Ferroelectric Thin Films Research Articles

Colossal Ferroelectric Photovoltaic Effect in Inequivalent Double-Perovskite Bi2FeMnO6 Thin Films.

Double perovskite films have been extensively studied for ferroelectric order, ferromagnetic order, and photovoltaic effects. The customized ion combinations and ordered ionic arrangements provide unique opportunities for bandgap engineering. Here, a synergistic strategy to induce chemical strain and charge compensation through inequivalent element substitution is proposed. A-site substitution of the barium ion is used to modify the chemical valence and defect density of the two B-site elements in Bi2FeMnO6 double perovskite epitaxial thin films. We dramatically increased the ferroelectric photovoltaic effect to ∼135.67 μA/cm2 from 30.62 μA/cm2, which is the highest in ferroelectric thin films with a thickness of less than 100 nm under white-light LED irradiation. More importantly, the ferroelectric polarization can effectively improve the photovoltaic efficiency of more than 5 times. High-resolution HAADF-STEM, synchrotron-based X-ray diffraction and absorption spectroscopy, and DFT calculations collectively demonstrate that inequivalent ion plays a dual role of chemical strain (+1.92 and -1.04 GPa) and charge balance, thereby introducing lattice distortion effects. The reduction of the oxygen vacancy density and the competing Jahn-Teller distortion of the oxygen octahedron are the main phenomena of the change in electron-orbital hybridization, which also leads to enhanced ferroelectric polarization values and optical absorption. The inequivalent strategy can be extended to other double perovskite systems and applied to other functional materials, such as photocatalysis for efficient defect control.

Symmetry Engineering of Epitaxial Hf0.5Zr0.5O2 Ultrathin Films.

Robust ferroelectricity in HfO2-based ultrathin films has the potential to revolutionize nonvolatile memory applications in nanoscale electronic devices because of their compatibility with the existing Si technology. However, to fully exploit the potential of ferroelectric HfO2-based thin films, it is crucial to develop strategies for the controlled stabilization of various HfO2-based polymorphs in nanoscale heterostructures. This study demonstrates how substrate-orientation-induced anisotropic strain can engineer the crystal symmetry, structural domain morphology, and growth orientation of ultrathin Hf0.5Zr0.5O2 (HZO) films. Epitaxial ultrathin HZO films were grown on the heterostructures of (001)- and (110)-oriented La2/3Sr1/3MnO3/SrTiO3 (LSMO/STO) substrate. Various structural analyses revealed that the (110)-oriented substrate promotes a higher degree of structural order (crystallinity) with improved stability of the (111)-oriented orthorhombic phase (Pca21) of HZO. Conversely, the (001)-oriented substrate not only induces a distorted orthorhombic structure but also facilitates the partial stabilization of nonpolar phases. Electrical measurements revealed robust ferroelectric properties in epitaxial thin films without any wake-up effect, where the well-ordered crystal symmetry stabilized by STO(110) facilitated better ferroelectric characteristics. This study suggests that tuning the epitaxial growth of ferroelectric HZO through substrate orientation can improve the stability of the metastable ferroelectric orthorhombic phase and thereby offer a better understanding of device applications.

Deterministic Orientation Control of Ferroelectric HfO2 Thin Film Growth by a Topotactic Phase Transition of an Oxide Electrode.

The scale-free ferroelectricity with superior Si compatibility of HfO2 has reawakened the feasibility of scaled-down nonvolatile devices and beyond the complementary metal-oxide-semiconductor (CMOS) architecture based on ferroelectric materials. However, despite the rapid development, fundamental understanding, and control of the metastable ferroelectric phase in terms of oxygen ion movement of HfO2 remain ambiguous. In this study, we have deterministically controlled the orientation of a single-crystalline ferroelectric phase HfO2 thin film via oxygen ion movement. We induced a topotactic phase transition of the metal electrode accompanied by the stabilization of the differently oriented ferroelectric phase HfO2 through the migration of oxygen ions between the oxygen-reactive metal electrode and the HfO2 layer. By stabilizing different polarization directions of HfO2 through oxygen ion migration, we can gain a profound understanding of the oxygen ion-relevant unclear phenomena of ferroelectric HfO2.

