Polyvinylidene fluoride (PVDF), with β polymorph, is a versatile ferroelectric polymer in device fabrication. Its flexibility, lightweight, and ease of fabrication make it an alternative for electromagnetic interference shielding effectiveness (EMI-SE) improved through swift heavy ion (SHI) irradiation. For the first time, we modified PVDF thin films for EMI-SE applications, exposing them to a 100 MeV oxygen ion beam at varying fluencies. Our analysis encompassed investigating structural study, bonding interactions, surface morphology, and elemental analysis using X-ray diffraction (XRD), Fourier transform infrared spectrophotometry (FTIR), and Field Effect Scanning Electron Microscopy (FESEM) with Energy Dispersive X-ray Spectroscopy (EDS) respectively. Further, we measured dielectric response, cole-cole plot and EMI-SE in Ku-band (12–18 GHz) region using a vector network analyzer (VNA). The results revealed distinctive variations due to the deposition of 100 MeV oxygen ion beams, emphasizing the significant potential of irradiated PVDF thin films for EMI-SE applications. This study contributes to understanding the transformative impact of ion beam exposure on PVDF thin films and highlights their practical promise in emerging technological applications, particularly in EMI-SE.
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