Effect Of Deposition Time Research Articles

The effect of deposition time on the morphology of CuS electrodes fabricated by chemical bath deposition for supercapacitor applications

The effect of deposition time on the morphology of CuS electrodes fabricated by chemical bath deposition for supercapacitor applications

Optimization of deposition time on structural, morphological, and optical properties of Cd1-xZnxS nanocrystalline thin films

In this work, Cd1-xZnxS nanocrystalline thin films have been synthesized over a glass substrate by a simple and cost-effective Chemical Bath Deposition (CBD) technique at various deposition time keeping other deposition parameters constant. The structural, morphological, and optical properties are studied by incorporating a range of characterization techniques, including X-ray diffraction (XRD), Field Emission Scanning Electron Microscopes (FESEM), Energy Dispersive X-rays (EDX), and UV–Visible spectrophotometers (UV–Vis). The films have been deposited at five different deposition time in the range from 30 mins to 150 mins to record the changes which address in depth the structural, morphological and optical properties. Empirical fitting equations have also been developed to obtain a more quantitative analysis of the effect of deposition time. The results obtained in this work are compared with some recent reported works for performance analysis of the buffer layer. The proposed buffer layer deposited at 30 mins not only attains all the desirable qualities required for maximum extraction of solar energy but also a low-cost and environment friendly option, making it a potential candidate for solar cell and optoelectronic applications.

Electrochemical polymerization of polyaniline/single-walled carbon nanotube bilayer films with enhanced thermoelectric properties

In this work, polyaniline (PANI) is coated on single-walled carbon nanotubes (SWCNT) via electrochemical polymerization method to fabricate PANI/SWCNT bilayer films with enhanced thermoelectric properties. Effects of deposition time and voltage, and acid types and concentrations on the thermoelectric properties of the films are studied. The results showed that PANI layer was effectively coated on the surface of SWCNT layer by electrochemical polymerization method. In addition, carrier transport and the electrical conductivity (σ) of the PANI/SWCNT bilayer film was improved due to interfacial π-π interaction between PANI and SWCNT, and the Seebeck coefficient (S) was increased due to the energy filtering effect at the interface of PANI/SWCNT. The maximum PF of PANI/SWCNT at room temperature was 155.3 ± 7.2 μW m−1 K−2 with the σ of 654.9 ± 41.8 S cm−1 and the S of 48.7 ± 0.5 μV K−1 when the deposition voltage and time were 1.0 V and 240.0 s using 0.5 M HCl, respectively. Finally, a self-powered thermoelectric device composed of five pairs of p-n junctions was prepared with PANI/SWCNT (1 V, 240 s) as the p-type legs and copper adhesives as the n-type legs, and the maximum output power was 0.27 μW at a temperature difference of 50 K. Therefore, this demonstrates that electrochemical polymerization is a feasible and effective way of fabricating conductive polymers/carbon nanotubes bilayer films with enhanced thermoelectric properties, which have potential application in powering wearable electronics.

Effect of deposition time on properties of the ZnO by USD Method

This investigation aims to improve the properties of 304 L stainless steel (SS) substrates for use in corrosion, mechanical, and biomedical applications by depositing ZnO thin films. The ultrasonic spraying technique was used to prepare ZnO thin films with depositional times of 1, 4, and 9 minutes. XRD and Raman studied the surface characteristics of ZnO samples. XRD analysis revealed a hexagonal structure with an average crystallite size of 22 nm for ZnO. Indentation nano measurements indicated an increase in the hardness of the films examined. To determine the type of conductivity and estimate the charge carrier density, potentiodynamic polarization, electrochemical impedance spectroscopy (EIS), and Mott-Schottky analysis were performed. The thin film deposited for 9 minutes was found to be the most effective in improving corrosion resistance.

Effect of deposition time on the physicochemical properties of co-electrodeposited Cu2SnS3 thin films for photovoltaic applications

This study highlights our optimization of the co-electrodeposition duration of Cu, Sn, and S on the titanium substrate in order to further improve the properties of Cu2SnS3 thin films in photovoltaic applications. After cyclic voltammetry identifying the potential for simultaneous Cu, Sn and S deposit, "Cu–Sn–S″ layers were electrodeposited for deposition durations ranging from 10 → 20 min. Structurally, X-ray-diffraction and Raman-spectroscopy have confirmed the formation of the single Cu2SnS3-phase, crystallizing in the triclinic system after 20 min of electrodeposition. For this duration, the morphological SEM-EDX profile revealed a highly uniform distribution of grains with very optimal sizes for solar cell applications. To reinforce these conclusions, an optical analysis was carried out in the visible wavelength range, highlighting a strong absorption of the developed sample. In addition, the optical gap estimate, indicates that Cu2SnS3 exihibts a direct transition with a bandgap varying from 1.22 to 1.49eV when the deposition time is increased from 10 →20 min.

