Effect Of Substrate Conditions Research Articles

NEOICHNOLOGY OF AMPHIBIOUS ARTHROPODS: EFFECTS OF SUBAQUEOUS AND SUBAERIAL SUBSTRATE CONDITIONS ON TRACE MORPHOLOGY

Abstract Neoichnology, the study of the traces of extant organisms, provides a vital tool for better understanding trace fossils. We conducted neoichnological experiments to test hypotheses regarding producers and the effects of substrate conditions on trace fossils produced by aquatic to amphibious arthropods. Our experiments comprised two protocols: subaerial and subaqueous substrates; and we utilized five arthropods: fully aquatic ostracods (Ostracoda indet.), to amphibious horseshoe crabs (Limulus polyphemus), shore crabs (Carcinus maenas), and scarlet hermit crabs (Paguristes cadenati), and the largely terrestrial sea slaters (Ligia oceanica). The different arthropods were observed performing locomotory, resting/stationary, and feeding behaviors, which all resulted in different traces influenced by the substrate conditions and their preference for living in and out of water. In general, trace depth increased with arthropod mass and, for each individual arthropod except the scarlet hermit crab, trace depth was also greater in subaerial compared to subaqueous substrates. In the majority of cases, comparisons with selected trace fossils supported previous hypotheses as to their producers. The traces of horseshoe crabs, shore crabs, sea slaters, and ostracods resembled the ichnotaxa Kouphichnium, Laterigradus, Pterichnus, and Mermia, respectively. Other experimental work has shown hermit crabs produce traces similar to Coenobichnus and our results further increase the range of trace morphologies that can be attributed to hermit crabs. The results of this research have bearing on debates in ichnology where the interpretation of producers and substrate conditions at the time of trace formation are critical, such as the trace fossil evidence for the colonization of land.

Effect of substrate condition on wire fed electron beam additive deposition

Electron beam wire fed (EB-WF) additive manufacturing (AM) can be utilised for cost-effective part repair in the aerospace industry and, especially for titanium alloys, the vacuum processing effectively mitigates high temperature contamination for enabling reliable high-performance. This research advanced EB-WF additive processing and simulation for depositing Ti–6Al–4V thin walls (3 mm in thickness) that emulates repair of damaged fan and compressor blades. The main focus of this research was to understand the effect of the initial substrate microstructure and residual stress profile on the final deposit properties. The results revealed that the EB-WF additive repair process for depositing Ti–6Al–4V yielded minimal distortion (<350 μm) and residual stresses (<150 MPa (0.15σys)). The initial residual stress states of the substrate were found to have a negligible effect on the final residual stress profiles, from the stress relaxation effect during EB-WF AM. Although significant variance in the microstructure for each substrate condition was present after deposition, their mechanical properties were similar. Deposited test specimens had tensile yield and ultimate strength values ranging between 800-830 MPa and 860–880 MPa, respectively. The similar mechanical properties of the interface were correlated with the microstructural features such as layer bands and titanium alpha (α) colonies.

Substrate effect on doping and degradation of graphene

Graphene is influenced by its surrounding environment, such as adsorbates, charged impurities, and interface traps, owing to its large surface area and ultra-thin thickness. Herein, the effect of substrate conditions on the doping and degradation of graphene is investigated. The hydroxyl (-OH) groups on the silicon dioxide (SiO2) substrate formed by oxygen plasma treatment altered the characteristics of the overlying graphene. On exposure to ultraviolet (UV) light, the p-doping level of graphene on oxygen-plasma-treated SiO2 (P-SiO2) increased and degradation occurred, while graphene on bare SiO2 showed no change. The graphene on P-SiO2 had higher reactivity due to doping induced by –OH groups on the SiO2 surface. The graphene field-effect transistors (G-FETs) on the P-SiO2 also showed the reduced carrier mobility and larger shift of charge neutral point. However, during UV exposure, the device showed sever degradation in electrical conductivity and failure after 60 min. Meanwhile, the device on the bare SiO2 showed negligible changes even after UV exposure. Our results unveil the origin of degradation in the graphene and show a way to prevent the unwanted changes or degradation of graphene, which is highly important for the practical application of graphene.

Effect of Substrate Condition on the Structural and Tribotechnical Characteristics of Molybdenum Diselenide (MoSe2) Coatings

The results of studies on the influence of the substrate condition (stresses, roughness, grain size, texture) on the structure and tribotechnical properties of coatings applied onto compact molybdenum are presented. A difference is demonstrated for the structure of surface layers on cast and sintered molybdenum subjected to deformation associated with the relaxation of mechanical stresses induced in the course of manufacture thereof and with the transformation of grain size in the course of heat treatment.