Enhancement of ferroelectricity in chemical-solution-deposited ZrO2 thin films through fine phase transition control

Recent studies have highlighted the ferroelectric potential of ZrO2 thin films, which offer advantages over HfO2-based ferroelectric materials, such as lower thermal budget and greater natural abundance. In this research, pure ZrO2 ferroelectric thin films were fabricated on Si substrates using chemical solution deposition with all-inorganic precursors. We explored the impacts of film thickness and HfO2 seed layers on phase transition and ferroelectric properties. Notably, an 11 nm thick ZrO2 film exhibited ferroelectric behavior with a remanent polarization of 12.6 μC/cm2. Due to the combined effects of tensile stress and surface energy, the increase in thickness to 30 nm led to a phase transition from the orthorhombic phase to the monoclinic phase and a resultant decrease in remanent polarization. Additionally, the introduction of a HfO2 seed layer facilitated the crystallization of the ferroelectric o-phase, enhancing the remanent polarization to 16.5 μC/cm2 in our ∼8 nm thick ZrO2 thin film with a ∼2 nm thick HfO2 seed layer. These findings provide valuable insights into optimizing ferroelectric properties in ZrO2 thin films through phase transition control.

The effects of crystal orientation on the ferroelectric and optoelectronic properties of Pt/Na0.5Bi0.5TiO3/La0.5Sr0.5CoO3 heterostructures

Due to their excellent ferroelectric, semiconducting, and optoelectronic properties, perovskite ferroelectric thin films have attracted increasing attention in the photovoltaic field. Using La0.5Sr0.5CoO3 (LSCO) as the bottom electrode, flake, strip and pyramidal Na0.5Bi0.5TiO3 (NBT) films were prepared on (001), (110) and (111) SrTiO3 (STO) substrates by off-axis magnetron sputtering and pulsed laser deposition, respectively. XRD and Phi scan results show that both LSCO and NBT are perovskite structures and satisfy the epitaxial growth along the substrate STO. NBT orientation has a significant effect on the ferroelectric properties of Pt/NBT/LSCO heterostructures. The remnant polarization 2Pr values for NBT(111), NBT(110) and NBT(001) are 87.5, 62.6 and 28.5 μC/cm2, respectively, and thus 2Pr(111)>2Pr(110)>2Pr(001). NBT(111) shows the best ferroelectric properties (Pr=41.3 μC/cm2), excellent fatigue-resisting (up to 1010 cycles) and retention performance (duration 104s). The 2Pr-T association 2 Pr=41.72+16.05*T0.35 for NBT(111) was obtained according to the curve fitting, it is found that the NBT orientation has a significant effect on the PV effect for PT/NBT/LSCO photovoltaics and the open-circuit voltage ∆Voc. The short-circuit current ∆Jsc of polarization regulate intensity follows the laws of ∆Voc-111>∆Voc-110>∆Voc-001 and ∆Jsc-111>∆Jsc-110>∆Jsc-001, the Jsc for Pt/NBT(111)/LSCO heterostructures increases linearly with the illumination Ip increasing, while the Voc decreases linearly. The ferroelectro-polarized modulation PV mechanism was investigated by analyzing band structure of the Pt/NBT/LSCO heterostructures, which is attributed to the coupling effect of the ferroelectric depolarization field and the interfacial Schottky barrier.

A BaTiO3-based flexible ferroelectric capacitor for non-volatile memories

BaTiO3 (BTO) ferroelectric films, which are renowned for their lead-free compositions, superior stability, and absence of a wake-up effect, are promising candidate materials in the field of non-volatile memories. However, the prerequisites for high-temperature conditions in the fabrication of ferroelectric thin films impose constraints on the substrate choice, which has limited the advancement in non-volatile memories based on single-crystal flexible BTO films with robust ferroelectric properties. Herein, a technique has been developed for the fabrication of flexible devices using a pulsed laser deposition system. BTO ferroelectric films have then been deposited onto a flexible mica substrate, with SrTiO3 (STO) serving as a buffer layer. The obtained flexible BTO devices exhibited excellent ferroelectricity, with a maximum polarization (2Pmax) of up to 42.58 μC/cm2 and a remnant polarization (2Pr) of up to 21.39 μC/cm2. Furthermore, even after 1000 bending cycles, the bipolar switching endurance remained high at 1012 cycles. After 104 s, the flexible BTO device still maintained excellent polarization characteristics. These results make the flexible BTO ferroelectric thin film a potential candidate for the next generation of non-volatile memories.

