Radiative mechanism of a newly discovered near-band-edge emission, [g-g], exclusively associated with acceptor impurities in GaAs, was theoretically discussed. Since the emission energy of [g-g] for the lowest acceptor concentration limit is nearly identical to that of the excited state of the acceptor impurities and it shows a noticeable shift towards lower-energy levels with increasing acceptor concentration, it was suggested that the energy of [g-g] corresponds to the 2pσ bond state of the acceptor-acceptor pair formed by the overlapping of the 2p excited state. The calculated energy of the 2pσ bond as a function of the distance between the acceptor-acceptor pair shows good agreement with the experimentally obtained value of [g-g] in Mg-doped GaAs grown by molecular-beam epitaxy (MBE). From a comparison of binding energies in the acceptor-doped GaAs samples prepared by ion implantation (Zn+ or Mg+) and by MBE, the activation ratio of the implanted atoms was estimated.
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