Recently, the Internet of Things (IOT) has rapidly developed, leading to the development of many smart devices. Moreover, artificial intelligence (AI) and 5G communication are successful, and the demand for high-performance memory is increasing. The emerging nonvolatile RRAM has many advantages, such as low power consumption, fast operation speed, simple structure and excellent scalability, compared with traditional memories; this is promising for complex computing and mass storage. Zinc oxide (ZnO) is a promising candidate for transparent conducting oxide (TCO) applications because of its abundance, high conductivity, low toxicity, and cost-effectiveness. It is currently used in various optoelectronic components including thin-film transistors (TFTs) and photodetectors. Notably, TCO has been increasingly used in the switching layers of random resistive access memory systems. In this paper, we intend to combine AGO with a large energy gap and ZnO with a high conductivity to prepare AGZO as a switching layer for RRAM by co-sputtering. By adjusting the oxygen flow ratio and power of co-sputtering, the AGZO RRAM exhibited high performance with more than 1400 switching cycles, 102–103 on/off ratio, and low operation voltage, and high- and low-resistance states could be maintained for more than 10,000[Formula: see text]s.
Read full abstract