricated transparent submicron-channels on fused silica substrates (SiO2) using a straightforward laser process. To achieve this, a single-pulse excimer laser irradiation in a rear side configuration was employed to treat a thin film of UV-absorbing silicon suboxide (SiOx) through the transparent SiO2 substrate. A polydimethylsiloxane (PDMS) superstrate (coating layer) was applied over the SiOx film before laser exposure, serving as a confinement for controlled structure formation induced by the laser. Under optimal laser fluence, the thin SiOx film buckled, leading to the formation of channels with a width ranging from 10 to 20 µm and a height of 800 to 1200 nm, exhibiting a bell-like cross-sections following the so-called Euler buckling mode. Wider channels displayed morphologies resembling varicose or telephone cord modes. Subsequent high-temperature annealing led to the oxidation of SiOx, resulting transparent SiO2 channels on the fused silica substrate. The manufactured nanochannels exhibited promising potential for effectively transporting fluids of diverse viscosities. Various fluids were conveyed through these nanochannels via capillary action and in accordance with the Lucas-Washburn equation.

Spintronic terahertz metasurface emission characterized by scanning near-field nanoscopy

Abstract Understanding the ultrafast excitation, detection, transportation, and manipulation of nanoscale spin dynamics in the terahertz (THz) frequency range is critical to developing spintronic THz optoelectronic nanodevices. However, the diffraction limitation of the sub-millimeter waves – THz wavelengths – has impaired experimental investigation of spintronic THz nano-emission. Here, we present an approach to studying laser THz emission nanoscopy from W|CoFeB|Pt metasurfaces with ∼60-nm lateral spatial resolution. When comparing with statistic near-field THz time-domain spectroscopy with and without the heterostructures on fused silica substrates, we find that polarization- and phase-sensitive THz emission nanoscopy is more sensitive than the statistic THz scattering intensity nanoscopy. Our approach opens explorations of nanoscale ultrafast THz spintronic dynamics in optically excited metasurfaces.

Transmission enhancement in coupled nanohole and nanodisk arrays for solar blind UV filter

Extraordinary optical transmission (EOT) based on metallic nanohole array has great potential for optical filtering, owing to its spectral selectivity and structure-dependent tunability. However the transmittance of EOT is relatively low owing to the large loss of the metal film, particularly in the UV waveband. Herein, we propose a high transmission narrowband ultraviolet filter based on aluminum compound nanostructures on a UV-grade fused silica substrate. These compound nanostructures are consisted of periodic nanodisk and nanohole arrays with the same period in a staggered rectangular arrangement. Numerical simulations using the finite-difference time-domain (FDTD) method have shown that the compound structures exhibit high transmittance of over 70% and a narrower bandwidth of less than 50 nm in the 200–300 nm spectral region compared with the conventionally EOT of pure metallic nanohole arrays. Moreover, a broad suppression in the wavelength ranges of 300 to 1100 nm was achieved. The enhanced performance is attributed to the coupling between the surface plasmon polariton (SPP) of nanohole arrays and the localized surface plasmon resonance (LSPR) of nanodisk arrays. The compound coupled nanostructures can be used in solar-blind ultraviolet detectors and the enhancement mechanism has potential for use in other spectral regions.

Application of Aluminium Nanostructures for 355 nm Surface-enhanced Raman Spectroscopy of Coconut Milk

Less than two decades ago aluminium plasmonics emerged and attracted great interest. Aluminium nanoparticles were produced on fused silica substrates by the direct picosecond laser deposition technique. The as prepared active substrates were used for the first time to 355 nm surface-enhanced Raman spectroscopy to detect coconut milk as a probe analyte. The µ-Raman spectrum was also applied for comparison and the transmission spectrum of the aluminium nanoparticles array was checked.