Enhancement of remnant polarization in ferroelectric HfO2 thin films induced by mechanical uniaxial tensile strain after the crystallization process

The effect of strain on the ferroelectricity of HfO2 thin films after crystallization was investigated by applying uniaxial mechanical strains to Au/HfO2/TiN metal–ferroelectric–metal (MFM) capacitors. The remnant polarization (2P r) of MFM capacitors increased when tensile strain was applied during polarization switching. This phenomenon should not be attributed to phase transformation from the non-ferroelectric to the ferroelectric phase, taking account of the fast relaxation of 2P r after removal of the mechanical strain and the fact that the crystal structure of HfO2 thin films evaluated by grazing incidence X-ray diffraction measurement was not changed by the tensile strain.

Fabrication and characterization of HfxAl(1-x)Oy ceramic targets and thin films by RF sputtering

The potential of HfO2 as a memory semiconductor material with ferroelectric properties in thin-film deposition has been recently analyzed. In this study, the preparation, composition, and physical properties of Al-doped hafnium oxides were analyzed. HfxAl(1-x)Oy (HAO) [x = 0.33, 0.5, and 0.67] powders were prepared by controlling the ratio of Hf to Al and using ball milling. The HAO powder was calcined at 1000 °C in a furnace and then sintered in a temperature range of 1000–1600 °C by a solid-state reaction method to fabricate high-quality targets with high densities. The density and crystal size increased with the sintering temperature. The 1600-°C Hf0.67Al0.33Oy target was optimal for thin-film deposition. In addition, the target properties were affected by an increase in the HfO2 content x. The crystal structures and sizes, surface free energies, contact angles, and band gaps of the HAOs were evaluated to analyze their potential as high-k dielectric materials. HAO is a promising high-k dielectric and memory material, valuable for further studies on ferroelectric gate oxide materials. This study contributes to the increasing number of studies on the ferroelectricity of HfO2 thin films and provides a fundamental understanding of this material and its potential for novel device applications.

Investigation of annealing temperature dependent sub-cycling behavior for HfZrOx-based ferroelectric capacitor

Ferroelectric HfO2 thin film has been widely explored due to its superior characteristics, such as high switching speed, scalability, and long data retention. However, it still faces challenges in achieving good stability due to the wake-up and split-up effects. In this study, the sub-cycling behavior of Hf0.5Zr0.5O2-based ferroelectric capacitors (FeCaps) with various annealing temperatures is investigated. Our results suggest that the FeCaps with higher annealing temperatures demonstrate an increased resistance to the split-up effect and exhibit less distorted hysteresis loops compared to their lower-temperature counterparts. Symmetrical sub-cycling reveals pronounced current split-up and diminished switching current peaks in the FeCaps with lower annealing temperatures, whereas those annealed at higher temperatures show minimal current split-up and enhanced performance. Asymmetrical sub-cycling shows that lower annealing temperatures cause local domain pinning, while higher temperatures result in imprint-like behavior. Synchrotron-based extended x-ray absorption fine structure and hard x-ray photoelectron spectroscopy analyses reveal the potential of nitrogen doping in HfZrOx under high-temperature annealing processes, forming the Hf–N species to mitigate the amount of charged oxygen vacancy (VO2+) in the interfacial region. This study elucidates the relationship between VO2+ distribution and the split-up effect during sub-cycling, providing critical insights for enhancing the sub-cycling performance and stability of HfO2-based devices.

The Enhanced Polarization Switching Speed and Endurance in Hf₀.₅Zr₀.₅O₂ Ferroelectric Thin Film by Modulating Oxygen Dose in Ferroelectric Layers

The Enhanced Polarization Switching Speed and Endurance in Hf₀.₅Zr₀.₅O₂ Ferroelectric Thin Film by Modulating Oxygen Dose in Ferroelectric Layers

Permissible domain walls in monoclinic ferroelectrics. Part II. The case of MC phases.