Fabrication of single-step novel synthesis of ZnCd(S0.5Se0.5)2 thin films for photoelectrochemical (PEC) cell application

In our study, we use a new method called the arrested precipitation technique (APT) to create CdZn(SSe)2 (CZSS) thin films. We obtain samples at different deposition times, ranging from 2.5 to 4 h, and analyze the effects of deposition time on the opto-structural, morphological, compositional, and photoelectrochemical (PEC) solar cell properties. As a result, we find that the band gap energy increases from 2.366 to 2.60 eV with prolonged growth time, as shown by UV–Vis spectra. X-ray diffraction (XRD) analysis confirms that the crystal structure is hexagonal, with the crystallite size increasing from 76 to 93 nm. The dislocation density and microstrain, determined by the Scherrer formula, decrease from 1.72 to 1.14 lines m−2 and from 4.75 × 10−3 to 3.87 × 10−3 (lines m−2), respectively. These results are validated using the Williamson-Hall (WH) plot and size-strain plot. The average grain size, evaluated using the standard scale bar method in scanning electron microscopy (SEM), ranges from 80 to 150 nm across CZ1 to CZ4 samples. Transmission electron microscopy (TEM) images of CZ4 and CZ2 reveal particle sizes of 101 nm and 87 nm, respectively, while selected area electron diffraction (SAED) patterns confirm the polycrystalline nature of the material. Energy dispersive X-ray spectroscopy (EDS) and X-ray photoelectron spectroscopy (XPS) analyses confirm the presence of Cd, Zn, S, and Se elements in their intended stoichiometry. Notably, CZSS photoelectrodes deposited over 4 h show better performance in Photoelectrochemical cells (PEC), achieving the highest photoconversion efficiency (ɳ) at 2.33 %, as evidenced by J-V measurements.

Effect of Deposition Time on Material Properties of ZnO Nanorods Grown on GZO Seed Layer by CBD

ZnO nanorods (ZNRs) were grown on Ga-doped ZnO (GZO) through a two-step procedure, involving pre-treatment to form the seed layer followed by growth of the nanorods through chemical bath deposition (CBD) method

Deposition time effect on copper oxide nano structures, an analysis study using chemical method

Deposition time effect on copper oxide nano structures, an analysis study using chemical method

Effect of deposition time on the optical properties of vanadium pentoxide films grown on porous silicon nanostructure

Effect of deposition time on the optical properties of vanadium pentoxide films grown on porous silicon nanostructure

Improvement in optoelectronics and photovoltaic properties of p-Co3O4/n-ZnO hetero-junction: effect of deposition time of sprayed Co3O4 thin films

Improvement in optoelectronics and photovoltaic properties of p-Co3O4/n-ZnO hetero-junction: effect of deposition time of sprayed Co3O4 thin films

Simple and additive-free synthesis of highly reflective thin silver films and their application on large-scale surfaces

There is a growing demand for highly reflective coatings especially on non-conducting surfaces for use in various industries. Additionally, focus is arising on green production and cost reduction in terms of energy, time, etc., which require detailed investigation of coating process parameters. Therefore, in this work, silver thin films with high reflectance were synthesized on glass substrates in short durations at room temperature by electroless plating (ELP) method in one-step and without using any additives. Effects of deposition time, concentration of the reactants (AgNO3, Glucose, NaOH), and also the surface pretreatment and activation steps were investigated in detail to improve the reflectance and structural properties of silver films. Contact angle measurements were realized to examine the effects of each surface modification step. Surfaces subjected to etching, sensitization and Ag activation were found to yield more homogeneously distributed nanoparticles in short deposition period. Scanning electron microscopy (SEM) also showed smaller-sized spherulite-shaped crystals, forming a close packed structure with an optimum film thickness of ∼110 nm. The continuity of the silver coatings on the surface was verified by the low sheet resistance of 0.18 Ωsq−1. Atomic force microscopy (AFM) analysis revealed a smoother film structure with an RMS of 10.7 nm after sensitization. X-ray diffraction analysis (XRD) and X-ray photoelectron spectroscopy analysis (XPS) analysis proved the growth of highly crystalline silver nanoparticles with high purity. All these morphological improvements led to high values of light (∼97%), near-infrared (99%) and solar (96%) reflectance for the coatings. Finally, based on the optimized concentrations and bath conditions, large-scale (700×500 mm2) first-surface mirrors were successfully produced (96.2%R and 0.25 Ωsq−1) by spray coating technique combined with ELP. Overall, the results indicate that the obtained films have potential usage in applications such as solar energy, electronics and aeronautics.

