The development of techniques to grow diamond thin films using chemical vapour deposition (CVD) is now an area of active world-wide research [1, 2] and the unique physical and chemical properties of diamond promise many potential applications in optical components, semiconducting devices and hard wear-resistant coatings [3, 4]. Previous work has focused primarily on planar silicon on molybdenum substrates, but some preliminary results have recently been reported for coatings on wires [5, 6]. This paper describes a technique for producing uniform diamond coatings on the surface of metallic wires or ceramic fibres and the production of free-standing diamond tubes. The factors that affect the quality of the diamond fibres are discussed and their potential use in reinforced composites is considered. In the present experiments, diamond-coating was carried out in a standard hot filament CVD reactor [1, 2], in which CH 4 and H2 in a ratio of 1:100 were passed into a vacuum chamber at a total flow rate of 200 standard cm 3 min -I and a pressure of about 4000 Pa. A Ta filament held at 2000 °C dissociated the gases allowing carbon to deposit on to the surface of the wires and fibres in the form of a polycrystalline diamond film at a rate of about 0.5/xmh -1. If the wire was placed parallel to, and a few millimetres from, the filament (as for planar substrates) the uniformity of the diamond-coating was limited by the thickness of the wire, since diamond grew fastest on the side of the wire facing the filament. This effect became noticeable for wires and fibres with diameter > 250/zm, placing an upper limit upon the thickness of wires or fibres that can be uniformly coated by this method of around 300/zm. Alternatively, if the wire was positioned centrally and coaxially within the coils of the filament, uniform coatings on wires and fibres with a wide range of diameters were achieved. In this case, for thicker wires or fibres (even up to a few millimetres diameter), the diameter of the filament coils was simply increased to maintain an optimum distance of about 4-5 mm between the surface of the wire and the filament. This ensured that the wire was heated to a sufficient temperature to favour diamond deposition (typically about 900 °C), and also that the
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