Monoclinic ferroelectric phases are prevalent in various functional materials, most notably mixed-ion perovskite oxides. These phases can manifest as regularly ordered long-range crystallographic structures or as macroscopic averages of the self-assembled tetragonal/rhombohedral nanodomains. The structural and physical properties of monoclinic ferroelectric phases play a pivotal role when exploring the interplay between ferroelectricity, ferroelasticity, giant piezoelectricity and multiferroicity in crystals, ceramics and epitaxial thin films. However, the complex nature of this subject presents challenges, particularly in deciphering the microstructures of monoclinic domains. In Paper I [Biran & Gorfman (2024). Acta Cryst. A80, 112-128] the geometrical principles governing the connection of domain microstructures formed by pairing MAB type monoclinic domains were elucidated. Specifically, a catalog was established of `permissible domain walls', where `permissible', as originally introduced by Fousek & Janovec [J. Appl. Phys. (1969), 40, 135-142], denotes a mismatch-free connection between two monoclinic domains along the corresponding domain wall. The present article continues the prior work by elaborating on the formalisms of permissible domain walls to describe domain microstructures formed by pairing the MC type monoclinic domains. Similarly to Paper I, 84 permissible domain walls are presented for MC type domains. Each permissible domain wall is characterized by Miller indices, the transformation matrix between the crystallographic basis vectors of the domains and, crucially, the expected separation of Bragg peaks diffracted from the matched pair of domains. All these parameters are provided in an analytical form for easy and intuitive interpretation of the results. Additionally, 2D illustrations are provided for selected instances of permissible domain walls. The findings can prove valuable for various domain-related calculations, investigations involving X-ray diffraction for domain analysis and the description of domain-related physical properties.

Large pyroelectric energy conversion in lead scandium tantalate thin films

Non-linear pyroelectric energy harvesting using ferroelectric thin films exhibits high energy conversion, primarily due to their large breakdown field compared to bulks. Here, we report the pyroelectric energy conversion potential of lead scandium tantalate, Pb(Sc1/2Ta1/2)O3 (PST) thin film fabricated on a c-sapphire substrate using chemical solution deposition. To enable the application of high electric field and to assess the pyroelectric energy conversion performance, interdigitated electrodes were deposited on the PST thin film. A maximum harvested energy density of 9.1 J cm−3 per cycle was deduced from polarization measurements in films undergoing an Olsen cycle between 0 °C and 150 °C when the electric field was varied between 50 and 1500 kV/cm. Furthermore, PST thin films can reach up to 27 % of Carnot efficiency for a temperature interval of 10 K between 30 °C and 40 °C. This study highlights the significance of PST thin films for electro-thermal energy harvesting and promising opportunities for enhancing the conversion efficiency and power density using thin films or thin film multi-layer capacitors in the future for thermal energy harvesting.

Enhanced remnant polarization in ferroelectric Hf0.5Zr0.5O2 thin film capacitors through Mo top electrode by post-metallization annealing treatment

Zr-doped HfO2 (Hf0.5Zr0.5O2) ferroelectric thin films have garnered considerable attention due to their appealing attributes, including a large bandgap (>5 eV), low crystallization temperature, and compatibility with CMOS technology. In this study, we present the achievement of a substantial remnant polarization in ferroelectric Hf0.5Zr0.5O2 thin films, fabricated through atomic layer deposition, with Mo and TiN serving as the top and bottom electrodes, respectively. The Mo/Hf0.5Zr0.5O2/TiN capacitor exhibited commendable ferroelectric behavior and demonstrated high endurance within a thermal budget ranging from 400 to 500 °C. Leveraging the relatively low thermal expansion coefficient of the Mo top electrode facilitated the induction of in-plane tensile strain, fostering an increased formation of the ferroelectric orthorhombic phase within the Hf0.5Zr0.5O2 layer. Elevating the post-metallization annealing temperature to 500 °C yielded a substantial increase in 2Pr (≈54 μC/cm2) with excellent endurance exceeding 106 cycles. The influence of annealing temperature on the morphological and structural properties of Hf0.5Zr0.5O2 thin films was comprehensively analyzed through atomic force microscopy and grazing incidence X-ray diffraction analysis.

