In this work we have developed an appropriate and novel model for computing the contribution of all trapsat the Si–SiO2 interface to the low frequency (LF) noise power spectrum. In our approach we have usedtheoretical and experimental convex ‘U’-shape curves to model the density of states oftraps distributed at the interface, predicting the qualitative and quantitative behavior forthe reduction of LF noise. In the model development, basic discrete device physicsquantities are used. The low frequency noise behavior of metal–oxide–semiconductordevices under cyclo-stationary excitation is evaluated through analytical and numericalcalculations, and a comparison to relevant experimental data found in the literature isprovided.
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