Formation and morphological evolution investigation of the porous silicon decorated with Pt particles

Platinum nanoparticles were prepared on silicon substrates at room temperature using electroless deposition with different durations from 1 to 40 min. The effect of deposition times on the morphology and composition of the deposited Pt particles and porous films was examined using scanning, transmission electron microscopy, energy-dispersive X-ray spectroscopy, X-ray photoelectron spectroscopy, and Raman scattering. Moreover, atomic force microscopy was used to examine the structural properties and morphological characterization of the deposed particles. The wetting properties of the por-Si/Pt structure were investigated using the sessile drop method. The research indicates that the por-Si/Pt structure has uniformly distributed nonspherical self-assembled Pt particles with a height of up to 120 nm and a diameter of 200 nm. The concentration of these particles is 2.5 × 109 cm−2 and there is a mesoporous silicon layer with a thickness up to 580 nm. A uniform size distribution of the particles is achieved after 1 min of deposition. The conditions for creating the por-Si/Pt structure, characterized by a high Pt particle concentration and coverage, have been identified. The morphology parameters of the particles and layers depend on the duration of the deposition. The evolution of the formation of an array of platinum particles, meso- and macroporous silicon, including all stages of growth of the components of the Por-Si/Pt structure was established.

Chemisynthesized tungsten oxide (WO3) electrodes for high-performance asymmetric supercapacitor application: effect of deposition time

Chemisynthesized tungsten oxide (WO3) electrodes for high-performance asymmetric supercapacitor application: effect of deposition time

Investigation of the Effect of Deposition Time and Annealing on the Structural and Optical Properties of Chemically Deposited ZnS Thin Films

Abstract: The Chemical bath deposition (CBD) technique was successfully used to deposit ZnS thin films. The effects of deposition time and annealing on the structural and optical properties of the obtained thin films were investigated by X-ray diffraction (XRD), and UV-Vis spectrophotometer, respectively. The XRD pattern for the as-deposited ZnS thin films deposited for 30 min showed three peaks at 2θ values of 28.75o, 48.05o, and 56.47o corresponding to (111) (main peak), (220), and (311) reflection planes, indicating cubic structure. Comparing these peaks with that of the films prepared for 60 min, the latter have narrower widths, are more intense, sharper, and produce another weak peak at 2θ angle of 33.51o. Post-annealing treatment results in even more intense and sharper peaks, with their width narrowing further, causing an improvement in the crystallinity. The grains detected from the SEM micrograph are well-defined with spherical shapes of varying sizes. The grain shape changes after annealing due to coalescence of the grains. According to the EDX result, Zn and S were present in the prepared film. The as-deposited films showed a maximum transmittance of 82.1% at the visible region, which increased to 89.2% after annealing. The optical energy band gap was found to be in the ranges of 3.58 - 3.75 eV and 3.41 - 3.73 eV for the as-deposited and annealed films, respectively, signifying that the energy band gap decreases with annealing. Keywords: Chemical bath deposition, Zinc sulphide, Optical properties, Annealing, Thin films, Deposition time.

Influence of Deposition Time on Titanium Nitride (TiN) Thin Film Coating Synthesis Using Chemical Vapour Deposition

Titanium nitride (TiN) thin film coatings were grown over silicon (p-type) substrate using the atmospheric pressure chemical vapour deposition (APCVD) technique. The synthesis process was carried out to evaluate the effect of deposition time on the physical and mechanical characteristics of TiN coating. Thin films grown over Si substrate were further characterised to evaluate the morphological properties, surface roughness and mechanical properties using a scanning electrode microscope (SEM), atomic force microscopy (AFM) and nanoindentation, respectively. EDS equipped with SEM showed the presence of Ti and N elements in considerable amounts. TiN morphology obtained from the SEM test showed small-sized particles on the surface along with cracks and pores. AFM results revealed that by increasing the deposition time, the surface roughness of the coating also increased. The nanomechanical properties such as nanohardness (H) and Young’s modulus (E), etc., evaluated using the nanoindentation technique showed that higher deposition time led to an increase in H and E. Overall, it was observed that deposition time plays a vital role in the TiN coating deposition using the CVD technique.

Effect of deposition time on copper incorporation of ZnS thin films by low-cost technique

The copper-doped zinc sulphide (CuZnS) thin films were prepared by low-cost chemical bath deposition (CBD). The deposited films were varied by copper doping concentration and preparation time. The structural, optical, and electrical properties of the films were analyzed. The XRD patterns of the films exhibit polycrystalline nature with a prominent peak in the (111) plane. The improvement of the crystallinity was observed in the variation of deposition time. The lattice constant of the CuZnS films slightly deviates from that of pure ZnS. The deposited films have shown uniform substrate coverage without pinholes. EDAX results confirmed the presence of copper, zinc, and sulphur in the deposited films. The absorbance was found to be high in the ultraviolet region. The bandgap of the films obtained was 3.7 eV and marginally reduced with deposition time. The Urbach energy of the CuZnS films varied with deposition time. The PL study confirms the incorporation of copper and band edge emission. The electrical properties of the films were investigated by Hall effect measurement.