Inactivation of Listeria and E. coli by Deep-UV LED: effect of substrate conditions on inactivation kinetics

Irradiation with deep-ultraviolet light-emitting diodes (DUV LEDs) is emerging as a low energy, chemical-free approach to mitigate microbial contamination, but the effect of surface conditions on treatment effectiveness is not well understood. Here, inactivation of L. innocua and E. coli ATCC25922, as examples of Gram-positive and Gram-negative bacteria, respectively, by DUV LED of 280 nm wavelength was studied. Surface scenarios commonly encountered in environmental, clinical or food processing environments were used: nutrient rich surfaces, thin liquid films (TLF), and stainless steel surfaces (SS). DUV LED exposure achieved 5-log reduction for both strains within 10 min in most scenarios, except for TLF thicker than 0.6 mm. Inactivation kinetics in TLF and on dry SS followed the Weibull model (0.96 ≤ R2 ≤ 0.99), but the model overestimated inactivation by small-dose DUV on wet SS. Confocal microscopy revealed in situ that bacteria formed a dense outer layer at the liquid-air interface of the liquid droplet, protecting the cells inside the droplet from the bactericidal DUV. This resulted in lower than anticipated inactivation on wet SS at small DUV doses, and deviation from the Weibull model. These findings can be used to design effective DUV LED disinfection strategies for various surface conditions and applications.

Process optimization of anammox-driven hydroxyapatite crystallization for simultaneous nitrogen removal and phosphorus recovery

Based on the requirements for advanced treatment and resource recovery of nitrogen and phosphorus pollutants in wastewater, the coupled anammox and hydroxyapatite crystallization (anammox-HAP) process was studied with an aim of achieving high efficiency and low energy consumption during simultaneous nitrogen and phosphorus removal. In the long-term experiments and batch tests, the effects of substrate conditions (nitrogen and phosphorus load, calcium concentration, etc.) on the nitrogen removal and phosphorus recovery efficiencies were investigated. The granular structure and crystal properties were analyzed together with microscopic characterization methods, and the formation mechanism of coupled anammox-HAP granules was verified. Based on these experiments, a theoretical model and technical method for realizing the coupled process were established, and a reference for practical engineering application was provided.

Effects of substrate condition on calcium corrosion and its role in the calcium test for water vapour transmission rate

The electrical Ca test is a standard method for the estimation of the water vapour transmission rate through the encapsulation barriers. Here, we discuss the corrosion process of thin Ca films under different preparation conditions, and the impact of the substrate temperature. It is demonstrated that without vacuum drying of substrate, the Ca films corrode from the substrate side, even though they are encapsulated. The thickness dependence revealed its influence on lifetime, but not on its electrical properties. These observations reveal the strong impact of the Ca fabrication technology and measurement procedure on the corrosion process of Ca thin films.

Influence of Substrate Condictions on Thermal-Shocking Property of Sm&lt;sub&gt;2&lt;/sub&gt;Zr&lt;sub&gt;2&lt;/sub&gt;O&lt;sub&gt;7&lt;/sub&gt;/NiCoCrAlY Graded Thermal Barrier Coatings

The effect of substrate conditions, including material type, thickness and radius on thermal shocking properties of plasma sprayed Sm2Zr2O7/NiCoCrAlY functional graded thermal barrier coatings were analyzed by ANSYS—a finite element method software. Results show that thermal stresse in coatings increase with increasing of thermal expansion coefficients of substrates. The effect of substrate thickness can be ignored when it is greater than 20mm. Thermal stresses increase with radius increasing, however, they are almost not effected when substrate radius is over 18mm.

Investigation about Thermal Shock Property of Plasma-Spraying Sm&lt;sub&gt;2&lt;/sub&gt;Zr&lt;sub&gt;2&lt;/sub&gt;O&lt;sub&gt;7&lt;/sub&gt; Thermal Barrier Coatings with Different Substrate Condictions

Effect of substrate conditions, including material type, thickness and radius of substrate, on thermal-shocking stresses of plasma spraying Sm2Zr2O7/ NiCrCoAlY TBCs was analyzed through finite element method. Results show that radial stresses decrease with time increasing, and they decrease with the increasing of distance from center to edge along radius. However, axial residual stresses increse abruptly at the edge of specimen. All residual stresses increse with incresing of thermal expansion coefficient of substrate. Radial stresses increase with substrate thickness increasing, however, they are not effectd by substrate thickness if it is great than 20mm.and axial residual stresses and shear stresses are not effected by the substrate thickness. The maximum values of axial stresses and shear stresses were not effected by sustrate radius. and values of radial stresses remian invariable when substrate radius is over 18mm.