Nanosecond laser damage of 532 nm thin film polarizers evaluated by different testing protocols

Different laser damage testing protocols, including 1-on-1, S-on-1, and Raster Scan, were conducted on 532 nm polarizers to evaluate the damage resistance and mechanisms. A comparison of the laser-induced damage thresholds (LIDTs) revealed different damage characteristics and major contributions to film failure for different polarizations. For P polarization, the LIDTs for the three test protocols were nearly the same because of the stabilization of two typical damage morphologies of flat-bottomed pits and mussel damage pits. For S polarization, the LIDTs for multiple pulses were lowest, where absorptive defect-induced damage was revealed. The damage characteristics of 532 nm polarizers and 1064 nm polarizers have been also compared. The mussel damage pits, which are similar to the typical damage morphologies of ultraviolet (UV) laser damage to fused silica, were observed for the first time in coatings of 532 nm polarizers. This suggests that, the polishing-induced subsurface damage of fused silica substrates may tend to be excited by a short-wavelength laser rather than the fundamental wavelength.

Effects of Dy on structural, morphology, optical, and resistive switching properties of HfO2 thin films

This paper studies the effect of Dy on the structure, morphology, and optical properties of HfO2 thin films deposited on fused silica substrates and the optical transparency and resistive switching (RS) behavior of the thin films as an active insulator layer in Ag/active insulator layer/ITO/glass memories. Thin films were deposited by spin-coating using a precursor solution obtained by the Pechini-type sol-gel method. The structural analysis revealed that the insertion of Dy ions into the HfO2 lattice caused the phase transformation from the monoclinic to the cubic phase. Morphological analysis revealed that the thin films had thicknesses between 98 and 101 nm, and their surfaces were composed of 3D islands formed by aggregates of spherical particles ranging from 8 to 5 nm. The active insulator layers had thicknesses ranging from 235 to 218 nm, with no cavities or cracks between them. The optical transparency of the active insulator layer/ITO/glass memory structures was between 70 and 87 %. Optical transmittance, optical bandgap, and optical constants were modified incorporating Dy ions into HfO2 thin films compared to the undoped HfO2 thin films. Incorporating Dy ions into HfO2 increased oxygen vacancies in the active insulator layers. The memory with 10 w% of Dy had the highest resistance off/on ratio of 9.04 compared with undoped HfO2 memory. Also, the conduction mechanism in the high resistive state (HRS) of the memory with 10 w% of Dy was related to ohmic conduction and space charge limited conduction (SCLC).

Optical and electrical analysis of polyethylene oxide/disodium hexachloroplatinate complex composite films

AbstractThe present study reports the synthesis of composite films comprising PEO/Na2PtCl6 complex and their deposition onto fused silica substrates via the dip‐coating method. Chemical, crystallographic, and thermal characterizations are carried out to confirm the incorporation of Na2PtCl6 and PEO matrix into the films. The transmittance of the PEO film is initially high and decreases subsquently with an increase in Na2PtCl6 content. The optical band‐gap energy of the composite films decreases exponentially from 4.62 to 3.79 eV with the increase in Na2PtCl6 content. Furthermore, in the normal dispersion region, the refractive index of the PEO film decreases from 2.00 to 1.670 as the wavelength increases from 400 to 700 nm. The refractive index values increase with an increase in the concentration of Na2PtCl6 in the PEO film up to 8 wt.%. The incorporation of Na2PtCl6 into the PEO matrix increases the electrical conductivity because of the combined enhancement of the PEO conductivity and increase i Na2PtCl6. These findings suggest that PEO/Na2PtCl6 complex composite films have potential applications in UV‐shielding and optoelectronic devices.

An Adaptation of the Split-Cylinder Resonator Method for Measuring the Microwave Properties of Thin Ferroelectric Films in a “Thin Film—Substrate” Structure

The split-cylinder resonator method was adapted to measure the microwave properties (dielectric permittivity and loss tangent) of thin ferroelectric films on a dielectric substrate. The mathematical model for calculating the resonance frequency of the split-cylinder resonator was adjusted for the “ferroelectric film—substrate” structure. An approach for correcting the gap effect based on calibrating with a single-layer dielectric was introduced and used to study two-layer dielectrics. The prototype of a split-cylinder resonator designed to measure single-layer dielectric plates at a frequency of 10 GHz was presented. The resonator calibration was performed using dielectric PTFE samples and fused silica, and an example of the correction function was suggested. The measurement error was estimated, and recommendations on the acceptable parameter range for the material under investigation were provided. The method was demonstrated to measure the microwave properties of a ferroelectric film on a fused silica substrate.