Resistive Switching Mechanism in Ferroelectric Memristors with Thin Polycrystalline Barium Titanate Film

In a ferroelectric memristor, the manifestation of resistive effects is most often associated with the influence of polarization and dynamics of the domain structure on the charge transport. The role of point defects is either not taken into account or is reduced to the modulation of potential barriers at the interfaces with electrodes. However, the similarity of charge transport mechanisms in memristors based on thin ferroelectric and metal-oxide films suggests that the contribution of point defects in the anionic sublattice, namely, oxygen vacancies, to the resistive switching in ferroelectric memristors may be dominant. In order to identify the key factors responsible for resistive tuning in a ferroelectric memristor, a combined experimental and theoretical study of resistive switching effects in 10-nm polycrystalline barium titanate films was performed. X-ray photoelectron spectroscopy, piezoresponse force microscopy and scanning tunneling microscopy were employed to investigate the local resistive and ferroelectric properties and to estimate the stoichiometry of the films. A drift-diffusion numerical model of non-stationary processes in thin ferroelectric films was developed, including the Poisson equation and the continuity equation for each component of mobile charge carriers. Using the developed model as well as experimental I—V characteristics taken with scanning tunneling spectroscopy, the contribution of various mechanisms to the resistive switching in ferroelectric memristors with polycrystalline barium titanate has been studied. Non-stationary processes involving oxygen vacancies were found to govern the resistive switching.

Robust Tunability and Newly Emerged Q Resonance of Ba0.8Sr0.2TiO3-Based Microwave Capacitors under Gamma Irradiations.

The complex resonance of dielectric quality factor Q, combined with a capacitance tunability n higher than 3:1 without any dispersion, was achieved in the voltage-tunable interdigital capacitors (IDCs) based on epitaxial Ba0.8Sr0.2TiO3 ferroelectric thin films across the microwave L (1-2 GHz), S (2-4 GHz), and C (4-8 GHz) bands at room temperature. The resonant Q and n features were driven by the microwave responses of the ferroelectric nanodomains engineered in the films. To promote their application in space radiation environments, the evolutions of Q and n both as functions of frequency f (1-8 GHz) and applied electric field E (0-240 kV/cm) were systematically investigated under a series of gamma-ray irradiations up to 100 kGy. The robust capacitance tunability was accompanied by the emergence of an additional Q resonance at 2.3 GHz in most post-irradiated devices, which is ascribed to extra polar nanoregions of expanded surface lattices associated with oxygen vacancies induced by irradiations.

Ultralow Strain-Induced Emergent Polarization Structures in a Flexible Freestanding BaTiO3 Membrane.

The engineering of ferroic orders, which involves the evolution of atomic structure and local ferroic configuration in the development of next-generation electronic devices. Until now, diverse polarization structures and topological domains are obtained in ferroelectric thin films or heterostructures, and the polarization switching and subsequent domain nucleation are found to be more conducive to building energy-efficient and multifunctional polarization structures. In this work, a continuous and periodic strain in a flexible freestanding BaTiO3 membrane to achieve a zigzag morphology is introduced. The polar head/tail boundaries and vortex/anti-vortex domains are constructed by a compressive strain as low as ≈0.5%, which is extremely lower than that used in epitaxial rigid ferroelectrics. Overall, this study c efficient polarization structures, which is of both theoretical value and practical significance for the development of next-generation flexible multifunctional devices.

Advancing Energy‐Storage Performance in Freestanding Ferroelectric Thin Films: Insights from Phase‐Field Simulations

AbstractAdvances in flexible electronics are driving the development of ferroelectric thin‐film capacitors toward flexibility and high energy storage performance. In the present work, the synergistic combination of mechanical bending and defect dipole engineering is demonstrated to significantly enhance the energy storage performance of freestanding ferroelectric thin films, achieved through the generation of a narrower and right‐shifted polarization‐electric field hysteresis loop. The recoverable energy storage density of freestanding PbZr0.52Ti0.48O3 thin films increases from 99.7 J cm−3 in the strain (defect) ‐free state to 349.6 J cm−3, marking a significant increase of 251%. The collective impact of the flexoelectric field, bending tensile strain, and defect dipoles contributes to this enhancement. The demonstrated synergistic optimization strategy has potential applicability to flexible ferroelectric thin film systems. Moreover, the energy storage properties of flexible ferroelectric thin films can be further fine‐tuned by adjusting bending angles and defect dipole concentrations, offering a versatile platform for control and performance optimization.