Effect of Substrate Conditions on Residual Stresses of Plasma-Spraying YSZ / Sm&lt;sub&gt;2&lt;/sub&gt;Zr&lt;sub&gt;2&lt;/sub&gt;O&lt;sub&gt;7&lt;/sub&gt; Thermal Barrier Coatings

Effect of substrate conditions, including material type, thickness and radius of substrate, on residual stresses of plasma spraying YSZ / Sm2Zr2O7TBCs was analyzed through finite element method in this paper. Results show that all residual stresses increse with incresing of thermal expansion coefficient of substrate.Substrate thickness has slight effect on radial residual stress, and it has no effect on axial residual stress and shear stress. Effect of substrate radius on radial stresses can be almost neglected when it is over 18mm. Effect of substrate radius on axial stresses can also be ignored.

Invsetigation about Residual Stresses of Plasma-Spraying Sm&lt;sub&gt;2&lt;/sub&gt;Zr&lt;sub&gt;2&lt;/sub&gt;O&lt;sub&gt;7&lt;/sub&gt;/YSZ Thermal Barrier Coatings of Different Substrate Conditions

Effect of substrate conditions, including material type, thickness and radius of substrate, on residual thermal stresses of plasma spraying Sm2Zr2O7/YSZ TBCs was analyzed through finite element method in this paper. The radial and shear stresses of the coating decrease with increasing of distance from the center to edge, and they decrease abruptly at the edge of the specimen, while the axial residal stress increase abruptly at the edge of substrate. All residual stresses increase with increasing of thermal expansion coefficient of substrate. The thickness of substrate has slight effect on the radial residual stress, axial residual stress and shear stress are almost uneffected by substrate thickness. The optimum thickness of substrate is 10mm. Radius of substrate have no effect on radial stress when it is greater than 28mm.

Effect of Substrate Conditions on Residual Stress of Plasma-Spraying Sm2Zr2O7 Thermal Barrier Coatings

Effect ofsubstrateconditions, including material type, thickness and radius of substrate, on residual thermal stresses of plasma spraying Sm2Zr2O7TBCs was analyzed though finite element method in this paper. The radial and shear stresses of Sm2Zr2O7decrease with increasing of distance from the center to edge along radius of specimen, and they decrease abruptly at the edge of the specimen, while the axial residal stress increase abruptly at the edge of substrate. All residual stresses increase with increasing of thermal expansion coefficient of substrate. The thickness of substrate has slight effect on the radial residual stress, and axial residual stress and shear stress are almost uneffected by thickness of substrate. The optimum thickness of substrate is 10mm. Radius of substrate have no effect on radial stress when it is greater than 28mm, and radius of substrate has no effect on axial stress and shear stress of Sm2Zr2O7TBCs.

Structural and magnetic properties of NiZn–ferrite thin films prepared by radio frequency magnetron sputtering

Polycrystalline NiZn–ferrite thin films were deposited on Si(100) substrate by rf magnetron sputtering, using targets with a nominal composition of Ni0.5Zn0.5Fe2O4. The effects of substrate condition, sputtering pressure, and postannealing on the structure and magnetic properties of thin films have been investigated. Our results show that the preferred orientation of the NiZn spinel film changed from (311) to (400) with increasing the Ar pressure from 0.8 to 1.6 Pa, meanwhile, the grain size also increased. Atomic force microscopy analysis indicates that perfect surface morphology of the film can be obtained at a relatively lower sputtering pressure of 1.0 Pa. The relative percentage of residual oxygen increases significantly on a condition of lower sputtering pressure, and plays an important role in film structure due to the strong molecular adsorption tendency of oxygen on the film surface during the deposition process. A thin film with a typical thickness of 1 μm, a saturation magnetization of 150 emu/cm3, and a coercivity of 8.8 kA/m has been obtained after annealing at 800 °C, which has the potential application in magnetic integrated circuits.

Surface morphology of sputtered NiTi-based shape memory alloy thin films

The effect of substrate condition and annealing treatment on the surface morphology of sputter-deposited NiTi-based thin films was studied by means of atomic force microscope. It is found that the surface of the film deposited at 450 °C on a (100) Si wafer is composed of large island groups, consisting of islands of ∼150–300 nm in diameter. Annealing treatment at 400 °C results in a more homogeneous distribution of the island size. However, for the film deposited at 450 °C on a (111) Si wafer, its surface consists of more homogeneous islands, being about 200–250 nm in diameter. For the film deposited at 450 °C on a SiO 2 buffer layer on top of the Si-substrate, the surface islands have ideal spherical shape. After annealed at 650 °C, the islands have grown to about 300 nm in width and 550 nm in length. The surface roughness of the deposited film is related not only to the island sizes but also to the island distributions.

