Microstructure and Magnetic Properties Dependence on the Sputtering Power and Deposition Time of TbDyFe Thin Films Integrated on Single-Crystal Diamond Substrate

Abstract

As giant magnetostrictive material, TbDyFe is regarded as a promising choice for magnetic sensing due to its excellent sensitivity to changes in magnetic fields. To satisfy the requirements of high sensitivity and the stability of magnetic sensors, TbDyFe thin films were successfully deposited on single-crystal diamond (SCD) substrate with a Young’s modulus over 1000 GPa and an ultra-stable performance by radio-frequency magnetron sputtering at room temperature. The sputtering power and deposition time effects of TbDyFe thin films on phase composition, microstructure, and magnetic properties were investigated. Amorphous TbDyFe thin films were achieved under various conditions of sputtering power and deposition time. TbDyFe films appeared as an obvious boundary to SCD substrate as sputtering power exceeded 100 W and deposition time exceeded 2 h, and the thickness of the films was basically linear with the sputtering power and deposition time based on a scanning electron microscope (SEM). The film roughness ranged from 0.15 nm to 0.35 nm, which was measured by an atomic force microscope (AFM). The TbDyFe film prepared under a sputtering power of 100 W and a deposition time of 3 h possessed the coercivity of 48 Oe and a remanence ratio of 0.53, with a giant magnetostriction and Young’s modulus effect, suggesting attractive magnetic sensitivity. The realization of TbDyFe/SCD magnetic material demonstrates a foreseeable potential in the application of high-performance sensors.