Error Function Analysis Research Articles

Interdiffusion in amorphous Ni 65Ti 35/Ni 35Ti 65 bilayer film studied by Auger electron spectroscopy

Interdiffusion in an amorphous alloy film of the NiTi system is studied by Auger electron spectroscopy (AES). An amorphous Ni 65Ti 35/Ni 35Ti 65 bilayer film which has been produced by evaporation on an Si substrate is subjected to diffusion annealing at 573 K for various time periods. The concentrations of the Ni and Ti species were determined as a function of the depth from the top surface. Thin film X-ray diffraction patterns of the sample indicate that the amorphous structure is maintained throughout the annealing. The AES depth profiles are processed according to an error function analysis. An interdiffusion coefficient D ≈ 5 × 10 −21 m 2s −1 is obtained for this temperature, which is in reasonable agreement with our previous result for the interdiffusion in an Ni/Ti multilayer.

Interdiffusion in Pd/Ti Bilayer Films Studied by Auger Electron Depth Profiling

Interdiffusion processes in Pd/Ti bilayer films subjected to diffusion annealing at temperatures between 523 K and 623 K are studied. Changes of the concentration profile with annealing as revealed by Auger electron depth profiling are analyzed based on an error function analysis and the Boltzmann-Matano method to derive the intrinsic diffusion coefficients of Pd and Ti in the films. The diffusion coefficients obtained by the two methods agree well on the Ti-rich side. The temperature dependence of the diffusion coefficients is expressible by an Arrhenius-type equation, from which characteristic diffusion parameters are determined. A structural change associated with the interdiffusion is studied by grazing incidence X-ray diffraction.