Energy storage properties influenced by relaxor ferroelectric properties dependent on the growth direction of epitaxial Bi2SiO5 thin films

Ferroelectric Bi2SiO5 (BSO) thin films were deposited by pulsed laser deposition on Nb-doped (100), (110) and (111) SrTiO3 (Nb:STO) substrates, resulting in (001)-, (113)- and (204)-oriented epitaxial films. Due to the crystallinity of BSO, in which the Bi2O2 layers are formed perpendicular to the c-axis direction, the (001)-oriented epitaxial BSO thin film showed the lowest remanent polarization and the best leakage current characteristics. On the other hand, the (113)- and (204)-oriented films showed an increase in remanent polarization due to the improvement of a-oriented crystallinity. Through experiments using vertical and lateral piezoresponse force microscopy, it has been confirmed that the distribution of in-plane-oriented domains reducing remanent polarization decreases in the order of (001)-, (113)- and (204)-oriented epitaxial BSO thin films. The epitaxial BSO thin films that exhibit ferroelectric hysteresis loops similar to the relaxor ferroelectric thin films tended to have improved energy storage characteristics as a result of improved remanent polarization and saturation polarization. In particular, the (113)-oriented epitaxial BSO thin film showed a high recoverable energy density of about 41.6 J cm−3 and an energy storage efficiency of about 85.6%.

Polarization fatigue mechanism of laminated hafnium zirconium oxide ferroelectric thin films

Laminated HfO2-based ferroelectric thin films (FE-HfO2) have offered unexpected opportunities to implement the high-density ferroelectric memory and on chip piezoelectric or pyroelectric devices. But the polarization fatigue performance is poor and the underlying mechanism is unknown. In this work, we comprehensively investigate the polarization fatigue behaviors of Hf0.5Zr0.5O2(HZO)/Al2O3/HZO laminated thin films. Several possible mechanisms for the fatigue performances are discussed in detail. On basis of the analysis of micro-structures and domain switching dynamics before and after fatigue, we confirm that domain wall pinning phenomenon exists in the fatigued laminated HZO, without field-induced phase transition as well as thickness and chemical properties changes of interfacial layers. Moreover, we discover by a pulse measurement method that domain wall pinning induced by the increase of Al2O3/HZO interface trap charge is responsible for the fatigue performances of the laminated films. This work will provide useful guidance for designing high-reliability laminated FE-HfO2, and contribute to understand the physical mechanisms of FE-HfO2.

Artificial synaptic properties of zirconium-doped barium titanate film for neuromorphic computing

The traditional Von Neumann Architecture relies on the separation of memory and CPU, leading to bottlenecks like slow data transfer and high energy consumption. This is especially challenging when addressing the demands of large-scale parallel computing tasks such as artificial intelligence. Devices capable of simulating synaptic properties have gotten significant attention. Neuromorphic computing combines those devices with methods that work with neural networks. They are considered a viable approach to overcoming the Von Neumann Architecture bottleneck. This paper presents a Zr-doped BaTiO3 ferroelectric thin film prepared by a sol-gel process, which mimics the synaptic properties of the nerve: Short-Term Synaptic Plasticity (STP), paired-pulse facilitated (PPD), Long-Term Synaptic Plasticity (LTP) and Spike-Timing-Dependent Plasticity (STDP). An enhanced stochastic adaptive method is used to a built-in Convolutional Neural Network (CNN) to evaluate the device's neuromorphic computing capabilities. According to the results, the device obtains recognition accuracies of 96.5 % and 75.1 % for the MNIST and Fashion-MNIST datasets, respectively. This significantly contributes to the advancement of ferroelectric materials in neuromorphic computing applications.