Influence of Thermal Annealing on Mechanical and Optical Property of SiO2 Film Produced by ALD.

The application range of fused silica optical components can be expanded and the cost of fused silica components can be reduced by depositing the same material film on fused silica substrate. However, due to the different manufacturing process, the performance of ALD SiO2 film is lower than that of fused silica substrate, which also limits the use of this process. In this paper, ALD SiO2 film with different thicknesses were deposited, and then the structure and properties were tested. Finally, the ALD SiO2 film was treated via the annealing process. Transmission electron microscopy (TEM) showed that the ALD SiO2 film had good compactness and substrate adhesion. The Raman spectra showed that the ALD SiO2 film and substrate had the same structure, with only slight differences. The XRD pattern showed that ALD-fused silica did not crystallize before or after annealing. The infrared spectra showed that there was an obvious Si-OH defect in the ALD SiO2 film. The laser damage showed that the ALD SiO2 film had a much lower damage threshold than the fused silica substrate. The nanoindentation showed that the mechanical properties of the ALD SiO2 film were much lower than those of the fused silica substrate. After a low-temperature annealing treatment, the ALD SiO2 film Si-OH defect was reduced, the ALD SiO2 film four-member ring content was increased, the elastic modulus of the ALD SiO2 film was increased from 45.025 GPa to 68.025 GPa, the hardness was increased from 5.240 GPa to 9.528 GPa, and the ALD SiO2 film damage threshold was decreased from 5.5 J/cm2 to 1.3 J/cm2.

Large-area polycrystalline α-MoO3 thin films for IR photonics

In recent years, the excitation of surface phonon polaritons (SPhPs) in van der Waals materials received wide attention from the nanophotonics community. Alpha-phase Molybdenum trioxide (α-MoO3), a naturally occurring biaxial hyperbolic crystal, emerged as a promising polaritonic material due to its ability to support SPhPs for three orthogonal directions at different wavelength bands (range 10–20 μm). Here, we report on the fabrication, structural, morphological, and optical IR characterization of large-area (over 1 cm2 size) α-MoO3 polycrystalline film deposited on fused silica substrates by pulsed laser deposition. Due to the random grain distribution, the thin film does not display any optical anisotropy at normal incidence. However, the proposed fabrication method allows us to achieve a single α-phase, preserving the typical strong dispersion related to the phononic response of α-MoO3 flakes. Remarkable spectral properties of interest for IR photonics applications are reported. For instance, a polarization-tunable reflection peak at 1006 cm−1 with a dynamic range of ΔR = 0.3 and a resonance Q-factor as high as 53 is observed at 45° angle of incidence. Additionally, we report the fulfillment of an impedance matching condition with the SiO2 substrate leading to a polarization-independent almost perfect absorption condition (R < 0.01) at 972 cm−1 which is maintained for a broad angle of incidence. In this framework our findings appear extremely promising for the further development of mid-IR lithography-free, scalable films, for efficient and large-scale sensors, filters, thermal emitters, and label-free biochemical sensing devices operating in the free space, using far-field detection setups.

Spin crossover in {Fe(pyrazine)[M(CN)4]} (M = Ni, Pt) thin films assembled on fused silica substrates.

