Abstract
Interdiffusion in an amorphous alloy film of the NiTi system is studied by Auger electron spectroscopy (AES). An amorphous Ni 65Ti 35/Ni 35Ti 65 bilayer film which has been produced by evaporation on an Si substrate is subjected to diffusion annealing at 573 K for various time periods. The concentrations of the Ni and Ti species were determined as a function of the depth from the top surface. Thin film X-ray diffraction patterns of the sample indicate that the amorphous structure is maintained throughout the annealing. The AES depth profiles are processed according to an error function analysis. An interdiffusion coefficient D ≈ 5 × 10 −21 m 2s −1 is obtained for this temperature, which is in reasonable agreement with our previous result for the interdiffusion in an Ni/Ti multilayer.
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