Effect of substrate conditions on the plasma beam deposition of amorphous hydrogenated carbon

A study on the effect of substrate conditions was performed for the plasma beam deposition of amorphous hydrogenated carbon ( a-C:H) from an expanding thermal argon/acetylene plasma on glass and crystalline silicon. A new substrate holder was designed, which allows the control of the substrate temperature independent of the plasma settings with an accuracy of 2 K. This is obtained via a combination of a good control of the holder’s yoke temperature and the injection of helium gas between thermally ill connected parts of the substrate holder system. It is demonstrated that the substrate temperature influences both the a-C:H material quality and the deposition rate. The deposition rate and substrate temperature are presented as the two parameters which determine the material quality. In situ studies prove that the deposition process is constant in time and that thermally activated etching processes are unlikely to contribute significantly during deposition. Preliminary experiments with an additional substrate bias reveal that an energetic ion bombardment of the growing film surface does not influence the deposition process. A tentative deposition model is proposed based on the creation and destruction of active sites, which depend on the particle fluxes towards the substrate and the substrate temperature. This model allows the qualitative explanation of the observed deposition results.

Chemical vapour deposition of tungsten in a UHV system: effect of substrate conditions on the initial stages of growth

The initial stages of growth in chemical vapour deposition of W from WF 6 have been studied in a UHV system using three different substrate conditions: HF-etched Si(100), partially oxidized Si(100) and an Si(100) substrate with a native oxide. A more detailed study of the initial growth process was possible using very low total pressures of WF 6(10 −6−10 −5 Torr). It was found that the interaction between WF 6 and the HF-etched substrate was affected strongly by a passivating layer of chemisorbed H-atoms on the Si surface. The hydrogenated surface reduced the nucleation rate and played an important role in keeping the WSi interface clean. The native oxide and the partially oxidized substrate were more reactive than the HF-etched substrate towards WF 6 over a broad temperature range. This effect was attributed to the presence of hydroxyl groups on the substrate surface.

The Effect of Substrate Conditions on the Formation of Crystalline Particles in Amorphous Germanium Films

The Effect of Substrate Conditions on the Formation of Crystalline Particles in Amorphous Germanium Films

Thin-film ceramic electrolytes deposited on porous and non-porous substrates by sol-gel techniques

Successful deposition of ultra-thin ceramic membranes by the sol-gel process could lead to greatly improved electrolyte devices. The parameters of the sol-gel technique which affect film cracking and continuity have been investigated, and the effect of substrate conditions and substrate porosity have been determined. Crack-free yttria-stabilized zirconia films having thickness of approximately 0.2 to 0.5 μm have been deposited on continuous quatz substrate. Preliminary results have also indicated that continuous sub-micron electrolyte films can be deposited on porous substrates.

The Effects of Substrate Conditions on the Microstructural Evolution of Thin Diamond-Like Films

ABSTRACTWe report on a study of hard amorphous carbon thin films prepared by condensing streams of energetic carbon species, onto a range of substrates maintained at different temperatures. The carbon vapor is generated either by ion sputtering, laser ablation or e-beam evaporation. Spatially resolved electron-energy-loss spectra reveal variations in the films′ microstructure brought about by altering the deposition conditions. We estimate that the density of the different films varies between 2.0 and 3.26 g/cm3. We observe an evolution towards denser films upon increasing incident beam energy, reducing substrate temperature, and increasing substrate thermal conductivity. Low density films contain a predominance of trigonally bonded sp2-hybridized carbon (i.e graphitic carbon) and the highest density films contain a high fraction (∽ 80%) of tetr-ahedral sp3-bonded carbon (i.e. diamond-like).

Possible invovement of actomyosin ADP complex in regulation of Ca 2+ sensitivity in α-toxin permeabilized smooth muscle

The effects of substrate condition and ADPβS on the pCa 2+-tension relationships were investigated, using α-toxin permeabilized rabbit mesenteric artery at 37°C. The contraction induced by 10 μM Ca 2+ solution after permeabilization was as large as that induced by 145 mM K + PSS solution containing 10 μM NE in the intact tissue, indicating that the majority of the cells were permeabilized. The Ca 2+ sensitivity was greatly affected by the substrate condition and increasing the ratio of ATP CP induced a leftward shift of the pCa 2+-tension curve. Addition of 100 μM ADPβS had a similar effect. When the ATP CP ratio was high, the 0.1 μM Ca 2+ solution relaxed the tissue precontracted by 10 μM Ca 2+ solution more slowly showing hysteresis. One mM vanadate, which is reported to relax muscle by forming actomyosin-ADP-Vi (AM-ADP-Vi), completely inhibited both contractions induced by 0.18 μM Ca 2+ solution containing 2 mM MgADP and 0.3 μM Ca 2+ solution containing 0.3 μM PDBu. These results indicated that the population of AM-ADP complex in the crossbridge had increased due to the accumulation of ADP inside the tissue or activation of PKC and that the inhibition of ADP release from AM-ADP complex may be playing a key role in increasing Ca 2+ sensitivity of myofilaments.