Thin films with thicknesses in the range between ca. 10-50 nm of the spin crossover (SCO) compound {Fe(pyrazine)[μ4-M(CN)4]} (M = Ni, Pt) have been deposited on fused silica substrates using a sequential assembly method and 4-pyridinecarboxylic acid as anchoring layer. Film morphology and crystallinity were assessed by means of atomic force microscopy and grazing incidence X-ray diffraction, respectively. The intensity of the π-π* transition of the pyrazine ligand at 270 nm, being rather insensitive to the spin state of the complex, was used to follow the film growth as a function of different deposition parameters. On the other hand, the spin state changes were inferred from the temperature dependence of absorption bands appearing at 540, 490 and 310 nm in the low spin state. In line with their amorphous nature, each film displays a very gradual thermal spin crossover between ca. 100-300 K, independently of its thickness and deposition conditions. These results are not only interesting to better understand the effects of size reduction and organization on the SCO phenomenon, but the deposition of these SCO compounds on electrically insulating and/or optically transparent oxide surfaces opens also the door for various photonic or electronic applications.

Microstructure and physical properties of black-aluminum antireflective films.

The microstructure and physical properties of reflective and black aluminum were compared for layers of different thicknesses deposited by magnetron sputtering on fused silica substrates. Reflective Al layers followed the Volmer-Weber growth mechanism classically observed for polycrystalline metal films. On the contrary, the extra nitrogen gas used to deposit the black aluminum layers modified the growth mechanism and changed the film morphologies. Nitrogen cumulated in the grain boundaries, favoring the pinning effect and stopping crystallite growth. High defect concentration, especially vacancies, led to strong columnar growth. Properties reported for black aluminum tend to be promising for sensors and emissivity applications.

A new approach for obtaining ceramic NASICON (Na3Zr2Si2PO12) films sintered in situ by a sol–gel method, using spray deposition and near-infra red sintering

In this work we demonstrate a NASICON film sintered in situ onto a fused silica substrate.

The influence of space environmental factors on the laser-induced damage thresholds in optical components

Abstract This paper systematically investigated the impact mechanisms of proton irradiation, atomic oxygen irradiation and space debris collision, both individually and in combination, on the laser damage threshold and damage evolution characteristics of HfO2/SiO2 triple-band high-reflection films and fused silica substrates using a simulated near-Earth space radiation experimental system. For the high-reflection film samples, the damage thresholds decreased by 15.38%, 13.12% and 46.80% after proton, atomic oxygen and simulated space debris (penetration) irradiation, respectively. The coupling irradiation of the first two factors resulted in a decrease of 26.93%, while the combined effect of all the three factors led to a reduction of 63.19%. Similarly, the fused silica substrates exhibited the same pattern of laser damage performance degradation. Notably, the study employed high-precision fixed-point in situ measurement techniques to track in detail the microstructural changes, surface roughness and optical-thermal absorption intensity before and after proton and atomic oxygen irradiation at the same location, thus providing a more accurate and comprehensive analysis of the damage mechanisms. In addition, simulations were conducted to quantitatively analyze the transmission trajectories and concentration distribution lines of protons and atomic oxygen incident at specific angles into the target material. The research findings contribute to elucidating the laser damage performance degradation mechanism of transmissive elements in near-Earth space environments and provide technical support for the development of high-damage-threshold optical components resistant to space radiation.

Laser Glass deposition of single-mode glass fibers for the fabrication of chip-scale photonic circuits

The use of glass, particularly fused silica (FS), instead of polymers or semiconductors as optical waveguide material is advantageous due to broadband transmission, reduced propagation losses, and enhanced thermal and mechanical stability. In this contribution, laser glass deposition for the chip-scale fabrication of FS-based optical waveguides is investigated. We use a CO2 laser with emission at a wavelength of 10.6 µm to weld conventional single-mode glass fibers onto a FS substrate, with the aim of maintaining the waveguide properties of the fibers. Synchronized translational and rotational axis movements allow for positioning of the waveguides in arbitrary geometries. Furthermore, a CO2 laser-based cleaving method is introduced, which facilitates on-chip creation of waveguide end facets for optical coupling. An analysis of the cleave geometry in dependence on process parameters as well as optical coupling losses are presented. Coupling losses of 0.88 dB for a laser-cleave and propagation losses of 0.56 dB/cm for a 10 cm on-chip welded fiber were achieved. The results pave the way for on-chip integration of fiber-based systems like lasers, sensing devices or optical communication networks.