Study of Structural, Mechanical, and Corrosion Resistance of a Nanocomposite CrSiN/CrN/Cr Coating Deposited on AZ31: Effects of Deposition Time

To improve the surface properties of Mg alloys and expand the applications of CrN-based materials, composite CrSiN coatings consisting of amorphous Si3N4 and nano CrN phases have been prepared on AZ31 based on the theory of fine grain strengthening and multigrain boundaries. The effect of the thickness of the coating on the structure and properties was investigated. The microstructure was studied by means of X-ray diffraction (XRD), scanning electron microscope (SEM) and transmission electron microscope (TEM). The mechanical properties, adhesion properties, and corrosion resistance were investigated using a nanoindentater, scratch testers, and electrochemical workstations. The results show that the coating consists of a face-centered cubic CrN phase, that Si3N4 is not found in the diffraction pattern, and that the HRTEM images show a composite structure of amorphous and nanocrystalline phases. With the increase in deposition time (thickness), the surface roughness decreases, the defects disappear, and the interface has no visible defects. Moreover, the hardness and elastic modulus of the coating increase, corrosion resistance improves, adhesion performance first increases and then decreases. The adhesion between coating and substrate reaches the maximum when sputtering time is 50 min, which corresponds to the CrSiN thickness of 0.79 μm.

Microscopic studies on transparent AlSiN ternary hard coating

In this work AlSi nanocomposite coating were deposited by RF magnetron sputtering in Ar/N2 reactive atmosphere. AlSi alloy target of composition 86:14 wt % have been used to deposit the coating on float glass substrate by varying the deposition time: starting from 0.5 h to 2 h. The substrate temperature and target power were fixed at 250 °C and 100 W respectively. The effect of deposition time on microstructure, mechanical and optical property were studied by usingX-ray Diffraction (XRD), Stylus profiler, Field Emission Scanning Electron Microscope (FESEM), Energy Dispersive X-ray Spectroscopy (EDS), Transmission Electron Microscopy (TEM), UV–Visible Spectrometer and Nanoindentation techniques. The XRD shows the formation h-AlN phase for film deposited for 2 h which shows that with increase in deposition time, the film structure changes from amorphous to polycrystalline, the coating deposited for 2 h develops wurtzite-AlN nanocrystalline structure. The thickness of the coating increases with respect to the increasing deposition time which was confirmed from stylus profiler. The FESEM study shows the uneven and randomly oriented grains present in the coating. TEM study confirms the amorphous and polycrystalline nature of the films with low and high thickness respectively. The elemental composition was confirmed by EDS. UV–Visible Spectrometer delivers the optical transparency of the film which is >90% for all the coatings in the visible range spectra. The roughness of the samples was also measured from scanning probe microscope image, which showed average roughness (Rã) value below 2 nm. The maximum hardness obtained is 31 GPa for the coating deposited 2 h with 490 nm thickness, it has an elastic recovery of 92% which suggest its resistance to elasticity as well as plastic deformation.

Effect of Deposition Time on Electrochemical Properties of Polyaniline Samples Prepared by Chemical Bath Deposition

Effect of Deposition Time on Electrochemical Properties of Polyaniline Samples Prepared by Chemical Bath Deposition

Microstructure and Magnetic Properties Dependence on the Sputtering Power and Deposition Time of TbDyFe Thin Films Integrated on Single-Crystal Diamond Substrate

As giant magnetostrictive material, TbDyFe is regarded as a promising choice for magnetic sensing due to its excellent sensitivity to changes in magnetic fields. To satisfy the requirements of high sensitivity and the stability of magnetic sensors, TbDyFe thin films were successfully deposited on single-crystal diamond (SCD) substrate with a Young’s modulus over 1000 GPa and an ultra-stable performance by radio-frequency magnetron sputtering at room temperature. The sputtering power and deposition time effects of TbDyFe thin films on phase composition, microstructure, and magnetic properties were investigated. Amorphous TbDyFe thin films were achieved under various conditions of sputtering power and deposition time. TbDyFe films appeared as an obvious boundary to SCD substrate as sputtering power exceeded 100 W and deposition time exceeded 2 h, and the thickness of the films was basically linear with the sputtering power and deposition time based on a scanning electron microscope (SEM). The film roughness ranged from 0.15 nm to 0.35 nm, which was measured by an atomic force microscope (AFM). The TbDyFe film prepared under a sputtering power of 100 W and a deposition time of 3 h possessed the coercivity of 48 Oe and a remanence ratio of 0.53, with a giant magnetostriction and Young’s modulus effect, suggesting attractive magnetic sensitivity. The realization of TbDyFe/SCD magnetic material demonstrates a foreseeable potential in the application of high-performance sensors.