Microstructure and crystallographic texture play an important role in the sputtering target properties. The effect of asymmetric cross rolling (ACR) and deformation strain during ACR on texture homogeneity is not clear. Thus, high-purity tantalum (Ta) plates were ACR to 60% and 87% reduction in thickness. Texture of the rolled Ta sheets in the surface and center layer are characterized via X-ray diffraction (XRD). The XRD results indicate that ACR is effective to weaken the texture gradient existing in the as-received Ta plate. Besides, more homogeneous texture distribution along the thickness can be obtained with the increasing strain during ACR process.
Read full abstract7-days of FREE Audio papers, translation & more with Prime
7-days of FREE Prime access