Design and development of medium-pressure plasma process for optical substrate finishing: A comparative study with wet chemical etching

Plasma polishing is a relatively new technique successfully applied for polishing optical materials due to its numerous advantages. It includes the high quality of the polished surface, reduced surface and sub-surface defects, high processing speed, etc. This paper investigates surface finish on fused silica using two processes, i.e., medium pressure plasma process and wet chemical etching. The experimental result shows that at a 20 mbar chamber pressure and 80 W radio frequency power, the surface finish of coarse machined and lapped fused silica substrate is better than 5 and 10 mbar. The experiments are also conducted using wet chemical etching on coarse machined and lapped polished fused silica substrates using a mixed hydrofluoric and sulfuric acid solution. However, using wet chemical etching, the percentage increase of surface roughness achieved on lapped and coarse machined surfaces is higher than in the plasma process. The percentage increase in surface roughness is 84.8 % and 98.81 % on coarse surfaces and 69.23 % and 892.3 % on lapped surfaces upto 30 μm material depth using plasma process (at 20 mbar pressure) and wet chemical etching, respectively. The surface microstructure of fused silica before and after processing is investigated using field-emission scanning electron microscopy. The result reveals that plasma polishing significantly reduced the micro-cracks and damaged layers. Energy dispersive X-ray results show the presence of elements fluorine, silicon, oxygen, and carbon on the processed surface, showing evidence of plasma reaction. Moreover, an additional element, i.e., sulfur, also appears on the processed surfaces from the solution during wet chemical etching. The sharp diffraction peaks have not been observed in X-ray diffraction patterns, indicating that the material is amorphous fused silica.

Generation of millijoule-level sub-5 fs violet laser pulses

AbstractWe demonstrate the generation, spectral broadening and post-compression of second harmonic pulses using a thin beta barium borate (BBO) crystal on a fused-silica substrate as the nonlinear interaction medium. By combining second harmonic generation in the BBO crystal with self-phase modulation in the fused-silica substrate, we efficiently generate millijoule-level broadband violet pulses from a single optical component. The second harmonic spectrum covers a range from long wave ultraviolet (down to 310 nm) to visible (up to 550 nm) with a bandwidth of 65 nm. Subsequently, we compress the second harmonic beam to a duration of 4.8 fs with a pulse energy of 0.64 mJ (5 fs with a pulse energy of 1.05 mJ) using chirped mirrors. The all-solid free-space apparatus is compact, robust and pulse energy scalable, making it highly advantageous for generating intense second harmonic pulses from near-infrared femtosecond lasers in the sub-5 fs regime.

Exploring fs-laser irradiation damage subthreshold behavior of dielectric mirrors via electrical measurements

Abstract With ultrafast laser systems reaching presently 10 PW peak power or operating at high repetition rates, research towards ensuring the long-term, trouble-free performance of all laser-exposed optical components is critical. Our work is focused on providing insight into the optical material behavior at fluences below the standardized laser-induced damage threshold (LIDT) value by implementing a simultaneous dual analysis of surface emitted particles using a Langmuir probe (LP) and the target current (TC). ${\mathrm{HfO}}_2$ and ${\mathrm{ZrO}}_2$ thin films deposited on fused silica substrates by pulsed laser deposition at various ${\mathrm{O}}_2$ pressures for defect and stoichiometry control were irradiated by Gaussian, ultrashort laser pulses (800 nm, 10 Hz, 70 fs) in a wide range of fluences. Both TC and LP collected signals were in good agreement with the existing theoretical description of laser–matter interaction at an ultrashort time scale. Our approach for an in situ LIDT monitoring system provides measurable signals for below-threshold irradiation conditions that indicate the endurance limit of the optical surfaces in the single-shot energy scanning mode. The LIDT value extracted from the LP-TC system is in line with the multipulse statistical analysis done with ISO 21254-2:2011(E). The implementation of the LP and TC as on-shot diagnostic tools for optical components will have a significant impact on the reliability of next-generation ultrafast and high-power laser systems.